AU3180371A – Integrated insulated-gate field effect transistor devices
– Google Patents
AU3180371A – Integrated insulated-gate field effect transistor devices
– Google Patents
Integrated insulated-gate field effect transistor devices
Info
Publication number
AU3180371A
AU3180371A
AU31803/71A
AU3180371A
AU3180371A
AU 3180371 A
AU3180371 A
AU 3180371A
AU 31803/71 A
AU31803/71 A
AU 31803/71A
AU 3180371 A
AU3180371 A
AU 3180371A
AU 3180371 A
AU3180371 A
AU 3180371A
Authority
AU
Australia
Prior art keywords
field effect
effect transistor
gate field
transistor devices
integrated insulated
Prior art date
1970-09-02
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
AU31803/71A
Inventor
Utz Dr Baitinger
Hermann Frantz
Werner Haug
Rolf Dr Remshardt
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
International Business Machines Corp
Original Assignee
International Business Machines Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
1970-09-02
Filing date
1971-07-29
Publication date
1973-02-01
1971-07-29
Application filed by International Business Machines Corp
filed
Critical
International Business Machines Corp
1973-02-01
Publication of AU3180371A
publication
Critical
patent/AU3180371A/en
Status
Expired
legal-status
Critical
Current
Links
Espacenet
Global Dossier
Discuss
230000005669
field effect
Effects
0.000
title
1
Classifications
H—ELECTRICITY
H01—ELECTRIC ELEMENTS
H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
H01L29/00—Semiconductor devices adapted for rectifying, amplifying, oscillating or switching, or capacitors or resistors with at least one potential-jump barrier or surface barrier, e.g. PN junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
H01L29/02—Semiconductor bodies ; Multistep manufacturing processes therefor
H01L29/06—Semiconductor bodies ; Multistep manufacturing processes therefor characterised by their shape; characterised by the shapes, relative sizes, or dispositions of the semiconductor regions ; characterised by the concentration or distribution of impurities within semiconductor regions
H01L29/0603—Semiconductor bodies ; Multistep manufacturing processes therefor characterised by their shape; characterised by the shapes, relative sizes, or dispositions of the semiconductor regions ; characterised by the concentration or distribution of impurities within semiconductor regions characterised by particular constructional design considerations, e.g. for preventing surface leakage, for controlling electric field concentration or for internal isolations regions
H01L29/0607—Semiconductor bodies ; Multistep manufacturing processes therefor characterised by their shape; characterised by the shapes, relative sizes, or dispositions of the semiconductor regions ; characterised by the concentration or distribution of impurities within semiconductor regions characterised by particular constructional design considerations, e.g. for preventing surface leakage, for controlling electric field concentration or for internal isolations regions for preventing surface leakage or controlling electric field concentration
H01L29/0638—Semiconductor bodies ; Multistep manufacturing processes therefor characterised by their shape; characterised by the shapes, relative sizes, or dispositions of the semiconductor regions ; characterised by the concentration or distribution of impurities within semiconductor regions characterised by particular constructional design considerations, e.g. for preventing surface leakage, for controlling electric field concentration or for internal isolations regions for preventing surface leakage or controlling electric field concentration for preventing surface leakage due to surface inversion layer, e.g. with channel stopper
H—ELECTRICITY
H01—ELECTRIC ELEMENTS
H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
H—ELECTRICITY
H01—ELECTRIC ELEMENTS
H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
H01L23/00—Details of semiconductor or other solid state devices
H01L23/52—Arrangements for conducting electric current within the device in operation from one component to another, i.e. interconnections, e.g. wires, lead frames
H01L23/522—Arrangements for conducting electric current within the device in operation from one component to another, i.e. interconnections, e.g. wires, lead frames including external interconnections consisting of a multilayer structure of conductive and insulating layers inseparably formed on the semiconductor body
H—ELECTRICITY
H01—ELECTRIC ELEMENTS
H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
H01L29/00—Semiconductor devices adapted for rectifying, amplifying, oscillating or switching, or capacitors or resistors with at least one potential-jump barrier or surface barrier, e.g. PN junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
H—ELECTRICITY
H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
H10B—ELECTRONIC MEMORY DEVICES
H10B20/00—Read-only memory [ROM] devices
H—ELECTRICITY
H01—ELECTRIC ELEMENTS
H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
H01L2924/0001—Technical content checked by a classifier
H01L2924/0002—Not covered by any one of groups H01L24/00, H01L24/00 and H01L2224/00
AU31803/71A
1970-09-02
1971-07-29
Integrated insulated-gate field effect transistor devices
Expired
AU3180371A
(en)
Applications Claiming Priority (2)
Application Number
Priority Date
Filing Date
Title
DE19702043405
DE2043405A1
(en)
1970-09-02
1970-09-02
Semiconductor arrangement with monolithically integrated insulating layer field effect transistors
DEDE82043
1970-09-04
Publications (1)
Publication Number
Publication Date
AU3180371A
true
AU3180371A
(en)
1973-02-01
Family
ID=5781308
Family Applications (1)
Application Number
Title
Priority Date
Filing Date
AU31803/71A
Expired
AU3180371A
(en)
1970-09-02
1971-07-29
Integrated insulated-gate field effect transistor devices
Country Status (8)
Country
Link
AU
(1)
AU3180371A
(en)
BE
(1)
BE770898A
(en)
CH
(1)
CH534431A
(en)
DE
(1)
DE2043405A1
(en)
ES
(1)
ES394706A1
(en)
FR
(1)
FR2105176B1
(en)
GB
(1)
GB1353366A
(en)
NL
(1)
NL7112058A
(en)
Families Citing this family (1)
* Cited by examiner, † Cited by third party
Publication number
Priority date
Publication date
Assignee
Title
FR2572851B1
(en)
*
1984-11-08
1987-07-31
Matra Harris Semiconducteurs
PREDIFFUSED NETWORK WITH INTERCONNECTABLE BASE CELLS
1970
1970-09-02
DE
DE19702043405
patent/DE2043405A1/en
active
Pending
1971
1971-07-20
FR
FR7127187A
patent/FR2105176B1/fr
not_active
Expired
1971-07-29
AU
AU31803/71A
patent/AU3180371A/en
not_active
Expired
1971-08-03
BE
BE770898A
patent/BE770898A/en
unknown
1971-08-31
GB
GB4055471A
patent/GB1353366A/en
not_active
Expired
1971-09-01
CH
CH1286271A
patent/CH534431A/en
not_active
IP Right Cessation
1971-09-01
NL
NL7112058A
patent/NL7112058A/xx
unknown
1971-09-01
ES
ES394706A
patent/ES394706A1/en
not_active
Expired
Also Published As
Publication number
Publication date
GB1353366A
(en)
1974-05-15
BE770898A
(en)
1971-12-16
NL7112058A
(en)
1972-03-06
CH534431A
(en)
1973-02-28
DE2043405A1
(en)
1972-03-16
FR2105176B1
(en)
1974-10-31
FR2105176A1
(en)
1972-04-28
ES394706A1
(en)
1975-11-01
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