GB1456866A

GB1456866A – Semiconductor display-devices
– Google Patents

GB1456866A – Semiconductor display-devices
– Google Patents
Semiconductor display-devices

Info

Publication number
GB1456866A

GB1456866A
GB5847673A
GB5847673A
GB1456866A
GB 1456866 A
GB1456866 A
GB 1456866A
GB 5847673 A
GB5847673 A
GB 5847673A
GB 5847673 A
GB5847673 A
GB 5847673A
GB 1456866 A
GB1456866 A
GB 1456866A
Authority
GB
United Kingdom
Prior art keywords
layer
resistance
resistance layer
gaas
atoms
Prior art date
1972-12-19
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)

Expired

Application number
GB5847673A
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)

Philips Electronics UK Ltd

Original Assignee
Philips Electronic and Associated Industries Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
1972-12-19
Filing date
1973-12-18
Publication date
1976-12-01

1973-12-18
Application filed by Philips Electronic and Associated Industries Ltd
filed
Critical
Philips Electronic and Associated Industries Ltd

1976-12-01
Publication of GB1456866A
publication
Critical
patent/GB1456866A/en

Status
Expired
legal-status
Critical
Current

Links

Espacenet

Global Dossier

Discuss

Classifications

H—ELECTRICITY

H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR

H05B—ELECTRIC HEATING; ELECTRIC LIGHT SOURCES NOT OTHERWISE PROVIDED FOR; CIRCUIT ARRANGEMENTS FOR ELECTRIC LIGHT SOURCES, IN GENERAL

H05B33/00—Electroluminescent light sources

H05B33/12—Light sources with substantially two-dimensional radiating surfaces

H—ELECTRICITY

H01—ELECTRIC ELEMENTS

H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10

H01L33/00—Semiconductor devices with at least one potential-jump barrier or surface barrier specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof

H—ELECTRICITY

H01—ELECTRIC ELEMENTS

H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10

H01L33/00—Semiconductor devices with at least one potential-jump barrier or surface barrier specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof

H01L33/0004—Devices characterised by their operation

H01L33/0041—Devices characterised by their operation characterised by field-effect operation

Abstract

1456866 Electroluminescence PHILIPS ELECTRONIC & ASSOCIATED INDUSTRIES Ltd 18 Dec 1973 [19 Dec 1972] 58476/73 Heading C4S [Also in Division H1] An EL device comprises opposite conductivity type regions, 1, 2, transparent insulator layer 3, transparent elongate resistance layer 4, and means including a non-rectifying contact at at least one end of the resistance layer whereby a signal voltage may create a p.d. between layer 4 at one end, and the second region, and a field gradient in the longitudinal direction, in the part of layer 4 below the resistance layer. «Elongate resistance layer» is defined as having a high average length to width ratio, e.g. 10 : 1. The device provides an analogue display in which at least one dimension of the luminous surface varies according to the measured quantity. The dimensional variation of the luminous length may be inversely proportional to the applied voltage or follow a different rule according layer 3 shape (e.g. with curved edges (20), Fig. 4, not shown). Resistance layer 4 may be a thin metal layer, or a deposit with regularly distributed apertures to remove observable field irregularities, and may also be of SnO 2 or In 2 O 3 . Permanently illuminated border regions such as in the Fig. 4 device, may be masked. The Fig. 5 device (not shown) includes resistance layer (23) whose thickness resistance is less than its length resistance and side contact (25). Fig. 6 (not shown) includes end contact (45) to the second region, and Fig. 7 (not shown) two end contacts (55) (59) to the second region. In fabrication, epitaxial or diffusion techniques may be employed with III-V type compounds. Also a GaAs : GaAlAs heterojunction is instanced. In an example, Te doped (5. 1016 atoms/c.c.) GaAs 1-x P x (x=0À4) is vapour deposited on GaAs and Zn diffused to 2 Á at 5. 1018 atoms/c.c. concentration. A thermal treatment may then out diffuse the Zn to 1017 atoms/c.c. and a 0À1 Á thick SiO 2 layer (1016 to 1018 # cm. resistivity) and a cathode sputtered 0À1 Á thick In 2 O 3 (107 # cm. resistivity) layer subsequently formed. Electrodes may be Au. Other relative dimensions, and internal mechanisms are considered.

GB5847673A
1972-12-19
1973-12-18
Semiconductor display-devices

Expired

GB1456866A
(en)

Applications Claiming Priority (1)

Application Number
Priority Date
Filing Date
Title

FR7245209A

FR2210878B1
(en)

1972-12-19
1972-12-19

Publications (1)

Publication Number
Publication Date

GB1456866A
true

GB1456866A
(en)

1976-12-01

Family
ID=9108932
Family Applications (1)

Application Number
Title
Priority Date
Filing Date

GB5847673A
Expired

GB1456866A
(en)

1972-12-19
1973-12-18
Semiconductor display-devices

Country Status (7)

Country
Link

US
(1)

US3928864A
(en)

JP
(1)

JPS5212556B2
(en)

CA
(1)

CA1011441A
(en)

DE
(1)

DE2362459A1
(en)

FR
(1)

FR2210878B1
(en)

GB
(1)

GB1456866A
(en)

IT
(1)

IT1001147B
(en)

Families Citing this family (3)

* Cited by examiner, † Cited by third party

Publication number
Priority date
Publication date
Assignee
Title

NL7407811A
(en)

*

1974-06-12
1975-12-16
Philips Nv

PHOTO DIODE.

JPH0645106B2
(en)

*

1989-02-08
1994-06-15
株式会社日立製作所

Bolt fastening method

US6653662B2
(en)

*

2000-11-01
2003-11-25
Matsushita Electric Industrial Co., Ltd.
Semiconductor light-emitting device, method for fabricating the same, and method for driving the same

Family Cites Families (3)

* Cited by examiner, † Cited by third party

Publication number
Priority date
Publication date
Assignee
Title

US3388255A
(en)

*

1964-06-22
1968-06-11
George A. May
Solid-state voltage-scanned device including long narrow p-n junction material with photoconductors thereon

US3492548A
(en)

*

1967-09-25
1970-01-27
Rca Corp
Electroluminescent device and method of operating

US3558897A
(en)

*

1969-01-27
1971-01-26
George A May
P-n junction scanning device having photo-conductors disposed on device with field effect layers for controlling position of scanning spot

1972

1972-12-19
FR
FR7245209A
patent/FR2210878B1/fr
not_active
Expired

1973

1973-12-15
DE
DE2362459A
patent/DE2362459A1/en
not_active
Withdrawn

1973-12-18
IT
IT42946/73A
patent/IT1001147B/en
active

1973-12-18
CA
CA188,690A
patent/CA1011441A/en
not_active
Expired

1973-12-18
US
US425725A
patent/US3928864A/en
not_active
Expired – Lifetime

1973-12-18
GB
GB5847673A
patent/GB1456866A/en
not_active
Expired

1973-12-19
JP
JP14293873A
patent/JPS5212556B2/ja
not_active
Expired

Also Published As

Publication number
Publication date

CA1011441A
(en)

1977-05-31

JPS49102283A
(en)

1974-09-27

DE2362459A1
(en)

1974-06-20

IT1001147B
(en)

1976-04-20

JPS5212556B2
(en)

1977-04-07

FR2210878A1
(en)

1974-07-12

FR2210878B1
(en)

1976-04-23

US3928864A
(en)

1975-12-23

Similar Documents

Publication
Publication Date
Title

KR900000066B1
(en)

1990-01-19

Manufacturing method of film transistor

GB1457904A
(en)

1976-12-08

Electroluminescent devices

GB1378327A
(en)

1974-12-27

Iii-v compound on insulating substrate

ES327989A1
(en)

1967-04-01

A semiconductor device. (Machine-translation by Google Translate, not legally binding)

US3920861A
(en)

1975-11-18

Method of making a semiconductor device

GB883906A
(en)

1961-12-06

Improvements in semi-conductive arrangements

KR870004533A
(en)

1987-05-11

Transparent conductive film and its manufacturing method

GB1418969A
(en)

1975-12-24

Method of making integrated circuits

GB1439351A
(en)

1976-06-16

Capacitor

GB1456866A
(en)

1976-12-01

Semiconductor display-devices

US3222531A
(en)

1965-12-07

Solid state junction photopotentiometer

GB1331761A
(en)

1973-09-26

Epi base high speed power transistor

KR970054357A
(en)

1997-07-31

Semiconductor device and manufacturing method

GB1407062A
(en)

1975-09-24

Semiconductor devices

FR2373879A1
(en)

1978-07-07

Mesa type diode semiconductor structure – has reduced mesa part and has highly doped residual substrate of small thickness

KR900015304A
(en)

1990-10-26

Semiconductor device composed of one-dimensional doped conductor and manufacturing method thereof

KR840005930A
(en)

1984-11-19

Semiconductor device

US3945029A
(en)

1976-03-16

Semiconductor diode with layers of different but related resistivities

JPS6482564A
(en)

1989-03-28

Field-effect semiconductor device

JPS5756969A
(en)

1982-04-05

High withstand voltage type semiconductor device

GB1280943A
(en)

1972-07-12

Semiconductor device

GB1525469A
(en)

1978-09-20

Transistors

GB1313252A
(en)

1973-04-11

Semiconductor device and method for making the same

GB1250584A
(en)

1971-10-20

GB1247985A
(en)

1971-09-29

High frequency responsive semiconductive capacitor

Legal Events

Date
Code
Title
Description

1977-04-14
PS
Patent sealed [section 19, patents act 1949]

1982-07-21
PCNP
Patent ceased through non-payment of renewal fee

Download PDF in English

None