GB1516773A – Electron beam vaporiser
– Google Patents
GB1516773A – Electron beam vaporiser
– Google Patents
Electron beam vaporiser
Info
Publication number
GB1516773A
GB1516773A
GB40971/76A
GB4097176A
GB1516773A
GB 1516773 A
GB1516773 A
GB 1516773A
GB 40971/76 A
GB40971/76 A
GB 40971/76A
GB 4097176 A
GB4097176 A
GB 4097176A
GB 1516773 A
GB1516773 A
GB 1516773A
Authority
GB
United Kingdom
Prior art keywords
crucible
base
electron beam
pintle
oct
Prior art date
1975-10-07
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
GB40971/76A
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Leybold Heraeus Verwaltung GmbH
Original Assignee
Leybold Heraeus Verwaltung GmbH
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
1975-10-07
Filing date
1976-10-01
Publication date
1978-07-05
1976-10-01
Application filed by Leybold Heraeus Verwaltung GmbH
filed
Critical
Leybold Heraeus Verwaltung GmbH
1978-07-05
Publication of GB1516773A
publication
Critical
patent/GB1516773A/en
Status
Expired
legal-status
Critical
Current
Links
Espacenet
Global Dossier
Discuss
Classifications
H—ELECTRICITY
H01—ELECTRIC ELEMENTS
H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
H01J37/305—Electron-beam or ion-beam tubes for localised treatment of objects for casting, melting, evaporating or etching
H01J37/3053—Electron-beam or ion-beam tubes for localised treatment of objects for casting, melting, evaporating or etching for evaporating or etching
C—CHEMISTRY; METALLURGY
C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
C23C14/24—Vacuum evaporation
C23C14/28—Vacuum evaporation by wave energy or particle radiation
C23C14/30—Vacuum evaporation by wave energy or particle radiation by electron bombardment
Abstract
1516773 Electron beam furnaces LEYBOLDHERAEUS-VERWALTUNG GmbH 1 Oct 1976 [7 Oct 1975] 40971/76 Heading H1D An electron beam vaporizer comprises an electron gun 15 with focusing means and electromagnetic deflecting means for the beam 23, a crucible 1 having at least one recess 2, 4 for receiving material to be vaporized, and a crucible base 42 on which the crucible is positioned, the base having ducts for liquid coolant, and the crucible merely contacting the base at surface 43, whereby it may be removed without opening the coolant ducts. As shown, the base 42 comprises a table 34 rotatably mounted on a pintle 28 in fluid-tight manner, the table having a cavity 38 communicating with coaxial supply and return conduits 37, 36 in the pintle. The crucible 1 may have several separate circular recesses, or one or more annular recesses, or a single large recess, and the table 34 is rotated to bring the required area of the crucible under the beam 23. The electromagnet construction is as described in Specification 1,361,771.
GB40971/76A
1975-10-07
1976-10-01
Electron beam vaporiser
Expired
GB1516773A
(en)
Applications Claiming Priority (1)
Application Number
Priority Date
Filing Date
Title
DE2544725A
DE2544725C3
(en)
1975-10-07
1975-10-07
Electron beam evaporator
Publications (1)
Publication Number
Publication Date
GB1516773A
true
GB1516773A
(en)
1978-07-05
Family
ID=5958462
Family Applications (1)
Application Number
Title
Priority Date
Filing Date
GB40971/76A
Expired
GB1516773A
(en)
1975-10-07
1976-10-01
Electron beam vaporiser
Country Status (9)
Country
Link
US
(1)
US4115653A
(en)
JP
(1)
JPS5246384A
(en)
BE
(1)
BE847029A
(en)
CH
(1)
CH621580A5
(en)
DE
(1)
DE2544725C3
(en)
FR
(1)
FR2327637A1
(en)
GB
(1)
GB1516773A
(en)
LU
(1)
LU75884A1
(en)
NL
(1)
NL7611034A
(en)
Cited By (1)
* Cited by examiner, † Cited by third party
Publication number
Priority date
Publication date
Assignee
Title
CN110797242A
(en)
*
2019-11-04
2020-02-14
中国航空制造技术研究院
Cold cathode electron gun device for coating film
Families Citing this family (13)
* Cited by examiner, † Cited by third party
Publication number
Priority date
Publication date
Assignee
Title
JPS58195438U
(en)
*
1982-06-22
1983-12-26
日本電気株式会社
integrated circuit transport vehicle
JPS59133663U
(en)
*
1983-02-23
1984-09-07
日本電気ホームエレクトロニクス株式会社
Electron beam evaporation equipment
US4620081A
(en)
*
1984-08-03
1986-10-28
The United States Of America As Represented By The United States Department Of Energy
Self-contained hot-hollow cathode gun source assembly
JPH0417281Y2
(en)
*
1984-08-31
1992-04-17
CH663037A5
(en)
*
1985-02-05
1987-11-13
Balzers Hochvakuum
STEAM SOURCE FOR VACUUM COATING SYSTEMS.
JPS6119502A
(en)
*
1985-06-19
1986-01-28
Matsushita Electric Ind Co Ltd
Spindle device
US4983806A
(en)
*
1990-03-01
1991-01-08
Harper James L
Method and device for cooling electron beam gun
US5473627A
(en)
*
1992-11-05
1995-12-05
Mdc Vacuum Products Corporation
UHV rotating fluid delivery system
US5338913A
(en)
*
1992-12-28
1994-08-16
Tfi Telemark
Electron beam gun with liquid cooled rotatable crucible
DE19623701A1
(en)
*
1996-06-14
1997-12-18
Leybold Systems Gmbh
Device and method for electron beam evaporation
TW591202B
(en)
*
2001-10-26
2004-06-11
Hermosa Thin Film Co Ltd
Dynamic film thickness control device/method and ITS coating method
DE102018108726B4
(en)
*
2018-04-12
2019-11-07
VON ARDENNE Asset GmbH & Co. KG
Electron beam evaporator and method for evaporating a vaporized material by means of an electron beam
EP3840012A1
(en)
*
2019-12-20
2021-06-23
Essilor International
Optimized crucible assembly and method for physical vapor deposition
Family Cites Families (6)
* Cited by examiner, † Cited by third party
Publication number
Priority date
Publication date
Assignee
Title
US2745773A
(en)
*
1953-03-25
1956-05-15
Rca Corp
Apparatus and method for forming juxtaposed as well as superimposed coatings
GB875399A
(en)
*
1958-12-04
1961-08-16
Ass Elect Ind
Electron beam furnace
US3250842A
(en)
*
1963-01-15
1966-05-10
Atomic Energy Commission
Electron beam zone refining
CH427744A
(en)
*
1965-11-26
1967-01-15
Balzers Patent Beteilig Ag
Process for the thermal evaporation of mixtures of substances in a vacuum
JPS4517178Y1
(en)
*
1967-06-14
1970-07-15
DE1797031A1
(en)
*
1968-08-06
1971-07-01
Bosch Photokino Gmbh
Electrically powered motion picture camera
1975
1975-10-07
DE
DE2544725A
patent/DE2544725C3/en
not_active
Expired
1976
1976-09-24
CH
CH1212676A
patent/CH621580A5/de
not_active
IP Right Cessation
1976-09-28
LU
LU75884A
patent/LU75884A1/xx
unknown
1976-10-01
GB
GB40971/76A
patent/GB1516773A/en
not_active
Expired
1976-10-04
US
US05/729,575
patent/US4115653A/en
not_active
Expired – Lifetime
1976-10-06
NL
NL7611034A
patent/NL7611034A/en
not_active
Application Discontinuation
1976-10-07
BE
BE171306A
patent/BE847029A/en
not_active
IP Right Cessation
1976-10-07
FR
FR7630197A
patent/FR2327637A1/en
active
Granted
1976-10-07
JP
JP51120802A
patent/JPS5246384A/en
active
Pending
Cited By (2)
* Cited by examiner, † Cited by third party
Publication number
Priority date
Publication date
Assignee
Title
CN110797242A
(en)
*
2019-11-04
2020-02-14
中国航空制造技术研究院
Cold cathode electron gun device for coating film
CN110797242B
(en)
*
2019-11-04
2022-06-10
中国航空制造技术研究院
Cold cathode electron gun device for coating film
Also Published As
Publication number
Publication date
CH621580A5
(en)
1981-02-13
US4115653A
(en)
1978-09-19
LU75884A1
(en)
1977-05-11
NL7611034A
(en)
1977-04-13
DE2544725A1
(en)
1977-04-21
DE2544725B2
(en)
1980-04-17
FR2327637B1
(en)
1982-04-09
DE2544725C3
(en)
1981-01-08
JPS5246384A
(en)
1977-04-13
BE847029A
(en)
1977-01-31
FR2327637A1
(en)
1977-05-06
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Legal Events
Date
Code
Title
Description
1978-11-08
PS
Patent sealed [section 19, patents act 1949]
1996-10-23
PE20
Patent expired after termination of 20 years
Effective date:
19960930
