AU8783282A

AU8783282A – Photopolymerisable compositions
– Google Patents

AU8783282A – Photopolymerisable compositions
– Google Patents
Photopolymerisable compositions

Info

Publication number
AU8783282A

AU8783282A
AU87832/82A
AU8783282A
AU8783282A
AU 8783282 A
AU8783282 A
AU 8783282A
AU 87832/82 A
AU87832/82 A
AU 87832/82A
AU 8783282 A
AU8783282 A
AU 8783282A
AU 8783282 A
AU8783282 A
AU 8783282A
Authority
AU
Australia
Prior art keywords
photopolymerisable compositions
photopolymerisable
compositions
Prior art date
1981-11-03
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)

Granted

Application number
AU87832/82A
Other versions

AU553151B2
(en

Inventor
John Robert Curtis
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)

Sericol Ltd

Original Assignee
Sericol Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
1981-11-03
Filing date
1982-08-30
Publication date
1983-05-12

1982-08-30
Application filed by Sericol Ltd
filed
Critical
Sericol Ltd

1983-05-12
Publication of AU8783282A
publication
Critical
patent/AU8783282A/en

1986-07-03
Application granted
granted
Critical

1986-07-03
Publication of AU553151B2
publication
Critical
patent/AU553151B2/en

2002-08-30
Anticipated expiration
legal-status
Critical

Status
Ceased
legal-status
Critical
Current

Links

Espacenet

Global Dossier

Discuss

239000000203
mixture
Substances

0.000
title
1

Classifications

C—CHEMISTRY; METALLURGY

C07—ORGANIC CHEMISTRY

C07D—HETEROCYCLIC COMPOUNDS

C07D335/00—Heterocyclic compounds containing six-membered rings having one sulfur atom as the only ring hetero atom

C07D335/04—Heterocyclic compounds containing six-membered rings having one sulfur atom as the only ring hetero atom condensed with carbocyclic rings or ring systems

C07D335/10—Dibenzothiopyrans; Hydrogenated dibenzothiopyrans

C07D335/12—Thioxanthenes

C07D335/14—Thioxanthenes with hetero atoms or with carbon atoms having three bonds to hetero atoms with at the most one bond to halogen, e.g. ester or nitrile radicals, directly attached in position 9

C07D335/16—Oxygen atoms, e.g. thioxanthones

C—CHEMISTRY; METALLURGY

C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON

C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS

C08F2/00—Processes of polymerisation

C08F2/46—Polymerisation initiated by wave energy or particle radiation

C08F2/48—Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light

C08F2/50—Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light with sensitising agents

G—PHYSICS

G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY

G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR

G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor

G03F7/004—Photosensitive materials

G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds

G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators

G03F7/031—Organic compounds not covered by group G03F7/029

G—PHYSICS

G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY

G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR

G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor

G03F7/12—Production of screen printing forms or similar printing forms, e.g. stencils

Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS

Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC

Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS

Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof

Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface – process, composition, or product: radiation sensitive composition or product or process of making binder containing

Y10S430/1055—Radiation sensitive composition or product or process of making

Y10S430/114—Initiator containing

Y10S430/122—Sulfur compound containing

Y10S430/123—Sulfur in heterocyclic ring

AU87832/82A
1981-11-03
1982-08-30
Photopolymerisable compositions

Ceased

AU553151B2
(en)

Applications Claiming Priority (2)

Application Number
Priority Date
Filing Date
Title

GB8133114

1981-11-03

GB8133114

1981-11-03

Publications (2)

Publication Number
Publication Date

AU8783282A
true

AU8783282A
(en)

1983-05-12

AU553151B2

AU553151B2
(en)

1986-07-03

Family
ID=10525599
Family Applications (1)

Application Number
Title
Priority Date
Filing Date

AU87832/82A
Ceased

AU553151B2
(en)

1981-11-03
1982-08-30
Photopolymerisable compositions

Country Status (7)

Country
Link

US
(1)

US4418138A
(en)

EP
(1)

EP0081280B1
(en)

JP
(1)

JPS5880301A
(en)

AU
(1)

AU553151B2
(en)

CA
(1)

CA1210547A
(en)

DE
(1)

DE3267928D1
(en)

GB
(1)

GB2108979B
(en)

Families Citing this family (37)

* Cited by examiner, † Cited by third party

Publication number
Priority date
Publication date
Assignee
Title

CH640849A5
(en)

*

1979-05-18
1984-01-31
Ciba Geigy Ag

THIOXANTHONICARBONIC ACID ESTERS, THIOESTERS AND AMIDES.

GB2109392B
(en)

*

1981-11-03
1985-06-26
Sericol Group Ltd
Photopolymerisable materials for use in producing screen printing stencils

GB2137626B
(en)

*

1983-03-31
1986-10-15
Sericol Group Ltd
Water based photopolymerisable compositions and their use

US4602097A
(en)

*

1984-06-11
1986-07-22
Ulano Corporation
Water soluble photoinitiator benzophenone and thioxanthenone ethoxy-ether derivatives

GB8529448D0
(en)

*

1985-11-29
1986-01-08
Ward Blenkinsop & Co Ltd
Thioxanthone derivatives

US4748049A
(en)

*

1986-03-27
1988-05-31
Chemfil Corporation
Clear paint booth coating composition and method

JPH0769607B2
(en)

*

1986-07-25
1995-07-31
富士写真フイルム株式会社

Photopolymerizable composition

DE3738567A1
(en)

*

1987-03-12
1988-09-22
Merck Patent Gmbh

COREACTIVE PHOTOINITIATORS

JP2800004B2
(en)

*

1987-04-23
1998-09-21
東京応化工業 株式会社

Water-developable photocurable insulating paste composition

GB8716378D0
(en)

*

1987-07-11
1987-08-19
Autotype Int Ltd
Photopolymerisable compositions

DE3738864A1
(en)

*

1987-11-16
1989-05-24
Hoechst Ag

POLYMERIZABLE COMPOUNDS AND THIS CONTAINING MIXTURE MIXING BY RADIATION

JPH01238656A
(en)

*

1988-03-18
1989-09-22
Nippon Paint Co Ltd
High sensitive photopolymerizable composition

US5248805A
(en)

*

1988-12-31
1993-09-28
Basf Aktiengesellschaft
Radiation-senstive, ethylenically unsaturated, copolymerizable compounds and their preparation

JP2644898B2
(en)

*

1989-11-16
1997-08-25
旭化成工業株式会社

Photosensitive resin composition for forming relief

US5750190B1
(en)

*

1990-11-16
2000-01-25
Cal West Equipment Co Inc
Protective coating and method of using such coating

US5362786A
(en)

1990-11-16
1994-11-08
Cal-West Equipment Co., Inc.
Protective coating and method of using such coating

US5411760A
(en)

*

1990-11-16
1995-05-02
Cal-West Equipment Company, Inc.
Protective coating and method of using such coating

GB2263699B
(en)

*

1992-02-03
1995-11-29
Sericol Ltd
Photopolymerizable alcohols and compositions containing them

US5391464A
(en)

*

1993-12-28
1995-02-21
International Business Machines Corporation
Thioxanthone sensitizer for radiation sensitive polyimides

US6025408A
(en)

*

1997-03-27
2000-02-15
First Chemical Corporation
Liquid thioxanthone photoinitiators

JP3893262B2
(en)

*

2000-09-14
2007-03-14
キヤノン株式会社

Water-based photocurable resin composition, water-based ink, ink cartridge, recording unit, and ink jet recording apparatus

GB0125098D0
(en)

*

2001-10-18
2001-12-12
Coates Brothers Plc
Multi-functional thioxanthone photoinitiators

GB0216311D0
(en)

*

2002-07-13
2002-08-21
Great Lakes Uk Ltd
An improved process for the production of substituted thioxanthones

US20040237814A1
(en)

*

2003-05-29
2004-12-02
Benjamin Caplan
Printing stencil and method for preparation thereof

JP2005162962A
(en)

*

2003-12-05
2005-06-23
Konica Minolta Medical & Graphic Inc
Active ray-hardening type composition, active ray hardening type ink, image-forming method using the ink and inkjet recorder

US20070207269A1
(en)

2004-06-14
2007-09-06
Cal-West Specialty Coatings, Inc.
Masking solutions comprising siloxane-based surfactants for using in painting operations

EP1783552B1
(en)

2005-11-03
2015-10-07
Kissel & Wolf GmbH
Photopolymerizable composition for producing printing forms

US20070154518A1
(en)

*

2005-12-29
2007-07-05
Robert Falotico
Photoactive biocompatible coating composition

GB2476275A
(en)

*

2009-12-17
2011-06-22
Dublin Inst Of Technology
Photosensitive holographic recording medium comprising glycerol

WO2015183719A1
(en)

2014-05-29
2015-12-03
Sun Chemical Corporation
Water-based uv inkjet ink

US10414927B2
(en)

2015-01-27
2019-09-17
Hewlett-Packard Development Company, L.P.
Polymeric photo active agents

JP6523466B2
(en)

2015-01-27
2019-06-05
ヒューレット−パッカード デベロップメント カンパニー エル.ピー.Hewlett‐Packard Development Company, L.P.

Polymeric Photoactivator

WO2016122452A1
(en)

2015-01-27
2016-08-04
Hewlett-Packard Development Company, L.P.
Polymeric amine synergists

JP2017003911A
(en)

*

2015-06-15
2017-01-05
株式会社ムラカミ
Photosensitive resin composition, photosensitive film, plate material for screen printing and photosensitive resist film

WO2017007493A1
(en)

2015-07-09
2017-01-12
Hewlett-Packard Development Company, L.P.
Polymeric amine synergist

FR3067030B1
(en)

*

2017-06-02
2019-07-05
Commissariat A L’energie Atomique Et Aux Energies Alternatives

DEVICE AND METHOD FOR PRODUCING AN OBJECT

CN113308137A
(en)

*

2021-06-11
2021-08-27
安徽强邦印刷材料有限公司
Treatment-free printing plate protective coating and preparation method thereof

Family Cites Families (5)

* Cited by examiner, † Cited by third party

Publication number
Priority date
Publication date
Assignee
Title

US3926643A
(en)

*

1974-05-16
1975-12-16
Du Pont
Photopolymerizable compositions comprising initiator combinations comprising thioxanthenones

CH640849A5
(en)

*

1979-05-18
1984-01-31
Ciba Geigy Ag

THIOXANTHONICARBONIC ACID ESTERS, THIOESTERS AND AMIDES.

US4348530A
(en)

*

1980-02-05
1982-09-07
Ciba-Geigy Corporation
Thioxanthonecarboxylic acids, esters, thioesters and amides with reactive functional groups

CH643552A5
(en)

*

1980-05-06
1984-06-15
Ciba Geigy Ag

THIOXANTHONIC CARBON ACIDS AND THIOXANTHON CARBON ACID DERIVATIVES.

JPS57163377A
(en)

*

1981-03-16
1982-10-07
Nippon Kayaku Co Ltd
Dialkylthioxanthone compound, its preparation, and curing of photopolymerizable resin composition using it

1982

1982-08-25
US
US06/411,565
patent/US4418138A/en
not_active
Expired – Fee Related

1982-08-27
CA
CA000410327A
patent/CA1210547A/en
not_active
Expired

1982-08-30
AU
AU87832/82A
patent/AU553151B2/en
not_active
Ceased

1982-09-16
EP
EP82304898A
patent/EP0081280B1/en
not_active
Expired

1982-09-16
DE
DE8282304898T
patent/DE3267928D1/en
not_active
Expired

1982-09-16
GB
GB08226358A
patent/GB2108979B/en
not_active
Expired

1982-09-21
JP
JP57164787A
patent/JPS5880301A/en
active
Granted

Also Published As

Publication number
Publication date

EP0081280A1
(en)

1983-06-15

AU553151B2
(en)

1986-07-03

US4418138A
(en)

1983-11-29

CA1210547A
(en)

1986-08-26

EP0081280B1
(en)

1985-12-11

JPH028604B2
(en)

1990-02-26

GB2108979B
(en)

1985-07-31

GB2108979A
(en)

1983-05-25

DE3267928D1
(en)

1986-01-23

JPS5880301A
(en)

1983-05-14

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