AU6322286A – Photo-curable composition
– Google Patents
AU6322286A – Photo-curable composition
– Google Patents
Photo-curable composition
Info
Publication number
AU6322286A
AU6322286A
AU63222/86A
AU6322286A
AU6322286A
AU 6322286 A
AU6322286 A
AU 6322286A
AU 63222/86 A
AU63222/86 A
AU 63222/86A
AU 6322286 A
AU6322286 A
AU 6322286A
AU 6322286 A
AU6322286 A
AU 6322286A
Authority
AU
Australia
Prior art keywords
photo
curable composition
curable
composition
Prior art date
1985-04-02
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
AU63222/86A
Other versions
AU591178B2
(en
Inventor
Masami Kawabata
Koichi Kimoto
Yasuhiko Shirota
Yasuyuki Takimoto
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Nippon Paint Co Ltd
Original Assignee
Nippon Paint Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
1985-04-02
Filing date
1986-09-29
Publication date
1988-03-31
Family has litigation
First worldwide family litigation filed
litigation
Critical
https://patents.darts-ip.com/?family=13435128&utm_source=google_patent&utm_medium=platform_link&utm_campaign=public_patent_search&patent=AU6322286(A)
«Global patent litigation dataset” by Darts-ip is licensed under a Creative Commons Attribution 4.0 International License.
1986-09-29
Application filed by Nippon Paint Co Ltd
filed
Critical
Nippon Paint Co Ltd
1988-03-31
Publication of AU6322286A
publication
Critical
patent/AU6322286A/en
1989-11-30
Application granted
granted
Critical
1989-11-30
Publication of AU591178B2
publication
Critical
patent/AU591178B2/en
2006-09-29
Anticipated expiration
legal-status
Critical
Status
Ceased
legal-status
Critical
Current
Links
Espacenet
Global Dossier
Discuss
Classifications
C—CHEMISTRY; METALLURGY
C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
C08F2/00—Processes of polymerisation
C08F2/46—Polymerisation initiated by wave energy or particle radiation
C08F2/48—Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light
C08F2/50—Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light with sensitising agents
G—PHYSICS
G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
G03F7/004—Photosensitive materials
G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
G—PHYSICS
G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
G03F7/004—Photosensitive materials
G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
G03F7/031—Organic compounds not covered by group G03F7/029
AU63222/86A
1985-04-02
1986-09-29
Photo-curable composition
Ceased
AU591178B2
(en)
Applications Claiming Priority (1)
Application Number
Priority Date
Filing Date
Title
JP7056385A
JPS61228002A
(en)
1985-04-02
1985-04-02
High-sensitivity photo-setting resin composition
Publications (2)
Publication Number
Publication Date
AU6322286A
true
AU6322286A
(en)
1988-03-31
AU591178B2
AU591178B2
(en)
1989-11-30
Family
ID=13435128
Family Applications (1)
Application Number
Title
Priority Date
Filing Date
AU63222/86A
Ceased
AU591178B2
(en)
1985-04-02
1986-09-29
Photo-curable composition
Country Status (3)
Country
Link
EP
(1)
EP0262242B1
(en)
JP
(1)
JPS61228002A
(en)
AU
(1)
AU591178B2
(en)
Families Citing this family (10)
* Cited by examiner, † Cited by third party
Publication number
Priority date
Publication date
Assignee
Title
DE3710281A1
(en)
*
1987-03-28
1988-10-06
Hoechst Ag
PHOTOPOLYMERIZABLE MIXTURE AND RECORDING MATERIAL MADE THEREOF
DE3710282A1
(en)
*
1987-03-28
1988-10-13
Hoechst Ag
PHOTOPOLYMERIZABLE MIXTURE AND RECORDING MATERIAL MADE THEREOF
JPS63305346A
(en)
*
1987-06-05
1988-12-13
Asahi Chem Ind Co Ltd
Photosensitive resin composition
DE3743457A1
(en)
*
1987-12-22
1989-07-06
Hoechst Ag
PHOTOPOLYMERIZABLE MIXTURE AND RECORDING MATERIAL MANUFACTURED THEREOF
DE3743454A1
(en)
*
1987-12-22
1989-07-06
Hoechst Ag
PHOTOPOLYMERIZABLE MIXTURE AND RECORDING MATERIAL MANUFACTURED THEREOF
DE3743455A1
(en)
*
1987-12-22
1989-07-06
Hoechst Ag
PHOTOPOLYMERIZABLE MIXTURE AND RECORDING MATERIAL MADE THEREOF
JPH0273810A
(en)
*
1988-09-08
1990-03-13
Tokyo Ohka Kogyo Co Ltd
Photopolymerizable resin composition
US5736298A
(en)
*
1992-10-02
1998-04-07
Japan Synthetic Rubber Co., Ltd.
Water developable photosensitive resin composition
JP3011864B2
(en)
1994-12-09
2000-02-21
日本ペイント株式会社
Water developable photosensitive resin composition
AU2003246675A1
(en)
2002-07-19
2004-02-09
Ciba Specialty Chemicals Holding Inc.
New difunctional photoinitiators
Family Cites Families (7)
* Cited by examiner, † Cited by third party
Publication number
Priority date
Publication date
Assignee
Title
US3974052A
(en)
*
1973-12-06
1976-08-10
Imperial Chemical Industries Limited
Photopolymerizable compositions containing triketone/alcohol adducts as photosensitizers
US4001304A
(en)
1974-05-02
1977-01-04
Rohm And Haas Company
Acrylic acid esters
DE2658935A1
(en)
1976-12-24
1978-07-06
Basf Ag
PHOTOPOLYMERIZABLE MASS AND THEIR USE
AU523480B2
(en)
*
1977-08-04
1982-07-29
Ppg Industries, Inc
Amide. acrylate compounds for use in radiation-curable coat img compositions
JPS5462235A
(en)
*
1977-10-27
1979-05-19
Matsushita Electric Ind Co Ltd
Photo-setting coating composition
US4543422A
(en)
*
1982-10-26
1985-09-24
Allied Colloids Limited
Synthesis of vinyl esters
DE3347646A1
(en)
1983-12-30
1985-07-11
ESPE Fabrik pharmazeutischer Präparate GmbH, 8031 Seefeld
METHOD FOR PRODUCING PLASTER MODELS FOR DENTAL TECHNOLOGY
1985
1985-04-02
JP
JP7056385A
patent/JPS61228002A/en
active
Pending
1986
1986-09-29
AU
AU63222/86A
patent/AU591178B2/en
not_active
Ceased
1986-10-01
EP
EP86113457A
patent/EP0262242B1/en
not_active
Expired – Lifetime
Also Published As
Publication number
Publication date
JPS61228002A
(en)
1986-10-11
AU591178B2
(en)
1989-11-30
EP0262242B1
(en)
1991-01-16
EP0262242A1
(en)
1988-04-06
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None