AU3050184A – Reversal process
– Google Patents
AU3050184A – Reversal process
– Google Patents
Reversal process
Info
Publication number
AU3050184A
AU3050184A
AU30501/84A
AU3050184A
AU3050184A
AU 3050184 A
AU3050184 A
AU 3050184A
AU 30501/84 A
AU30501/84 A
AU 30501/84A
AU 3050184 A
AU3050184 A
AU 3050184A
AU 3050184 A
AU3050184 A
AU 3050184A
Authority
AU
Australia
Prior art keywords
copies
diazide
quinone
light
disclosed
Prior art date
1983-07-11
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
AU30501/84A
Other versions
AU565579B2
(en
Inventor
Paul Stahlhofen
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hoechst AG
Original Assignee
Hoechst AG
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
1983-07-11
Filing date
1984-07-11
Publication date
1985-01-17
1984-07-11
Application filed by Hoechst AG
filed
Critical
Hoechst AG
1985-01-17
Publication of AU3050184A
publication
Critical
patent/AU3050184A/en
1987-09-17
Application granted
granted
Critical
1987-09-17
Publication of AU565579B2
publication
Critical
patent/AU565579B2/en
2004-07-11
Anticipated expiration
legal-status
Critical
Status
Ceased
legal-status
Critical
Current
Links
Espacenet
Global Dossier
Discuss
Classifications
G—PHYSICS
G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
G03F7/004—Photosensitive materials
G03F7/022—Quinonediazides
G03F7/0226—Quinonediazides characterised by the non-macromolecular additives
Abstract
A process for producing negative relief copies is disclosed in which a light-sensitive material, comprising (1) a light-sensitive ester or amide of a 1,2-quinone-diazide-sulfonic acid or of a 1,2-quinone-diazide-carboxylic acid and (2) a hexamethylol melamine ether is imagewise exposed, thereafter heated, and, after cooling, exposed again without an original, and subsequently developed by means of an aqueous-alkaline developer. The disclosed process permits the production of negative copies with the aid of a material which yields positive copies when it is processed in a conventional manner.
AU30501/84A
1983-07-11
1984-07-11
Reversal process
Ceased
AU565579B2
(en)
Applications Claiming Priority (2)
Application Number
Priority Date
Filing Date
Title
DE3325022
1983-07-11
DE19833325022
DE3325022A1
(en)
1983-07-11
1983-07-11
METHOD FOR PRODUCING NEGATIVE COPIES BY MEANS OF A MATERIAL BASED ON 1,2-CHINONDIAZIDES
Publications (2)
Publication Number
Publication Date
AU3050184A
true
AU3050184A
(en)
1985-01-17
AU565579B2
AU565579B2
(en)
1987-09-17
Family
ID=6203717
Family Applications (1)
Application Number
Title
Priority Date
Filing Date
AU30501/84A
Ceased
AU565579B2
(en)
1983-07-11
1984-07-11
Reversal process
Country Status (10)
Country
Link
US
(1)
US4581321A
(en)
EP
(1)
EP0133216B1
(en)
JP
(1)
JPS6039642A
(en)
AT
(1)
ATE26350T1
(en)
AU
(1)
AU565579B2
(en)
BR
(1)
BR8403439A
(en)
CA
(1)
CA1248401A
(en)
DE
(2)
DE3325022A1
(en)
ES
(1)
ES534177A0
(en)
ZA
(1)
ZA845110B
(en)
Cited By (1)
* Cited by examiner, † Cited by third party
Publication number
Priority date
Publication date
Assignee
Title
AU567353B2
(en)
*
1983-07-11
1987-11-19
Hoechst A.G.
Negative copy production using 1,2-quinone diazides
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1986-06-24
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Positive photoresist processing with mid U-V range exposure
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1986-05-28
Hoechst Ag, 6230 Frankfurt
RADIATION-SENSITIVE MIXTURE, RECORDING MATERIAL MADE THEREOF, AND METHOD FOR THE PRODUCTION OF HEAT-RESISTANT RELIEF RECORDINGS
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1985-07-18
1991-03-19
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High contrast photoresist developer with enhanced sensitivity
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1985-08-07
1987-02-16
インタ−ナショナル ビジネス マシ−ンズ コ−ポレ−ション
Photoresist with longer preservation life useful for image inversion
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1985-08-12
1990-05-29
Hoechst Celanese Corporation
Image reversal negative working O-napthoquinone diazide and cross-linking compound containing photoresist process with thermal curing
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1985-08-12
1990-06-05
Hoechst Celanese Corporation
Image reversal negative working O-quinone diazide and cross-linking compound containing photoresist process with thermal curing treatment
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1985-08-12
1993-10-26
Hoechst Celanese Corporation
Image reversal negative working O-naphthoquinone diazide and cross-linking compound containing photoresist process with thermal curing
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1985-08-12
1993-06-08
Hoechst Celanese Corporation
Image reversal negative working o-quinone diazide and cross-linking compound containing photoresist process with thermal curing treatment and element produced therefrom
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1985-12-05
1990-07-17
International Business Machines Corporation
Process of making diazoquinone sensitized polyamic acid based photoresist compositions having reduced dissolution rates in alkaline developers
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1986-03-13
1987-09-22
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1986-10-09
1988-04-21
Hoechst Ag
LIGHT SENSITIVE MIXTURE AND LIGHT SENSITIVE COPY MATERIAL MADE THEREOF
JPH01501176A
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1986-10-20
1989-04-20
マクダーミッド，インコーポレーテッド
Image reversible systems and processes
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1986-11-05
1988-05-11
Hoechst Ag
LIGHT-SENSITIVE MIXTURE, THIS RECORDING MATERIAL AND METHOD FOR PRODUCING POSITIVE OR NEGATIVE RELIEF COPIES USING THIS MATERIAL
DE3711264A1
(en)
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1987-04-03
1988-10-13
Hoechst Ag
LIGHT SENSITIVE MIXTURE AND LIGHT SENSITIVE COPY MATERIAL MADE THEREOF
DE3711263A1
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1987-04-03
1988-10-13
Hoechst Ag
LIGHT SENSITIVE MIXTURE, LIGHT SENSITIVE COPY MATERIAL MADE THEREOF AND METHOD FOR THE PRODUCTION OF PRINTING FORMS
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1987-04-11
1987-05-20
Ciba Geigy Ag
Formation of image
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1987-05-20
1988-12-01
Hoechst Ag
METHOD FOR IMAGING LIGHT-SENSITIVE MATERIALS
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1987-08-05
1989-02-16
Hoechst Ag
LIGHT SENSITIVE MIXTURE, LIGHT SENSITIVE COPY MATERIAL MADE THEREOF AND METHOD FOR PRODUCING NEGATIVE RELIEF COPIES
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1987-08-28
1989-10-10
Shipley Company Inc.
Reticulation resistant photoresist coating
US5462840A
(en)
*
1987-09-16
1995-10-31
Hoechst Celanese Corporation
Use of poly(35-disubstituted 4-hydroxystyrene/N-substituted maleimide for forming a negative image
JPS6478249A
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*
1987-09-18
1989-03-23
Fuji Photo Film Co Ltd
Photosensitive material and image forming method
DE3735852A1
(en)
*
1987-10-23
1989-05-03
Hoechst Ag
POSITIVELY WORKING LIGHT-SENSITIVE MIXTURE, CONTAINING A COLOR, AND POSITIVELY WORKING LIGHT-SENSITIVE RECORDING MATERIAL THEREOF
EP0345305A4
(en)
*
1987-12-10
1991-10-02
Macdermid Incorporated
Image-reversible dry-film photoresists
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(en)
*
1988-09-29
1991-05-28
Hoechst Celanese Corporation
Method of producing an image reversal negative photoresist having a photo-labile blocked imide
US5286609A
(en)
*
1988-11-01
1994-02-15
Yamatoya & Co., Ltd.
Process for the formation of a negative resist pattern from a composition comprising a diazoquinone compound and an imidazole and having as a heat step the use of a hot water containing spray
DE3837500A1
(en)
*
1988-11-04
1990-05-23
Hoechst Ag
NEW RADIATION-SENSITIVE COMPOUNDS, MADE BY THIS RADIATION-SENSITIVE MIXTURE AND RECORDING MATERIAL
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(en)
*
1988-11-28
1993-01-19
Tokyo Ohka Kogyo Co., Ltd.
Electron beam-curable resist composition and method for fine patterning using the same
CA2019693A1
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1989-07-07
1991-01-07
Karen Ann Graziano
Acid-hardening photoresists of improved sensitivity
DE69033938T2
(en)
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1989-12-01
2002-07-18
Tosoh Corp
Positive working photosensitive compositions for the production of lenses
DE3940911A1
(en)
*
1989-12-12
1991-06-13
Hoechst Ag
PROCESS FOR PRODUCING NEGATIVE COPIES
DE4004719A1
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*
1990-02-15
1991-08-22
Hoechst Ag
RADIATION-SENSITIVE MIXTURE, RADIATION-RECESSED RECORDING MATERIAL PRODUCED HEREOF AND METHOD FOR PRODUCING CROSS-REFERENCES
DE4013575C2
(en)
*
1990-04-27
1994-08-11
Basf Ag
Process for making negative relief copies
JP3004044B2
(en)
*
1990-10-29
2000-01-31
東洋合成工業株式会社
Photosensitive colored resin composition
US5206116A
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1991-03-04
1993-04-27
Shipley Company Inc.
Light-sensitive composition for use as a soldermask and process
JP3003808B2
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東京応化工業株式会社
Micro lens and manufacturing method thereof
DE4111444A1
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1991-04-09
1992-10-15
Hoechst Ag
NAPHTHOCHINONDIAZIDE-SULFONIC ACID MIXTESTER CONTAINING MIXTURE AND PRODUCTION OF RADIATION-SENSITIVE RECORDING MATERIAL THEREFOR
DE4111443A1
(en)
*
1991-04-09
1992-10-15
Hoechst Ag
RADIATION SENSITIVE ESTER AND METHOD FOR THE PRODUCTION THEREOF
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1992-02-03
1995-03-14
Shipley Company Inc.
Light-sensitive composition and process
JP3016952B2
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クラリアント インターナショナル リミテッド
Negative photoresist composition
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1994-08-23
Sumitomo Chem Co Ltd
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Radiation-sensitive resin composition for microlenses
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1993-06-02
1996-10-11
Sumitomo Chemical Co
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1997-11-17
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고오사이 아끼오
Resist pattern forming method and positive resist composition used in this method
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1999-02-05
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National Semiconductor Corp.
Photo-assisted post exposure bake for chemically amplified photoresist process
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Konica Corporation
Silver halide photothermograhic material
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Ｊｓｒ株式会社
Negative radiation sensitive resin composition
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Kodak Polychrome Graphics, Llc
Method of manufacturing a thermally imageable element
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Method for making printing plate by inkjet deposition on positive-working media
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Sundance Enterprises
Fluidized positioning and protection system
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2007-03-29
2011-10-12
FUJIFILM Corporation
Negative resist composition and pattern forming method using the same
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2007-11-14
2010-10-06
富士胶片株式会社
Method of drying coating film and process for producing lithographic printing plate precursor
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2008-03-26
2009-10-15
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Drying method and device
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Photosensitive composition, planographic printing plate precursor, and polyurethane
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Nanocomposite negative photosensitive composition and use thereof
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LIGHT SENSITIVE MIXTURE, LIGHT SENSITIVE COPY MATERIAL MADE THEREOF, AND METHOD FOR PRODUCING A PRINT FORM FROM THE COPY MATERIAL
1983
1983-07-11
DE
DE19833325022
patent/DE3325022A1/en
not_active
Withdrawn
1984
1984-07-02
US
US06/626,760
patent/US4581321A/en
not_active
Expired – Fee Related
1984-07-03
DE
DE8484107697T
patent/DE3462957D1/en
not_active
Expired
1984-07-03
CA
CA000457991A
patent/CA1248401A/en
not_active
Expired
1984-07-03
AT
AT84107697T
patent/ATE26350T1/en
not_active
IP Right Cessation
1984-07-03
EP
EP84107697A
patent/EP0133216B1/en
not_active
Expired
1984-07-04
ZA
ZA845110A
patent/ZA845110B/en
unknown
1984-07-10
BR
BR8403439A
patent/BR8403439A/en
not_active
IP Right Cessation
1984-07-10
ES
ES534177A
patent/ES534177A0/en
active
Granted
1984-07-11
AU
AU30501/84A
patent/AU565579B2/en
not_active
Ceased
1984-07-11
JP
JP59142511A
patent/JPS6039642A/en
active
Pending
Cited By (1)
* Cited by examiner, † Cited by third party
Publication number
Priority date
Publication date
Assignee
Title
AU567353B2
(en)
*
1983-07-11
1987-11-19
Hoechst A.G.
Negative copy production using 1,2-quinone diazides
Also Published As
Publication number
Publication date
ATE26350T1
(en)
1987-04-15
ES8504392A1
(en)
1985-04-16
ZA845110B
(en)
1985-02-27
EP0133216B1
(en)
1987-04-01
AU565579B2
(en)
1987-09-17
JPS6039642A
(en)
1985-03-01
CA1248401A
(en)
1989-01-10
EP0133216A1
(en)
1985-02-20
US4581321A
(en)
1986-04-08
DE3325022A1
(en)
1985-01-24
ES534177A0
(en)
1985-04-16
BR8403439A
(en)
1985-06-25
DE3462957D1
(en)
1987-05-07
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