AU4455297A – Alkysulfonyloximes for high-resolution i-line photoresists of high sensitivity
– Google Patents
AU4455297A – Alkysulfonyloximes for high-resolution i-line photoresists of high sensitivity
– Google Patents
Alkysulfonyloximes for high-resolution i-line photoresists of high sensitivity
Info
Publication number
AU4455297A
AU4455297A
AU44552/97A
AU4455297A
AU4455297A
AU 4455297 A
AU4455297 A
AU 4455297A
AU 44552/97 A
AU44552/97 A
AU 44552/97A
AU 4455297 A
AU4455297 A
AU 4455297A
AU 4455297 A
AU4455297 A
AU 4455297A
Authority
AU
Australia
Prior art keywords
c4alkyl
group
unsubstituted
substituted
hydrogen
Prior art date
1996-09-02
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
AU44552/97A
Other versions
AU726458B2
(en
Inventor
Christoph De Leo
Kurt Dietliker
Martin Kunz
Hitoshi Yamato
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
BASF Schweiz AG
Original Assignee
Ciba Spezialitaetenchemie Holding AG
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
1996-09-02
Filing date
1997-08-22
Publication date
1998-03-26
1997-08-22
Application filed by Ciba Spezialitaetenchemie Holding AG
filed
Critical
Ciba Spezialitaetenchemie Holding AG
1998-03-26
Publication of AU4455297A
publication
Critical
patent/AU4455297A/en
2000-11-09
Application granted
granted
Critical
2000-11-09
Publication of AU726458B2
publication
Critical
patent/AU726458B2/en
2017-08-22
Anticipated expiration
legal-status
Critical
Status
Ceased
legal-status
Critical
Current
Links
Espacenet
Global Dossier
Discuss
Classifications
G—PHYSICS
G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
G03F7/004—Photosensitive materials
C—CHEMISTRY; METALLURGY
C07—ORGANIC CHEMISTRY
C07D—HETEROCYCLIC COMPOUNDS
C07D333/00—Heterocyclic compounds containing five-membered rings having one sulfur atom as the only ring hetero atom
C07D333/02—Heterocyclic compounds containing five-membered rings having one sulfur atom as the only ring hetero atom not condensed with other rings
C07D333/04—Heterocyclic compounds containing five-membered rings having one sulfur atom as the only ring hetero atom not condensed with other rings not substituted on the ring sulphur atom
C07D333/06—Heterocyclic compounds containing five-membered rings having one sulfur atom as the only ring hetero atom not condensed with other rings not substituted on the ring sulphur atom with only hydrogen atoms, hydrocarbon or substituted hydrocarbon radicals, directly attached to the ring carbon atoms
C07D333/22—Radicals substituted by doubly bound hetero atoms, or by two hetero atoms other than halogen singly bound to the same carbon atom
C—CHEMISTRY; METALLURGY
C07—ORGANIC CHEMISTRY
C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
C07C309/00—Sulfonic acids; Halides, esters, or anhydrides thereof
C07C309/63—Esters of sulfonic acids
C07C309/64—Esters of sulfonic acids having sulfur atoms of esterified sulfo groups bound to acyclic carbon atoms
C07C309/65—Esters of sulfonic acids having sulfur atoms of esterified sulfo groups bound to acyclic carbon atoms of a saturated carbon skeleton
C—CHEMISTRY; METALLURGY
C07—ORGANIC CHEMISTRY
C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
C07C309/00—Sulfonic acids; Halides, esters, or anhydrides thereof
C07C309/63—Esters of sulfonic acids
C07C309/64—Esters of sulfonic acids having sulfur atoms of esterified sulfo groups bound to acyclic carbon atoms
C07C309/65—Esters of sulfonic acids having sulfur atoms of esterified sulfo groups bound to acyclic carbon atoms of a saturated carbon skeleton
C07C309/66—Methanesulfonates
C—CHEMISTRY; METALLURGY
C07—ORGANIC CHEMISTRY
C07D—HETEROCYCLIC COMPOUNDS
C07D333/00—Heterocyclic compounds containing five-membered rings having one sulfur atom as the only ring hetero atom
C07D333/02—Heterocyclic compounds containing five-membered rings having one sulfur atom as the only ring hetero atom not condensed with other rings
C07D333/04—Heterocyclic compounds containing five-membered rings having one sulfur atom as the only ring hetero atom not condensed with other rings not substituted on the ring sulphur atom
C07D333/06—Heterocyclic compounds containing five-membered rings having one sulfur atom as the only ring hetero atom not condensed with other rings not substituted on the ring sulphur atom with only hydrogen atoms, hydrocarbon or substituted hydrocarbon radicals, directly attached to the ring carbon atoms
C07D333/24—Radicals substituted by carbon atoms having three bonds to hetero atoms with at the most one bond to halogen, e.g. ester or nitrile radicals
G—PHYSICS
G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
G—PHYSICS
G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
G03F7/004—Photosensitive materials
G03F7/0045—Photosensitive materials with organic non-macromolecular light-sensitive compounds not otherwise provided for, e.g. dissolution inhibitors
Abstract
The invention describes the use of oxime alkyl sulfonate compounds of formula (1), wherein R is naphthyl, (2) or (3); R0 is either an R1-X group or R2; X is a direct bond, an oxygen atom or a sulfur atom; R1 is hydrogen, C1-C4alkyl or a phenyl group which is unsubstituted or substituted by a substituent selected from the group consisting of chloro, bromo, C1-C4alkyl and C1-C4-alkyloxy; R2 is hydrogen or C1-C4alkyl; and R3 is straight-chain or branched C1-C12alkyl which is unsubstituted or substituted by one or more than one halogen atom; as photosentisitve acid generator in a chemically amplified photoresist which is developable in alkaline medium and which is sensitive to radiation at a wavelength of 340 to 390 nanometers and correspondingly composed positive and negative photoresists for the above-mentioned wavelength range.
AU44552/97A
1996-09-02
1997-08-22
Alkysulfonyloximes for high-resolution I-line photoresists of high sensitivity
Ceased
AU726458B2
(en)
Applications Claiming Priority (3)
Application Number
Priority Date
Filing Date
Title
CH214796
1996-09-02
CH2147/96
1996-09-02
PCT/EP1997/004566
WO1998010335A1
(en)
1996-09-02
1997-08-22
Alkysulfonyloximes for high-resolution i-line photoresists of high sensitivity
Publications (2)
Publication Number
Publication Date
AU4455297A
true
AU4455297A
(en)
1998-03-26
AU726458B2
AU726458B2
(en)
2000-11-09
Family
ID=4226975
Family Applications (1)
Application Number
Title
Priority Date
Filing Date
AU44552/97A
Ceased
AU726458B2
(en)
1996-09-02
1997-08-22
Alkysulfonyloximes for high-resolution I-line photoresists of high sensitivity
Country Status (14)
Country
Link
EP
(1)
EP0925529B1
(en)
JP
(1)
JP3875271B2
(en)
KR
(1)
KR100686473B1
(en)
CN
(1)
CN1133901C
(en)
AT
(1)
ATE237830T1
(en)
AU
(1)
AU726458B2
(en)
BR
(1)
BR9713311A
(en)
CA
(1)
CA2263254A1
(en)
DE
(1)
DE69721019T2
(en)
ES
(1)
ES2194218T3
(en)
ID
(1)
ID17338A
(en)
MY
(1)
MY118505A
(en)
TW
(1)
TW497011B
(en)
WO
(1)
WO1998010335A1
(en)
Families Citing this family (16)
* Cited by examiner, † Cited by third party
Publication number
Priority date
Publication date
Assignee
Title
TW550439B
(en)
*
1997-07-01
2003-09-01
Ciba Sc Holding Ag
New oxime sulfonates as latent acids and compositions and photoresists comprising said oxime sulfonates
DK199901098A
(en)
*
1998-08-18
2000-02-19
Ciba Sc Holding Ag
Sylphony oxymers for in-line photoresists with high sensitivity and high resistance thickness
TW575792B
(en)
*
1998-08-19
2004-02-11
Ciba Sc Holding Ag
New unsaturated oxime derivatives and the use thereof as latent acids
WO2000014602A1
(en)
*
1998-09-04
2000-03-16
Polaroid Corporation
Process for forming a color filter
CN1205215C
(en)
*
1998-10-29
2005-06-08
西巴特殊化学品控股有限公司
Oxime derivatives and the use thereof as latent acids
JP2002538241A
(en)
*
1999-03-03
2002-11-12
チバ スペシャルティ ケミカルズ ホールディング インコーポレーテッド
Oxime derivatives and their use as photoinitiators
US6576394B1
(en)
2000-06-16
2003-06-10
Clariant Finance (Bvi) Limited
Negative-acting chemically amplified photoresist composition
US6482567B1
(en)
*
2000-08-25
2002-11-19
Shipley Company, L.L.C.
Oxime sulfonate and N-oxyimidosulfonate photoacid generators and photoresists comprising same
TW589514B
(en)
*
2001-09-13
2004-06-01
Matsushita Electric Ind Co Ltd
Pattern formation material and pattern formation method
KR20040089607A
(en)
*
2002-02-06
2004-10-21
시바 스페셜티 케미칼스 홀딩 인크.
Sulfonate derivatives and the use thereof as latent acids
JP4924813B2
(en)
*
2004-10-29
2012-04-25
日産化学工業株式会社
Dye-containing resist composition containing photoacid generator and color filter using the same
US8049186B2
(en)
*
2006-08-24
2011-11-01
Basf Se
UV-dosis indicators
GB2450975B
(en)
2007-07-12
2010-02-24
Ciba Holding Inc
Yellow radiation curing inks
CN101638374A
(en)
*
2008-07-28
2010-02-03
住友化学株式会社
Oxime compound and resist composition containing the same
US20120043480A1
(en)
2009-03-30
2012-02-23
Basf Se
Uv-dose indicator films
JP6605820B2
(en)
*
2015-03-11
2019-11-13
株式会社Ａｄｅｋａ
Oxime sulfonate compound, photoacid generator, resist composition, cationic polymerization initiator, and cationic polymerizable composition
Family Cites Families (9)
* Cited by examiner, † Cited by third party
Publication number
Priority date
Publication date
Assignee
Title
US4123255A
(en)
*
1977-01-03
1978-10-31
Chevron Research Company
O-sulfonyl-alpha-cyano 2,6-dihalobenzaldoximes
US4540598A
(en)
*
1983-08-17
1985-09-10
Ciba-Geigy Corporation
Process for curing acid-curable finishes
GB8608528D0
(en)
*
1986-04-08
1986-05-14
Ciba Geigy Ag
Production of positive images
US5019488A
(en)
*
1988-09-29
1991-05-28
Hoechst Celanese Corporation
Method of producing an image reversal negative photoresist having a photo-labile blocked imide
KR900005226A
(en)
*
1988-09-29
1990-04-13
윌리엄 비이 해리스
Photosensitive composition and method of producing positive and negative phases
EP0571330B1
(en)
*
1992-05-22
1999-04-07
Ciba SC Holding AG
High-resolution photoresist with enhanced sensitivity for I-line exposure
JP3456808B2
(en)
*
1995-09-29
2003-10-14
東京応化工業株式会社
Photoresist composition
JP3587413B2
(en)
*
1995-12-20
2004-11-10
東京応化工業株式会社
Chemically amplified resist composition and acid generator used therein
JP3665166B2
(en)
*
1996-07-24
2005-06-29
東京応化工業株式会社
Chemically amplified resist composition and acid generator used therefor
1997
1997-08-22
WO
PCT/EP1997/004566
patent/WO1998010335A1/en
not_active
Application Discontinuation
1997-08-22
DE
DE69721019T
patent/DE69721019T2/en
not_active
Expired – Lifetime
1997-08-22
KR
KR1019997001646A
patent/KR100686473B1/en
not_active
IP Right Cessation
1997-08-22
EP
EP97942870A
patent/EP0925529B1/en
not_active
Expired – Lifetime
1997-08-22
AU
AU44552/97A
patent/AU726458B2/en
not_active
Ceased
1997-08-22
AT
AT97942870T
patent/ATE237830T1/en
not_active
IP Right Cessation
1997-08-22
BR
BR9713311-6A
patent/BR9713311A/en
unknown
1997-08-22
CA
CA002263254A
patent/CA2263254A1/en
not_active
Abandoned
1997-08-22
JP
JP51105898A
patent/JP3875271B2/en
not_active
Expired – Lifetime
1997-08-22
CN
CNB971975574A
patent/CN1133901C/en
not_active
Expired – Lifetime
1997-08-22
ES
ES97942870T
patent/ES2194218T3/en
not_active
Expired – Lifetime
1997-08-29
ID
IDP973037A
patent/ID17338A/en
unknown
1997-08-30
MY
MYPI97004036A
patent/MY118505A/en
unknown
1997-09-02
TW
TW086112586A
patent/TW497011B/en
not_active
IP Right Cessation
Also Published As
Publication number
Publication date
AU726458B2
(en)
2000-11-09
BR9713311A
(en)
2000-02-01
ID17338A
(en)
1997-12-18
KR20000068387A
(en)
2000-11-25
CN1133901C
(en)
2004-01-07
JP2000517067A
(en)
2000-12-19
EP0925529A1
(en)
1999-06-30
JP3875271B2
(en)
2007-01-31
DE69721019T2
(en)
2003-12-24
ATE237830T1
(en)
2003-05-15
ES2194218T3
(en)
2003-11-16
DE69721019D1
(en)
2003-05-22
TW497011B
(en)
2002-08-01
CA2263254A1
(en)
1998-03-12
WO1998010335A1
(en)
1998-03-12
EP0925529B1
(en)
2003-04-16
KR100686473B1
(en)
2007-02-26
MY118505A
(en)
2004-11-30
CN1228851A
(en)
1999-09-15
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Legal Events
Date
Code
Title
Description
2001-03-08
FGA
Letters patent sealed or granted (standard patent)
2004-03-25
MK14
Patent ceased section 143(a) (annual fees not paid) or expired
