AU620155B2 - Creación de Inventos y Patentes con Inteligencia Artificial

AU620155B2 – Amorphous aluminum alloys
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AU620155B2 – Amorphous aluminum alloys
– Google Patents
Amorphous aluminum alloys

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Publication number
AU620155B2

AU620155B2
AU42648/89A
AU4264889A
AU620155B2
AU 620155 B2
AU620155 B2
AU 620155B2
AU 42648/89 A
AU42648/89 A
AU 42648/89A
AU 4264889 A
AU4264889 A
AU 4264889A
AU 620155 B2
AU620155 B2
AU 620155B2
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AU
Australia
Prior art keywords
alloys
amorphous
balance
element selected
corrosion resistance
Prior art date
1988-10-15
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Application number
AU42648/89A
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AU4264889A
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Inventor
Katsuhiko Asami
Koji Hashimoto
Asahi Kawashima
Hideaki Yoshioka
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YKK Corp

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Yoshida Kogyo KK
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1988-10-15
Filing date
1989-10-06
Publication date
1992-02-13

1988-10-15
Priority claimed from JP63260020A
external-priority
patent/JPH068492B2/en

1989-04-24
Priority claimed from JP1101768A
external-priority
patent/JP2677667B2/en

1989-10-06
Application filed by Yoshida Kogyo KK
filed
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Yoshida Kogyo KK

1990-04-26
Publication of AU4264889A
publication
Critical
patent/AU4264889A/en

1992-02-13
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1992-02-13
Publication of AU620155B2
publication
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patent/AU620155B2/en

2009-10-06
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Ceased
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Classifications

C—CHEMISTRY; METALLURGY

C22—METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS

C22C—ALLOYS

C22C21/00—Alloys based on aluminium

C—CHEMISTRY; METALLURGY

C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL

C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL

C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material

C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material

C23C14/14—Metallic material, boron or silicon

C—CHEMISTRY; METALLURGY

C22—METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS

C22C—ALLOYS

C22C45/00—Amorphous alloys

C22C45/08—Amorphous alloys with aluminium as the major constituent

C—CHEMISTRY; METALLURGY

C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material

C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating

C23C14/34—Sputtering

C23C14/3464—Sputtering using more than one target

Description

I I -i -l 620155 COMMONWEALTH OF AUSTRALIA Patents Act.1952 COMPLETE SPECIFICATION
(ORIGINAL)
Class Int. Class Application Number Lodged Complete Specification Lodged Accepted r ‘Published t Priority 15 October 1988 S24 April 1989 Related Art Name of Applicants YOSHIDA KOGYO K.K. and KOJI HASHIMOTO Address of Applicants No. 1, Kanda Izumi-cho, Chiyoda-ku, Tokyo, Japan, and 2-25-5, Shogen, Izumi-ku, Sendai-shi, Miyagi, Japan Actual Inventor(s) Koji Hashimoto; Hideaki Yoshioka; Katsuhiko Asami; Asahi Kawashima Address for Service RICE CO., Patent Attorneys 28A Montague Street BALMAIN NSW 2041 Complete Specification for the invention entitled: AMORPHOUS ALUMINUM ALLOYS The following statement is a full description’of this invention including the best method of performing it known to us/e-:- -1A- BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to novel amorphous aluminum-valve metal alloys with special characteristics such as high corrosion resistance, high wear resistance and considerable toughness, which can be used industrial plants such as chemical plants as well as various fields of human life.
1 Description of the Prior Art t i r t Since Ti and Zr are corrosion resistant metals, 10 the Al alloys with Ti and/or Zr are expected to possess a high corrosion resistance. However, various compound phases exist in their crystalline alloys prepared by conventional casting methods and hence the solubility range of Ti and/or Zr in Al is narrow.
On the other hand, Ti, Zr, Nb, Ta, Mo and W belong to refractory metals. Melting points of Nb, Ta, Mo and W are higher than the boiling point of Al. It is, therefore, difficult to apply conventional casting methods for production of Al-Ti, Al-Zr and Al-Ti-Zr S 20 alloys with Nb, Ta, Mo and W. If these alloys Ssuccessfully prepared not as heterogeneous crystalline alloys but as homogeneous amorphous alloys, the alloys have a bright future prospect as novel metallic materials.
The most of passive films, which can protect metallic materials in mild envircnments, suffer break down in hydrochloric acids. Because of severe 2 corrosiveness of hydrochloric acids, there are no metallic materials which are corrosion resistant in hydrochloric acids. Currently used aluminum alloys are not exceptional.
In view of the above-foregoing, there has been a strong demand for further new metallic materials which can be used in such severe environments, that corrode almost all currently used metallic materials.
SUMMARY OF THE INVENTION It is an objective of the present invention to ;1 0 provide an aluminum-valve metal alloy, which is hardly t produced by conventional methods including melting, and S which is not a heterogeneous crystalline alloy but an $for amorphous alloy having special characteristics such as high corrosion resistance, high wear resistance and 15 considerable toughness.
The objective of the invention is achieved by an amorphous Al alloy with at least one element selected from the group of Ti and Zr as an essential component.
The present invention therefore comprises an S 20 amorphous aluminum-valve metal alloy having high corrosion resistance, high wear resistance and considerable toughness, comprising greater than 40 up to 75 at% of the sum of Zr and Ti, the balance being Al and inevitable impurities.
According to the present invention, the following preferred alloys are provided: c An amorphous aluminum-valve metal alloy with special characteristics such as high corrosion resistance, high wear resistance and considerable toughness, which consists of greater than 40 up to 60 at% of Ti, balance being Al and inevitable impurities.
An amorphous aluminum-valve metal alloy with special characteristics such as high corrosion resistance, high wear resistance and considerable toughness, which consists of less than 5 at% of at least one element selected from the group of Mo, W, Ta and Nb and greater >T0 ,1! -3than 40 up to 60 at% of the sum of Ti and at least one element selected from the group of Mo, W, Ta and Nb, balance being Al and inevitable impurities.
An amorphous aluminum-valve metal alloy with special characteristics such as high corrosion resistance, high wear resistance and considerable toughness, which consists of greater than 40 up to 75 at% of Zr, balance being Al and inevitable impurities.
An amorphous aluminum-valve metal alloy with special characteristics such as high corrosion resistance, Shigh wear resistance and considerable toughness, which ij consists of at least 5 at% of Zr and greater than 40 up to at% of the sum of Zr and Ti, balance being Al and inevitable impurities.
an amorphous aluminum-valve metal alloy with special characteristics such as high corrosion resistance, high wear resistance and considerable toughness, which consists of less than 5 at% of at least one element selected from the group of Mo, W, Ta and Nb and greater S 20 than 40 up to 75 at% of the sum of Zr and at least one tt i element selected from the group of Mo, W, Ta and Nb, balance being Al and inevitable impurities.
BRIEF DESCRIPTION OF THE DRAWINGS Figs. 1 and 2 shows apparatuses for preparing an alloy of the present invention.
i: Central axis of the chamber, 2: Substrate 3, 4 and Targets, 6: Sputtering Chamber.
DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS iJ The present invention aims to provide novel amorphous aluminum alloys of specific characteristics such as high corrosion resistance, high wear resistance v;p.
and considerable toughness.
It is generally known that an alloy has a crystalline structure in the solid state. However, an alloy having a specific composition becomes amorphous by prevention of the formation of long-range order structure during solidification through, for example, rapid solidification from the liquid state, sputter deposition or plating under the specific conditions; or by destruction of the long-range order structure of the solid alloy through ion implantation which is also or effective for supersaturation with necessary elements.
f The amorphous alloy thus formed is a homogeneous single phase supersaturated solid solution containing sufficient amounts of various alloying elements beneficial in providing specific characteristics, such as high corrosion resistance, high mechanical strength and high touhgness.
The present inventors carried out a series of researches paying their attention to the outstanding properties of amorphous alloys. They found that amorphous alloys consisting of metals having high melting points and metals having low melting points can be prepared by sputter deposition method which does not require mixing of metallic elements by melting.
Furthermore, the present inventors found that those alloys possess extremely high corrosion resistance due to formation of protective surface films by spontaneous passivation even in very corrosive acids having a poor oxidizing power such as hydrochloric acids. Therefore, Ep the present inventors made patent application Berial No. z cr3 The U.S. patent application serial No. 07/183,981 consists of the following 6 claims: 1. An amorphous aluminum-refractory metal alloy with special characteristics such as high corrosion resistance, high wear resistance and considerable toughness, which consists of 7-75 at% of at least one element selected from the group of Ta and Nb, with balance being substantially Al.
2. An amorphous aluminum-refractory metal alloy with special characteristics such as high corrosion resistance, high wear resistance and considerable toughness, which consists of at least 5 at% of at least one element selected from the group of Ta and Nb and 7- 75 at% of the sum of at least one element selected from the group of Ta and Nb and at least one element selected from the group of Ti and Zr, with balance being substantially Al.
15 3. An amorphous aluminum-refractory metal alloy with special characteristics such as high corrosion resistance, high wear resistance and considerable toughness, which consists of 7-50 at% of at least one element selected from the group of Mo and W, with 20 balance being substantially Al.
j 4. An amorphous aluminum-refractory metal alloy with special characteristics such as high corrosion tc v resistance, high wear resistance and considerable toughness, which consists of at least 5 at% of at least one element selected from the group of Mo and W and 7at% of the sum of at least one element selected from the group of Mo and W and at least one element selected from the group of Ti and Zr, with balance being substantially Al.
5. An amorphous aluminum-refractory metal alloy with special characteristics such as high corrosion resistance, high wear resistance and considerable toughness, which consists of less than 50 at% of at least one element selected from the group of Mo and W
I
i: -6and 7-75 at% of the sum of at least one element selected from the group of Mo and W and at least one element selected from the group of Ta and Nb, with balance being substantially Al.
6. An amorphous aluminum-refractory metal alloy with special characteristics such as high corrosion resistance, high wear resistance and considerable toughness, which consists of less than 50 at% of at least one element selected from the group of Mo and W, at least 5 at% in the sum of at least one element teC 10 selected from Ta and Nb and at least one element c selected from Mo and W and 7-75 at% in total of elements in three groups, that is, at least one element selected from the group of Ta and Nb, at least one element selected from the group of Mo and W, and at S 15 least one element selected from the group of Ti and Zr, with balance being substrantially Al.
The present inventors further continued the investigations paying their attention to the outstanding properties of amorphous alloys. They found that sputter deposition enables to produce the amorphous Al alloys containing Ti and/or Zr as the major alloying elements and furthermore, the amorphous Al alloys containing Ti and/or Zr as the major alloying i elements and refractory metals such as Mo, W, Ta and Nb 25 as the minor alloying elements, without requiring mixing of these metallic elements by melting.
Furthermore, the present inventors found that these alloys possess extremely high corrosion resistance due to formation of protective surface films by spontaneous passivation even in very corrosive acids having a poor oxidizing power such as hydrochloric acids. The alloys of the present invention has been accomplished on the basis of this finding.
I~ -7- C Ce Ct
PCC
i(ii C( C C C CC
III
10 Table 1 shows the components and compositions of the alloys set forth in Claims.
Table 1 (atomic Ti Zr Mo, W, Ta and Nb Al(*2) 40-60 Balance 40-60 less than 5 Balance 40-75 Balance 40-75 at least 5 Balance 40-75 less than 5 Balance At least one element selected from the group of Mo, W, Ta and Nb.
Substantially Al.
The sum of Ti and at least one element selected from the group of Mo, W, Ta and Nb.
The sum of Ti and Zr.
The sum of Zr and at least one element selected from the group of Mo, W, Ta and Nb.
The amorphous alloys produced by sputter deposition are single-phase alloys in which the alloying elements exist in a state of uniform solid solution. Accordingly, they form an extremely uniform and highly corrosion-resistant protective passive film in a poorly oxidizing environment.
Metallic materials are readily dissolved in a poorly oxidizing very aggressive hydrochloric acid.
Therefore, the metallic materials intended for use in such an environment should have an ability to form a stable protective passive film. This objective is achieved by an alloy containing effective elements as much as necessary. However, it is not desirable to add various alloying elements in large quantities to a crystalline metal, because the resulting alloys is of a multiple phase mixture, with each phase having different chemical properties, and is not so satisfactory in corrosion resistance as intended.
Moreover, the chemical heterogeneity is rather harmful 4 IC ‘t to corrosion resistance.
By contrast, the amorphous alloys of this f invention are of homogeneous solid solution.
Therefore, they homogeneously contain effective elements as much as required to form uniformly a stable passive film. Owing to the formation of this uniform passive film, the amorphous alloys of this invention exhibit a sufficiently high corrosion resistance.
In other words, metallic materials to withstand a cc 20 poorly oxidizing hydrochloric acids should form a uniform, stable passive film in such an environment.
Alloys of amorphous structure permit many alloying elements to exist in a form of single-phase solid solution, and also permit the formation of a uniform passive film.
The components and compositions of the alloys of this invention are specified as above for the following reasons: Ti, Zr, Ta, Nb, Mo and W are able to form the amorphous structure when they coexist with Al. For the formation of the amorphous structure by sputtering the Al alloys consisting of Al and Ti are required to contain 25-60 at% Ti, and the Al alloys consisting of Al and Zr are required to contain 10-75 at% Zr. The -9amorphous structure for the ternary Al-Zr-Ti alloys is formed by sputtering if the sum of Ti and at least 5 at Zr is 10-75 at%. Among these amorphous alloys the Al alloys containing at least 40 at% of Ti and/or Zr possess particularly high corrosion resistance.
Consequently the alloys in the present invention are required to contain at least 40 at Ti and/or Zr.
The Al alloys with Mo, W, Ta and/or Nb form the amorphous structure in wide composition ranges, and the addition of Mo, W, Ta and/or Nb to the Al alloys S. containing Ti and/or Zr as the major alloying elements results in the formation of the amorphous structure in wide composition ranges. However, the Al alloys containing at least 5 at% of at least one element selected from the group of Mo, W, Ta and Nb are included in US patent application No. 07/289,981. And hence in the present invention the content of at least one element selected from the group of Mo, W, Ta and Nb Z is restricted to less than 5 at%.
Ti, Zr, Mo, W, Ta and Nb are able to form a protective passive film in a poorly oxidizing acid, and Shence the amorphous alloys of the present invention have a sufficiently high corrosion resistance in corrosive environments such as hydrochloric acids.
Preparation of the alloys of the present invention is carried out by sputter deposition method.
Sputtering is performed by using a sintered or alloyed crystalline target of multiple phases whose average A composition is the same as the amorphous alloy to be prepared. Sputtering is also performed by using a target consisting of a metal sheet of one of constituents in the amorphous alloy to be prepared and other metal constituents placed on the metal sheet.
In the present invention, it is difficult to form I alloy targets of aluminum with valve metals, and hence targets consisting of an Al disc on which at least one element selected from valve metals is placed are used.
The alloys of the present invention can be produced by using the valve-metal placed Al sheet target. The apparatus shown in FIG. 1 can be used. In order to avoid local compositional heterogeneity of sputtered alloys, it is desirable to carry out revolution of the substrate disc 2 around a central axis 1 of the S, 10 sputtering chamber 6 in addition to revolution of the substrate disc itself around the center of the substrate disc. The orbit of the substrate disc is just above the center of the target 3.
In order to change widely the composition of the amorphous alloy formed, the apparatus shown in FIQ. 2 Scan be used. For instance if an Al disc is used as a target 4, a Ti-embeded Al disc is used as a target These two targets are installed obliquely in the t sputtering chamber 6, in such a way that the intersection of the normals to the centers of these two targets is on the orbit of the center of the substrate disc 2 revolving around a central axis 1 of the sputtering chamber 6 in addition to revolving the substrate disc itself around the center of the substrate disc. When these two targets are independently operated by two independent power sources, amorphous Al-Ta alloys are formed whose compositions are dependent upon the relative powers of I two targets. In this manner when different various combinations of two targets are used, different amorphous alloy such as Al-Ti, Al-Zr, Al-Ti-Zr, Al-Ti- Mo, Al-Ti-W, Al-Ti-Ta, Al-Ti-Nb, Al-Zr-Mo, Al-Zr-W, Al- Zr-Ta, Al-Zr-Nb, Al-Ti-Mo-W, Al-Ti-Mo-Ta, Al-Ti-Mo-Nb, Al-Ti-Mo-W-Ta, Al-Ti-Mo-W-Nb, Al-Ti-Mo-W-Ta-Nb, Al-Zr- -11- Mo-W, Al-Zr-Mo-Ta, Al-Zr-Mo-Nb, Al-Zr-Mo-W-Ta, Al-Zr- Mo-W-Nb and Al-Zr-Mo-W-Ta-Nb are formed.
The invention is now illustrated by the following examples: Example 1 The targets consisted of 7 and 8 Ti discs of 20 mm diameter and 1 mm thickness placed symmetrically on an Al disc of 100 mm diameter and 6 mm thickness so as to place the center of Ti discs on a concentric circle of 58 mm diameter on the surface of the Al disc. The sputtering apparatus shown in FIG. 1 was used.
Substrates were an Al disc and two glasses which were revolved around the central axis of the sputtering chamber during revolution of the substrates themselves around the center of the substrates. Sputtering was carried out at the power of 240-200 watts under purified Ar stream of 5 ml/min at a vacuum of 2 x 10 4 Torr.
X-ray diffraction of the sputter deposits thus prepared revealed the formation of amorphous alloys.
Electron probe microanalysis showed that the amorphous alloys consisted of Al-49 at% Ti and Al-60 at% Ti alloys.
f These alloys were spontaneously passive in 0.075 M/l Na 2 B40 7 -0.3 M/l H 3
BO
3 -0.5 M/l NaCl at 25°C, and the passivity breakdown potentials of the alloys measured by anodic polarization in this solution were 0.73 and 0.80 V(SCE) which were very high. Consequently, these amorphous alloys are highly corrosion-resistant.
Example 2
I
-12- The sputtering apparatus shown in FIG. 2 was used in which various kinds of Al targets discs placing various metals were installed. Substrates voi.- an Al disc and two glasses which were revolved around the central axis of the sputtering chamber during revolution of the substrates themselves around the center of the substrates. Sputtering was carried out at various powers of the two targets under purified Ar stream of 5 ml/min at a vacuum of 1 x 10 4 Torr.
X-ray diffraction of the sputter deposits thus o I prepared revealed the formation of amorphous alloys.
The compositions of these amorphous alloys analyzed by electron probe microanalysis are shown in Table 2.
These alloys were spontaneously passive in 0.075 M/l Na 2
B
4 0 7 -0.3 M/1 H 3 B0 3 -0.5 M/l Nacl at 25 0 C, and the passivity breakdown potentials of the alloys measured by anodic polarization in this solution and 1 N HC1 at are shown in Table 2. Consequently, these amorphous alloys are highly corrosion-resistant.
-13j Table 2 Pitting potentials of amorphous alloys measured in 0.075 M/1 Na 2
BE
4 7 0.3M/l H 3 B0 3 -0.5M/l- NaCl at 25 0 C and 1 N HCl at Alloy Pitting Potential mV(SCE) (at 0.075 M/1 Na 2
B
4
O
7 1 N HCl 0.3 M/l H 3 B0 3 -0.5 M/1 NaCi at 25 0 C at 30 0
C
IAl-4OTi 650 170 Al-5OTi-1Ta 810 300 Al-5OTi–3Nb 850 320 Al-50Ti-3Mc, 750 210 Al-5OTi-1iW 730 200 Al-5OTi-lNb-2Mo 770 250 KA1-5OTi-iNb-2W 760 250 115 Al-5OTi-1 Nb-l Mo-1 W 780 280 Al-5OTi-2Mo–2W 750 180 Al-5OTi-1iTa-l Nb-1 Mo-1iW 800 300 K (Crystalline Metals 711 -900 -930 Al-5OTi-2Mo-2W -800 -850 Al-5OTi-1 Ta-i Nb-i Mo-i W 1 00 .2 Example 3 The targets consisted of 4 8 Zr discs of 20 mm diameter and 1 mm thickness placed symmetrically on an Al disc of 1 00 mm diameter and 6 mm thickness so as to place the center of Zr discs on a concentric circle of -14- 58 mm diameter on the surface of the Al disc. The sputtering apparatus shown in FIG. 1 was used.
Substrates were an Al disc and two glasses which were revolved around the central axis of the sputtering chamber during revolution of the substrates themselves around the center of the substrates. Sputtering was carried out at the power of 560-200 watts under I purified Ar stream of 5 ml/min at a vacuum of 2 x 10 4 .Torr.
j 0 10 X-ray diffraction of the sputter deposits thus J prepared revealed the formation of amorphous alloys.
Electron probe micro-analysis showed that the amorphous alloys consisted of Al-40 at% Zr, Al-45 at% Zr, Al-57 I .at% Zr, Al-69 at% Zr and Al-75 at% Zr alloys.
These alloys were spontaneously passive in 1 N HC1 at 30°C, and their corrosion rates are shown in Table 3. Consequently, these amorphous alloys are highly I corrosion-resistant.
Table 3 i i. s 20 Corrosion rates measured in 1 N HC1 at 11 i: ‘i Alloy(at%) Corrosion Rate (mm/year) Al-40Zr 7.5 x 10- 3 4.5 x 10 3 Al-57Zr 1.0 x 10 3 Al-69Zr 4.1 x 10 4 2.5 x 10- 4 Example 4 II C—LI- i i L-L The sputtering apparatus shown in FIG. 2 was used in which various kinds of Al targets discs placing various metals were installed. Substrates were an Al disc and two glasses which were revolved around the central axis of the sputtering chamber during revolution of the substrates themselves around the Scenter of the substrates. Sputtering was carried out at various powers of the two targets under purified Ar «stream of 5 ml/min at a vacuum of 2 x 10 4 Torr.
X-ray diffraction of the sputter deposits thus I prepared revealed the formation of amorphous alloys.
The compositions of these amorphous alloys analyzed by I *electron probe microanalysis are shown in Table 4.
These alloys were spontaneously passive in 1 N HC1 at 30 0 C, and the corrosion rates of these alloys measured 1 N HC1 at 30 0 C are shown in Table 4.
Consequently, these amorphous alloys are highly corrosion-resistant.
Table 4 20 Corrosion rates measured in 1 N HCI at 30 0
C
Alloy(at.%) Corrosion Rate (mm/year) Al-40Zr-3Ta 4.0 x 10- 3 Al-40Zr-5Nb 3.5 x 10 3 i Al-60Zr-2Ta 8.0 x 10- 4 Al-60Zr-2Nb 9.0 x 10 4 1.0 x 10-3 Al-60Zr-1W 1.1 x 10 3 Al-60Zr-lTa-lNb-lMo-1W 8.5 x 10-4 1> -16- Example The targets consisted of 1-7 Zr discs of 20 mm diameter and 1 mm thickness and 2-7 Ti discs of 20 mm diameter and 1 mm thickness placed symmetrically on an Al disc of 100 mm diameter and 6 mm thickness so as to place 3-8 of the sum of Zr and Ti. The sputtering oo apparatus shown in FIG. 1 was used. Substrates were an Al disc and two glasses which were revolved around the central axis of the sputtering chamber during revolution of the substrates themselves around the center of the substrates. Sputtering was carried out at the power of 560-200 watts under purified Ar stream of 5 ml/min at a vacuum of 2 x 10 4 Torr.
X-ray diffraction of the sputter deposits thus prepared revealed the formation of amorphous alloys.
St The compositions of these amorphous alloys were t tt analyzed by electron probe microanalysis and shown in Table SThe pitting potentials of these alloys measured in 0.075 M/l Na 2
B
4 0 7 -0.3 M/1 H 3 B0 3 -0.5 M/l NaCl at 25 0
C
Iand in 1 N HC1 at 30 0 C are shown in Table Consequently, these amorphous alloys are highly corrosion-resistant.
Table 5 Pitting potentials of amorphous alloys measured in 0.075 M/1 Na 2 B40 7 -0.3 M/1 H 3
BO
3 -0.5M/1 NaCl at 25°C and 1 N HC1 at 30 0
C.
Table Alloy Pitting Potential mV(SCE) (at %)0.075 M/1 Na 2
B
4
O
7 1 N HCl 0.3 M/1 H 3 B0 3 -0.5 M/1 NaCi at 25 0 C at 30 0
C
SAl-5Zr-50Ti 720 250 Al-1 OZr-4TJ. 530 100 A]–20Zr-3Ti. -40 -220 Al-3OZr-1OTi -80 -250 10 Al-4OZr-1OTi 10-180 150 -160 160 -150 160 -150

Claims (7)

1. An amorphous aluminum-valve metal alloy having high corrosion resistance, high wear resistance and considerable toughness, consisting of greater than 40 up to 75 at% of the sum of Zr and Ti, the balance being Al an inevitable impurities.

2. An amorphous aluminum-valve metal alloy as claimed in claim 1 having high corrosion resistance, high wear resistance and considerable toughness, consisting of greater than 40 up to 60 at% of Ti, balance being Al and inevitable impurities.

3. An amorphous aluminum-valve metal alloy as claimed in claim 1 having high corrosion resistance, high wear resistance and considerable toughness, consisting of less than 5 at% of at least one element selected from the group of Mo, W, Ta and Nb and greater than 40 up to 60 at% of the sum of Ti and at least one element selected from the group of Mo, W, Ta and Nb, balance being Al and inevitable impurities. 20

4. An amorphous aluminum-valve metal alloy as claimed in claim 1 having high corrosion resistance, high wear resistance and considerable toughness, consisting of greater than 40 up to 75 at% of Zr, balance being Al and inevitable impurities.

5. An amorphous aluminum-valve metal alloy as claimed in claim 1 having high corrosion resistance, high wear resistance and considerable toughness, consisting of at least 5 at% of Zr and greater than 40 up to 75 at% of the sum of Zr and Ti, balance being Al and inevitable 30 impurities. C C 4 Ir 1 ,1 ;1 a ja i; /VZ~lf I 18a

6. An amorphous aluminum-valve metal alloy as claimed in claim 1 having high corrosion resistance, high wear resistance and considerable toughness, consisting of less than 5 at% of at least one element selected from the group of Mo, W, Ta and Nb and greater than 40 up to 75 at% of the sum of Zr and at least one element selected from the group of Mo, W, Ta and Nb, balance being Al and inevitable impurities. Ct t I C C C i 1 I .19

7. An amorphous aluminum valve metal alloy substantially as hereinbefore descri 1 bed with reference to the accompanying drawings and examples. I DATED this 17 day of May 1991 YOSHIDA NOGYO K.K. and KOJI HASHIMOTO C Patent Attorneys for the C C Applicant: t C r C r fF.B. RICE CO. r C

AU42648/89A
1988-10-15
1989-10-06
Amorphous aluminum alloys

Ceased

AU620155B2
(en)

Applications Claiming Priority (4)

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Priority Date
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JP63-260020

1988-10-15

JP63260020A

JPH068492B2
(en)

1988-10-15
1988-10-15

High corrosion resistance amorphous aluminum alloy

JP1101768A

JP2677667B2
(en)

1989-04-24
1989-04-24

High corrosion resistance amorphous aluminum alloy

JP01-101768

1989-04-24

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1990-04-26

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1992-02-13

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Amorphous aluminum alloys

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Also Published As

Publication number
Publication date

KR900016484A
(en)

1990-11-13

EP0364903B1
(en)

1993-08-11

DE68908331D1
(en)

1993-09-16

US5076865A
(en)

1991-12-31

US5123980A
(en)

1992-06-23

AU4264889A
(en)

1990-04-26

KR930003109B1
(en)

1993-04-19

DE364903T1
(en)

1990-10-18

EP0364903A1
(en)

1990-04-25

BR8905315A
(en)

1990-05-22

DE68908331T2
(en)

1993-12-09

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