AU1369383A – Magnetic gas gate
– Google Patents
AU1369383A – Magnetic gas gate
– Google Patents
Magnetic gas gate
Info
Publication number
AU1369383A
AU1369383A
AU13693/83A
AU1369383A
AU1369383A
AU 1369383 A
AU1369383 A
AU 1369383A
AU 13693/83 A
AU13693/83 A
AU 13693/83A
AU 1369383 A
AU1369383 A
AU 1369383A
AU 1369383 A
AU1369383 A
AU 1369383A
Authority
AU
Australia
Prior art keywords
gas gate
magnetic gas
magnetic
gate
gas
Prior art date
1982-04-29
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
AU13693/83A
Other versions
AU554982B2
(en
Inventor
David Attilio Gattuso
Prem Nath
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Energy Conversion Devices Inc
Original Assignee
Energy Conv Devices Inc
Energy Conversion Devices Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
1982-04-29
Filing date
1983-04-20
Publication date
1983-11-03
1983-04-20
Application filed by Energy Conv Devices Inc, Energy Conversion Devices Inc
filed
Critical
Energy Conv Devices Inc
1983-11-03
Publication of AU1369383A
publication
Critical
patent/AU1369383A/en
1986-09-11
Application granted
granted
Critical
1986-09-11
Publication of AU554982B2
publication
Critical
patent/AU554982B2/en
2003-04-20
Anticipated expiration
legal-status
Critical
Status
Ceased
legal-status
Critical
Current
Links
Espacenet
Global Dossier
Discuss
Classifications
H—ELECTRICITY
H01—ELECTRIC ELEMENTS
H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
H01L31/00—Semiconductor devices sensitive to infra-red radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
H01L31/18—Processes or apparatus specially adapted for the manufacture or treatment of these devices or of parts thereof
H01L31/20—Processes or apparatus specially adapted for the manufacture or treatment of these devices or of parts thereof such devices or parts thereof comprising amorphous semiconductor materials
H01L31/202—Processes or apparatus specially adapted for the manufacture or treatment of these devices or of parts thereof such devices or parts thereof comprising amorphous semiconductor materials including only elements of Group IV of the Periodic System
H—ELECTRICITY
H01—ELECTRIC ELEMENTS
H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
H01L31/00—Semiconductor devices sensitive to infra-red radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
H01L31/18—Processes or apparatus specially adapted for the manufacture or treatment of these devices or of parts thereof
C—CHEMISTRY; METALLURGY
C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
C23C16/54—Apparatus specially adapted for continuous coating
C23C16/545—Apparatus specially adapted for continuous coating for coating elongated substrates
F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
F16—ENGINEERING ELEMENTS AND UNITS; GENERAL MEASURES FOR PRODUCING AND MAINTAINING EFFECTIVE FUNCTIONING OF MACHINES OR INSTALLATIONS; THERMAL INSULATION IN GENERAL
F16J—PISTONS; CYLINDERS; SEALINGS
F16J15/00—Sealings
F16J15/16—Sealings between relatively-moving surfaces
F16J15/168—Sealings between relatively-moving surfaces which permits material to be continuously conveyed
H—ELECTRICITY
H01—ELECTRIC ELEMENTS
H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
H01L31/00—Semiconductor devices sensitive to infra-red radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
H01L31/04—Semiconductor devices sensitive to infra-red radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof adapted as photovoltaic [PV] conversion devices
H01L31/06—Semiconductor devices sensitive to infra-red radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof adapted as photovoltaic [PV] conversion devices characterised by at least one potential-jump barrier or surface barrier
H01L31/075—Semiconductor devices sensitive to infra-red radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof adapted as photovoltaic [PV] conversion devices characterised by at least one potential-jump barrier or surface barrier the potential barriers being only of the PIN type
H—ELECTRICITY
H01—ELECTRIC ELEMENTS
H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
H01L31/00—Semiconductor devices sensitive to infra-red radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
H01L31/18—Processes or apparatus specially adapted for the manufacture or treatment of these devices or of parts thereof
H01L31/20—Processes or apparatus specially adapted for the manufacture or treatment of these devices or of parts thereof such devices or parts thereof comprising amorphous semiconductor materials
H01L31/206—Particular processes or apparatus for continuous treatment of the devices, e.g. roll-to roll processes, multi-chamber deposition
Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
Y02E—REDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
Y02E10/00—Energy generation through renewable energy sources
Y02E10/50—Photovoltaic [PV] energy
Y02E10/548—Amorphous silicon PV cells
Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
Y02P—CLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
Y02P70/00—Climate change mitigation technologies in the production process for final industrial or consumer products
Y02P70/50—Manufacturing or production processes characterised by the final manufactured product
Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
Y10S118/00—Coating apparatus
Y10S118/90—Semiconductor vapor doping
Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
Y10S277/00—Seal for a joint or juncture
Y10S277/906—Seal for article of indefinite length, e.g. strip, sheet
AU13693/83A
1982-04-29
1983-04-20
Magnetic gas gate
Ceased
AU554982B2
(en)
Applications Claiming Priority (2)
Application Number
Priority Date
Filing Date
Title
US372937
1982-04-29
US06/372,937
US4462332A
(en)
1982-04-29
1982-04-29
Magnetic gas gate
Publications (2)
Publication Number
Publication Date
AU1369383A
true
AU1369383A
(en)
1983-11-03
AU554982B2
AU554982B2
(en)
1986-09-11
Family
ID=23470245
Family Applications (1)
Application Number
Title
Priority Date
Filing Date
AU13693/83A
Ceased
AU554982B2
(en)
1982-04-29
1983-04-20
Magnetic gas gate
Country Status (20)
Country
Link
US
(1)
US4462332A
(en)
JP
(1)
JPS58199571A
(en)
KR
(1)
KR840004831A
(en)
AU
(1)
AU554982B2
(en)
BR
(1)
BR8302060A
(en)
CA
(1)
CA1186787A
(en)
DE
(1)
DE3314375A1
(en)
EG
(1)
EG15947A
(en)
ES
(1)
ES8407248A1
(en)
FR
(1)
FR2527384B1
(en)
GB
(1)
GB2119406B
(en)
IE
(1)
IE54234B1
(en)
IL
(1)
IL68390A0
(en)
IN
(1)
IN158452B
(en)
IT
(1)
IT1173664B
(en)
MX
(1)
MX158211A
(en)
NL
(1)
NL8301437A
(en)
PH
(1)
PH19617A
(en)
SE
(1)
SE457357B
(en)
ZA
(1)
ZA832572B
(en)
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Method for introducing sweep gases into a glow discharge deposition apparatus
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Manufacture of insulation metal base plate and device utilizing thereof
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Method for the manufacture of an insulated gate field effect semiconductor device
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Continuous deposition of activated process gases
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Continuous plating device in common use for hot dipping and vacuum deposition plating
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Semiconductor device, manufacturing method, and system
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Method provided for corrective lateral displacement of a longitudinally moving web held in a planar configuration
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Microwave enhanced CVD system under magnetic field
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Microwave enhanced CVD system under magnetic field
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Apparatus for low-temperature plasma treatment of sheet material
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Chemical vapor growth device
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Koufu Nippon Denki Kk
Processing device for bill and check
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Magnetic fluid seal apparatus
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In-vacuum conveyor robot
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キヤノン株式会社
Continuous production equipment for semiconductor devices
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Pinching gate valve
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Magnetic roller gas gate employing transonic sweep gas flow to isolate regions of differing gaseous composition or pressure
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Continuous forming method for functional deposited films
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Functional device for a vacuum system for the treatment of disc-shaped workpieces
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Chugoku Nippon Denki Software Kk
Automatic bill issuing device
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Pressure control system in a photovoltaic substrate deposition apparatus
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Daystar Technologies Inc
Vertical production of photovoltaic devices
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2009-03-05
Fuji Electric Systems Co Ltd
Continuous manufacturing apparatus of semiconductor device
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2007-09-26
2011-07-05
Eastman Kodak Company
Process for making doped zinc oxide
KR20090088056A
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2008-02-14
2009-08-19
삼성전기주식회사
Gas supplying unit and chemical vapor deposition apparatus
DE102008030679B4
(en)
*
2008-04-17
2016-01-28
Von Ardenne Gmbh
Device for the diffusion treatment of workpieces
EP2292339A1
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*
2009-09-07
2011-03-09
Nederlandse Organisatie voor toegepast -natuurwetenschappelijk onderzoek TNO
Coating method and coating apparatus
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1982
1982-04-29
US
US06/372,937
patent/US4462332A/en
not_active
Expired – Lifetime
1983
1983-04-06
IE
IE782/83A
patent/IE54234B1/en
not_active
IP Right Cessation
1983-04-13
ZA
ZA832572A
patent/ZA832572B/en
unknown
1983-04-14
IL
IL68390A
patent/IL68390A0/en
unknown
1983-04-20
EG
EG242/83A
patent/EG15947A/en
active
1983-04-20
AU
AU13693/83A
patent/AU554982B2/en
not_active
Ceased
1983-04-20
BR
BR8302060A
patent/BR8302060A/en
unknown
1983-04-21
IT
IT20732/83A
patent/IT1173664B/en
active
1983-04-21
DE
DE19833314375
patent/DE3314375A1/en
active
Granted
1983-04-21
FR
FR8306541A
patent/FR2527384B1/en
not_active
Expired
1983-04-22
IN
IN478/CAL/83A
patent/IN158452B/en
unknown
1983-04-22
ES
ES521774A
patent/ES8407248A1/en
not_active
Expired
1983-04-22
NL
NL8301437A
patent/NL8301437A/en
not_active
Application Discontinuation
1983-04-22
PH
PH28809A
patent/PH19617A/en
unknown
1983-04-22
SE
SE8302275A
patent/SE457357B/en
not_active
IP Right Cessation
1983-04-22
JP
JP58071319A
patent/JPS58199571A/en
active
Granted
1983-04-22
MX
MX197027A
patent/MX158211A/en
unknown
1983-04-25
GB
GB08311173A
patent/GB2119406B/en
not_active
Expired
1983-04-29
CA
CA000426993A
patent/CA1186787A/en
not_active
Expired
1983-04-29
KR
KR1019830001828A
patent/KR840004831A/en
not_active
Application Discontinuation
Also Published As
Publication number
Publication date
NL8301437A
(en)
1983-11-16
SE457357B
(en)
1988-12-19
PH19617A
(en)
1986-05-30
GB2119406B
(en)
1986-01-29
ES521774A0
(en)
1984-04-01
IN158452B
(en)
1986-11-22
ES8407248A1
(en)
1984-04-01
DE3314375A1
(en)
1983-11-03
SE8302275D0
(en)
1983-04-22
CA1186787A
(en)
1985-05-07
DE3314375C2
(en)
1992-04-09
IT8320732D0
(en)
1983-04-21
ZA832572B
(en)
1984-01-25
JPS58199571A
(en)
1983-11-19
IT8320732A1
(en)
1984-10-21
FR2527384B1
(en)
1988-07-22
IT1173664B
(en)
1987-06-24
IE54234B1
(en)
1989-07-19
EG15947A
(en)
1986-09-30
GB2119406A
(en)
1983-11-16
IL68390A0
(en)
1983-07-31
US4462332A
(en)
1984-07-31
KR840004831A
(en)
1984-10-24
IE830782L
(en)
1983-10-29
JPS649746B2
(en)
1989-02-20
MX158211A
(en)
1989-01-16
GB8311173D0
(en)
1983-06-02
BR8302060A
(en)
1983-12-27
FR2527384A1
(en)
1983-11-25
SE8302275L
(en)
1983-10-30
AU554982B2
(en)
1986-09-11
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Date
Code
Title
Description
2002-11-21
MK14
Patent ceased section 143(a) (annual fees not paid) or expired