AU466830B2

AU466830B2 – Charge coupled devices with continuous resistor electrode
– Google Patents

AU466830B2 – Charge coupled devices with continuous resistor electrode
– Google Patents
Charge coupled devices with continuous resistor electrode

Info

Publication number
AU466830B2

AU466830B2
AU40185/72A
AU4018572A
AU466830B2
AU 466830 B2
AU466830 B2
AU 466830B2
AU 40185/72 A
AU40185/72 A
AU 40185/72A
AU 4018572 A
AU4018572 A
AU 4018572A
AU 466830 B2
AU466830 B2
AU 466830B2
Authority
AU
Australia
Prior art keywords
charge coupled
coupled devices
resistor electrode
continuous resistor
continuous
Prior art date
1971-04-21
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)

Expired

Application number
AU40185/72A
Other versions

AU4018572A
(en

Inventor
KIM and EDWARD HUNTER SNOW CHOONG-HI
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)

Fairchild Semiconductor Corp

Original Assignee
Fairchild Camera and Instrument Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
1971-04-21
Filing date
1972-03-20
Publication date
1973-09-27

1972-03-20
Application filed by Fairchild Camera and Instrument Corp
filed
Critical
Fairchild Camera and Instrument Corp

1973-09-27
Application granted
granted
Critical

1973-09-27
Publication of AU4018572A
publication
Critical
patent/AU4018572A/en

1973-09-27
Publication of AU466830B2
publication
Critical
patent/AU466830B2/en

Status
Expired
legal-status
Critical
Current

Links

Espacenet

Global Dossier

Discuss

Classifications

H—ELECTRICITY

H01—ELECTRIC ELEMENTS

H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10

H01L29/00—Semiconductor devices adapted for rectifying, amplifying, oscillating or switching, or capacitors or resistors with at least one potential-jump barrier or surface barrier, e.g. PN junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof  ; Multistep manufacturing processes therefor

H01L29/40—Electrodes ; Multistep manufacturing processes therefor

H01L29/43—Electrodes ; Multistep manufacturing processes therefor characterised by the materials of which they are formed

H01L29/435—Resistive materials for field effect devices, e.g. resistive gate for MOSFET or MESFET

H—ELECTRICITY

H01—ELECTRIC ELEMENTS

H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10

H01L27/00—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate

H01L27/14—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation

H01L27/144—Devices controlled by radiation

H01L27/146—Imager structures

H01L27/148—Charge coupled imagers

H01L27/14806—Structural or functional details thereof

H01L27/14812—Special geometry or disposition of pixel-elements, address lines or gate-electrodes

H—ELECTRICITY

H01—ELECTRIC ELEMENTS

H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10

H01L29/00—Semiconductor devices adapted for rectifying, amplifying, oscillating or switching, or capacitors or resistors with at least one potential-jump barrier or surface barrier, e.g. PN junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof  ; Multistep manufacturing processes therefor

H01L29/40—Electrodes ; Multistep manufacturing processes therefor

H01L29/43—Electrodes ; Multistep manufacturing processes therefor characterised by the materials of which they are formed

H01L29/49—Metal-insulator-semiconductor electrodes, e.g. gates of MOSFET

H01L29/4916—Metal-insulator-semiconductor electrodes, e.g. gates of MOSFET the conductor material next to the insulator being a silicon layer, e.g. polysilicon doped with boron, phosphorus or nitrogen

H—ELECTRICITY

H01—ELECTRIC ELEMENTS

H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10

H01L29/00—Semiconductor devices adapted for rectifying, amplifying, oscillating or switching, or capacitors or resistors with at least one potential-jump barrier or surface barrier, e.g. PN junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof  ; Multistep manufacturing processes therefor

H01L29/40—Electrodes ; Multistep manufacturing processes therefor

H01L29/43—Electrodes ; Multistep manufacturing processes therefor characterised by the materials of which they are formed

H01L29/49—Metal-insulator-semiconductor electrodes, e.g. gates of MOSFET

H01L29/4983—Metal-insulator-semiconductor electrodes, e.g. gates of MOSFET with a lateral structure, e.g. a Polysilicon gate with a lateral doping variation or with a lateral composition variation or characterised by the sidewalls being composed of conductive, resistive or dielectric material

H—ELECTRICITY

H01—ELECTRIC ELEMENTS

H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10

H01L29/00—Semiconductor devices adapted for rectifying, amplifying, oscillating or switching, or capacitors or resistors with at least one potential-jump barrier or surface barrier, e.g. PN junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof  ; Multistep manufacturing processes therefor

H01L29/66—Types of semiconductor device ; Multistep manufacturing processes therefor

H01L29/68—Types of semiconductor device ; Multistep manufacturing processes therefor controllable by only the electric current supplied, or only the electric potential applied, to an electrode which does not carry the current to be rectified, amplified or switched

H01L29/76—Unipolar devices, e.g. field effect transistors

H01L29/762—Charge transfer devices

H01L29/765—Charge-coupled devices

H01L29/768—Charge-coupled devices with field effect produced by an insulated gate

H01L29/76866—Surface Channel CCD

G—PHYSICS

G11—INFORMATION STORAGE

G11C—STATIC STORES

G11C19/00—Digital stores in which the information is moved stepwise, e.g. shift registers

G11C19/28—Digital stores in which the information is moved stepwise, e.g. shift registers using semiconductor elements

G11C19/282—Digital stores in which the information is moved stepwise, e.g. shift registers using semiconductor elements with charge storage in a depletion layer, i.e. charge coupled devices [CCD]

AU40185/72A
1971-04-21
1972-03-20
Charge coupled devices with continuous resistor electrode

Expired

AU466830B2
(en)

Applications Claiming Priority (2)

Application Number
Priority Date
Filing Date
Title

US13608771A

1971-04-21
1971-04-21

USUS136087

1971-04-21

Publications (2)

Publication Number
Publication Date

AU4018572A

AU4018572A
(en)

1973-09-27

AU466830B2
true

AU466830B2
(en)

1973-09-27

Family
ID=22471226
Family Applications (1)

Application Number
Title
Priority Date
Filing Date

AU40185/72A
Expired

AU466830B2
(en)

1971-04-21
1972-03-20
Charge coupled devices with continuous resistor electrode

Country Status (9)

Country
Link

US
(1)

US3728590A
(en)

JP
(1)

JPS5653369U
(en)

AU
(1)

AU466830B2
(en)

CA
(1)

CA948330A
(en)

DE
(1)

DE2210165A1
(en)

FR
(1)

FR2133893B1
(en)

GB
(1)

GB1316229A
(en)

IT
(1)

IT948967B
(en)

NL
(1)

NL7200401A
(en)

Families Citing this family (21)

* Cited by examiner, † Cited by third party

Publication number
Priority date
Publication date
Assignee
Title

US4157563A
(en)

*

1971-07-02
1979-06-05
U.S. Philips Corporation
Semiconductor device

US3946418A
(en)

*

1972-11-01
1976-03-23
General Electric Company
Resistive gate field effect transistor

DE2254754C3
(en)

*

1972-11-09
1980-11-20
Deutsche Itt Industries Gmbh, 7800 Freiburg

Integrated IG-FET bucket chain circuit

US3896474A
(en)

*

1973-09-10
1975-07-22
Fairchild Camera Instr Co
Charge coupled area imaging device with column anti-blooming control

US3896485A
(en)

*

1973-12-03
1975-07-22
Fairchild Camera Instr Co
Charge-coupled device with overflow protection

JPS51118969A
(en)

*

1975-04-11
1976-10-19
Fujitsu Ltd
Manufacturing method of semiconductor memory

US3943545A
(en)

*

1975-05-22
1976-03-09
Fairchild Camera And Instrument Corporation
Low interelectrode leakage structure for charge-coupled devices

DE2532789A1
(en)

*

1975-07-22
1977-02-10
Siemens Ag

CHARGE-COUPLED SEMI-CONDUCTOR ARRANGEMENT

US4156247A
(en)

*

1976-12-15
1979-05-22
Electron Memories & Magnetic Corporation
Two-phase continuous poly silicon gate CCD

US4189826A
(en)

*

1977-03-07
1980-02-26
Eastman Kodak Company
Silicon charge-handling device employing SiC electrodes

US4319261A
(en)

*

1980-05-08
1982-03-09
Westinghouse Electric Corp.
Self-aligned, field aiding double polysilicon CCD electrode structure

JPS5737870A
(en)

*

1980-08-20
1982-03-02
Toshiba Corp
Semiconductor device

NL8203870A
(en)

*

1982-10-06
1984-05-01
Philips Nv

SEMICONDUCTOR DEVICE.

US4675714A
(en)

*

1983-02-15
1987-06-23
Rockwell International Corporation
Gapless gate charge coupled device

US4580156A
(en)

*

1983-12-30
1986-04-01
At&T Bell Laboratories
Structured resistive field shields for low-leakage high voltage devices

DE68923301D1
(en)

*

1988-02-17
1995-08-10
Fujitsu Ltd

Semiconductor device with a thin insulating layer.

US5214304A
(en)

*

1988-02-17
1993-05-25
Fujitsu Limited
Semiconductor device

US4951106A
(en)

*

1988-03-24
1990-08-21
Tektronix, Inc.
Detector device for measuring the intensity of electromagnetic radiation

US5393971A
(en)

*

1993-06-14
1995-02-28
Ball Corporation
Radiation detector and charge transport device for use in signal processing systems having a stepped potential gradient means

US5793070A
(en)

*

1996-04-24
1998-08-11
Massachusetts Institute Of Technology
Reduction of trapping effects in charge transfer devices

US7217601B1
(en)

2002-10-23
2007-05-15
Massachusetts Institute Of Technology
High-yield single-level gate charge-coupled device design and fabrication

Family Cites Families (4)

* Cited by examiner, † Cited by third party

Publication number
Priority date
Publication date
Assignee
Title

FR1535286A
(en)

*

1966-09-26
1968-08-02
Gen Micro Electronics

Field effect metal oxide semiconductor transistor and method of manufacturing same

US3473032A
(en)

*

1968-02-08
1969-10-14
Inventors & Investors Inc
Photoelectric surface induced p-n junction device

US3611070A
(en)

*

1970-06-15
1971-10-05
Gen Electric
Voltage-variable capacitor with controllably extendible pn junction region

CH561459A5
(en)

*

1973-03-07
1975-04-30
Siemens Ag

1971

1971-04-21
US
US00136087A
patent/US3728590A/en
not_active
Expired – Lifetime

1971-11-25
CA
CA128,591A
patent/CA948330A/en
not_active
Expired

1971-12-22
GB
GB5972971A
patent/GB1316229A/en
not_active
Expired

1972

1972-01-11
NL
NL7200401A
patent/NL7200401A/xx
unknown

1972-01-31
IT
IT67272/72A
patent/IT948967B/en
active

1972-03-03
DE
DE19722210165
patent/DE2210165A1/en
active
Pending

1972-03-20
AU
AU40185/72A
patent/AU466830B2/en
not_active
Expired

1972-04-19
FR
FR7213782A
patent/FR2133893B1/fr
not_active
Expired

1980

1980-08-13
JP
JP1980113861U
patent/JPS5653369U/ja
active
Pending

Also Published As

Publication number
Publication date

AU4018572A
(en)

1973-09-27

NL7200401A
(en)

1972-10-24

CA948330A
(en)

1974-05-28

DE2210165A1
(en)

1972-10-26

IT948967B
(en)

1973-06-11

JPS5653369U
(en)

1981-05-11

US3728590A
(en)

1973-04-17

FR2133893A1
(en)

1972-12-01

FR2133893B1
(en)

1977-08-19

GB1316229A
(en)

1973-05-09

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