GB1246298A

GB1246298A – Light-sensitive compositions
– Google Patents

GB1246298A – Light-sensitive compositions
– Google Patents
Light-sensitive compositions

Info

Publication number
GB1246298A

GB1246298A
GB60663/68A
GB6066368A
GB1246298A
GB 1246298 A
GB1246298 A
GB 1246298A
GB 60663/68 A
GB60663/68 A
GB 60663/68A
GB 6066368 A
GB6066368 A
GB 6066368A
GB 1246298 A
GB1246298 A
GB 1246298A
Authority
GB
United Kingdom
Prior art keywords
light
sensitive compositions
dec
salt
polyvinyl chloroacetate
Prior art date
1967-12-26
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)

Expired

Application number
GB60663/68A
Inventor
Douglas Graham Borden
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)

Eastman Kodak Co

Original Assignee
Eastman Kodak Co
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
1967-12-26
Filing date
1968-12-20
Publication date
1971-09-15

1968-12-20
Application filed by Eastman Kodak Co
filed
Critical
Eastman Kodak Co

1971-09-15
Publication of GB1246298A
publication
Critical
patent/GB1246298A/en

Status
Expired
legal-status
Critical
Current

Links

Espacenet

Global Dossier

Discuss

Classifications

G—PHYSICS

G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY

G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR

G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor

G03F7/004—Photosensitive materials

G03F7/0042—Photosensitive materials with inorganic or organometallic light-sensitive compounds not otherwise provided for, e.g. inorganic resists

B—PERFORMING OPERATIONS; TRANSPORTING

B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS

B41M—PRINTING, DUPLICATING, MARKING, OR COPYING PROCESSES; COLOUR PRINTING

B41M5/00—Duplicating or marking methods; Sheet materials for use therein

B41M5/26—Thermography ; Marking by high energetic means, e.g. laser otherwise than by burning, and characterised by the material used

B41M5/30—Thermography ; Marking by high energetic means, e.g. laser otherwise than by burning, and characterised by the material used using chemical colour formers

C—CHEMISTRY; METALLURGY

C07—ORGANIC CHEMISTRY

C07F—ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM

C07F5/00—Compounds containing elements of Groups 3 or 13 of the Periodic System

C07F5/02—Boron compounds

C07F5/027—Organoboranes and organoborohydrides

C—CHEMISTRY; METALLURGY

C07—ORGANIC CHEMISTRY

C07F—ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM

C07F9/00—Compounds containing elements of Groups 5 or 15 of the Periodic System

C07F9/02—Phosphorus compounds

C07F9/28—Phosphorus compounds with one or more P—C bonds

C07F9/54—Quaternary phosphonium compounds

C—CHEMISTRY; METALLURGY

C07—ORGANIC CHEMISTRY

C07F—ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM

C07F9/00—Compounds containing elements of Groups 5 or 15 of the Periodic System

C07F9/66—Arsenic compounds

C07F9/70—Organo-arsenic compounds

C07F9/74—Aromatic compounds

C—CHEMISTRY; METALLURGY

C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR

C09B—ORGANIC DYES OR CLOSELY-RELATED COMPOUNDS FOR PRODUCING DYES, e.g. PIGMENTS; MORDANTS; LAKES

C09B44/00—Azo dyes containing onium groups

C09B44/10—Azo dyes containing onium groups containing cyclammonium groups attached to an azo group by a carbon atom of the ring system

C09B44/12—Azo dyes containing onium groups containing cyclammonium groups attached to an azo group by a carbon atom of the ring system having one nitrogen atom as the only ring hetero atom

C09B44/126—Azo dyes containing onium groups containing cyclammonium groups attached to an azo group by a carbon atom of the ring system having one nitrogen atom as the only ring hetero atom in a six-membered ring, e.g. pyrridinium, quinolinium

G—PHYSICS

G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY

G03C—PHOTOSENSITIVE MATERIALS FOR PHOTOGRAPHIC PURPOSES; PHOTOGRAPHIC PROCESSES, e.g. CINE, X-RAY, COLOUR, STEREO-PHOTOGRAPHIC PROCESSES; AUXILIARY PROCESSES IN PHOTOGRAPHY

G03C1/00—Photosensitive materials

G03C1/52—Compositions containing diazo compounds as photosensitive substances

G03C1/54—Diazonium salts or diazo anhydrides

G—PHYSICS

G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY

G03C—PHOTOSENSITIVE MATERIALS FOR PHOTOGRAPHIC PURPOSES; PHOTOGRAPHIC PROCESSES, e.g. CINE, X-RAY, COLOUR, STEREO-PHOTOGRAPHIC PROCESSES; AUXILIARY PROCESSES IN PHOTOGRAPHY

G03C1/00—Photosensitive materials

G03C1/72—Photosensitive compositions not covered by the groups G03C1/005 – G03C1/705

G03C1/73—Photosensitive compositions not covered by the groups G03C1/005 – G03C1/705 containing organic compounds

Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS

Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC

Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS

Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof

Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface – process, composition, or product: radiation sensitive composition or product or process of making binder containing

Y10S430/1055—Radiation sensitive composition or product or process of making

Y10S430/127—Spectral sensitizer containing

Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS

Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC

Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS

Y10S522/00—Synthetic resins or natural rubbers — part of the class 520 series

Y10S522/904—Monomer or polymer contains initiating group

Abstract

1,246,298. Modified polyvinyl chloroacetate. EASTMAN KODAK CO. 20 Dec., 1968 [26 Dec., 1967], No. 60663/68. Heading C3P. [Also in Divisions C2, C4 and G2] Polyvinyl chloroacetate is heated with 41– methoxy-4-stilbazole and then treated with sodium tetraphenyl borate to produce the tetraphenylborate salt of the quaternized polymer. This salt is used in photolithography (see Division G2).

GB60663/68A
1967-12-26
1968-12-20
Light-sensitive compositions

Expired

GB1246298A
(en)

Applications Claiming Priority (1)

Application Number
Priority Date
Filing Date
Title

US69316867A

1967-12-26
1967-12-26

Publications (1)

Publication Number
Publication Date

GB1246298A
true

GB1246298A
(en)

1971-09-15

Family
ID=24783601
Family Applications (1)

Application Number
Title
Priority Date
Filing Date

GB60663/68A
Expired

GB1246298A
(en)

1967-12-26
1968-12-20
Light-sensitive compositions

Country Status (8)

Country
Link

US
(1)

US3567453A
(en)

BE
(1)

BE726207A
(en)

BR
(1)

BR6805097D0
(en)

CH
(1)

CH512085A
(en)

DE
(1)

DE1815868A1
(en)

ES
(1)

ES361827A1
(en)

FR
(1)

FR1602445A
(en)

GB
(1)

GB1246298A
(en)

Cited By (1)

* Cited by examiner, † Cited by third party

Publication number
Priority date
Publication date
Assignee
Title

WO1992002504A1
(en)

*

1990-07-31
1992-02-20
Eastman Kodak Company
N-substituted pyridiniumborates

Families Citing this family (149)

* Cited by examiner, † Cited by third party

Publication number
Priority date
Publication date
Assignee
Title

US3887379A
(en)

*

1972-03-30
1975-06-03
Ibm
Photoresist azide sensitizer composition

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(en)

*

1973-07-27
1978-08-08
Fuji Photo Film Co., Ltd.
Spectrally sensitized positive light-sensitive o-quinone diazide containing composition

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(en)

*

1974-04-11
1979-01-25
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Photopolymerizable compositions

US4324852A
(en)

*

1974-04-15
1982-04-13
Eastman Kodak Company
Transition metal photoreduction systems and processes

CA1051705A
(en)

*

1974-04-15
1979-04-03
Thap Dominh
High gain transition metal complex imaging

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(en)

*

1974-04-15
1980-05-06
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Radiation sensitive co(III)complex photoreduction element with image recording layer

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(en)

*

1974-04-15
1980-04-01
Eastman Kodak Company
CO(III) Complex containing radiation sensitive element with diazo recording layer

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(en)

*

1974-05-02
1977-11-15
General Electric Company
Photocurable compositions containing group via aromatic onium salts

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(en)

*

1974-05-02
1981-04-28
General Electric Company
Cationically polymerizable compositions containing photodecomposable aromatic iodonium salts

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(en)

*

1974-05-02
1978-07-19
Gen Electric
Polymerizable compositions

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(en)

*

1974-05-02
1979-11-27
General Electric Company
Method of exposing and curing an epoxy composition containing an aromatic onium salt

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*

1974-05-02
1979-11-27
General Electric Company
Curable compositions

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(en)

*

1974-05-02
1977-11-15
General Electric Company
Cationically polymerizable compositions containing group VIa onium salts

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(en)

*

1974-05-02
1978-06-01
Gen Electric
Salts

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*

1974-05-02
1978-01-17
General Electric Company
Photopolymerizable composition containing group Va aromatic onium salts

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(en)

*

1974-05-08
1983-03-29
Minnesota Mining & Manufacturing Company
Photopolymerizable epoxy-containing compositions

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(en)

*

1975-05-02
1977-05-31
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Photocurable compositions and methods

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(en)

*

1975-09-02
1978-01-17
Minnesota Mining And Manufacturing Company
Photopolymerizable composition containing a sensitized aromatic sulfonium compound and a cationacally polymerizable monomer

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(en)

*

1975-09-02
1981-03-17
Minnesota Mining And Manufacturing Company
Photocopolymerizable compositions based on epoxy and hydroxyl-containing organic materials

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(en)

*

1975-09-08
1979-10-16
Eastman Kodak Company
High gain Co(III)complex imaging

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(en)

*

1975-09-08
1977-08-30
Eastman Kodak Company
Process of amplifying image in image recording layer by releasing reactant from image forming layer containing cobalt(III)complex

US4307177A
(en)

*

1975-12-09
1981-12-22
General Electric Company
Method of using polymerizable compositions containing onium salts

US4062686A
(en)

*

1976-04-21
1977-12-13
Eastman Kodak Company
Sensitizers for photocrosslinkable polymers

US4147552A
(en)

*

1976-05-21
1979-04-03
Eastman Kodak Company
Light-sensitive compositions with 3-substituted coumarin compounds as spectral sensitizers

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(en)

*

1976-06-10
1984-12-04
American Hoechst Corporation
Dialo printing plate made from laser

US4314019A
(en)

*

1976-09-07
1982-02-02
Eastman Kodak Company
Transition metal photoreduction systems and processes

JPS5934293B2
(en)

*

1977-04-20
1984-08-21
王子製紙株式会社

photosensitive composition

FR2400221A1
(en)

*

1977-08-09
1979-03-09
Kodak Pathe

PHOTOSENSITIVE DIAZONIUM COMPOUND USEFUL, IN PARTICULAR, FOR PREPARING LITHOGRAPHIC PRINTING BOARDS, PROCESS FOR PREPARING THIS COMPOUND AND PLATE PRESENSITIZED WITH THIS COMPOUND

US4243737A
(en)

*

1977-11-25
1981-01-06
Eastman Kodak Company
Image forming composition and elements with Co(III) complex, conjugated π bonding compounds and photoreductant

DE2754403A1
(en)

*

1977-12-07
1979-06-13
Basf Ag

METHINE DYES

JPS5536838A
(en)

*

1978-09-08
1980-03-14
Tokyo Ohka Kogyo Co Ltd
Novel light absorber and photoresist composition containing this

JPS5560944A
(en)

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1978-10-31
1980-05-08
Fuji Photo Film Co Ltd
Image forming method

DE2847878A1
(en)

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1978-11-04
1980-05-22
Hoechst Ag

LIGHT SENSITIVE MIXTURE

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(en)

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1978-12-07
1985-10-16
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Novel photoresist composition

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(en)

*

1978-12-07
1981-02-03
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*

1979-06-28
1981-01-22
Fuji Photo Film Co Ltd
Photosensitive material and pattern forming method using it

JPS569740A
(en)

*

1979-07-05
1981-01-31
Fuji Photo Film Co Ltd
Image forming method

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1980-05-23
1982-08-10
Minnesota Mining And Manufacturing Company
Fixing of tetra (hydrocarbyl) borate salt imaging systems

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1980-05-23
1981-12-22
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Imaging systems with tetra(aliphatic) borate salts

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*

1981-08-06
1982-12-21
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Positive-working resist quinone diazide containing composition and imaging method having improved development rates

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*

1981-12-21
1983-07-07
Molodnyakov, Sergey, Petrovich
Photo- and electron resist

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1982-02-17
1985-04-16
Nippon Telegraph And Telephone Public Corp.
Photo-fixing heat-sensitive recording media with photosensitive diazonium salt, coupler, and organic boron salt

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*

1982-10-25
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Minnesota Mining And Manufacturing Company
Fixing of tetra(hydrocarbyl)borate salt imaging systems

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1982-12-30
1984-08-07
International Business Machines Corporation
Process for forming resist masks utilizing O-quinone diazide and pyrene

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1983-02-24
1983-03-30
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1983-06-28
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International Business Machines Corporation
Deep ultra-violet lithographic resists with diazohomotetramic acid compounds

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1983-12-20
1984-02-01
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Radiationsensitive compositions

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1985-01-07
1989-05-09
Honeywell Inc.
Reflection limiting photoresist composition with two azo dyes

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1985-03-28
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International Business Machines Corporation
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1986-05-06
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1985-11-20
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Photohardenable compositions containing a dye borate complex and photosensitive materials employing the same

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1985-11-20
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1986-10-10
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1987-01-29
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1987-07-27
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1987-08-19
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1989-10-25
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1989-12-27
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1992-02-07
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1995-11-24
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1998-08-11
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1967

1967-12-26
US
US693168A
patent/US3567453A/en
not_active
Expired – Lifetime

1968

1968-12-19
DE
DE19681815868
patent/DE1815868A1/en
active
Pending

1968-12-20
GB
GB60663/68A
patent/GB1246298A/en
not_active
Expired

1968-12-23
BR
BR205097/68A
patent/BR6805097D0/en
unknown

1968-12-23
CH
CH1916668A
patent/CH512085A/en
not_active
IP Right Cessation

1968-12-24
ES
ES361827A
patent/ES361827A1/en
not_active
Expired

1968-12-24
FR
FR1602445D
patent/FR1602445A/fr
not_active
Expired

1968-12-27
BE
BE726207D
patent/BE726207A/xx
unknown

Cited By (1)

* Cited by examiner, † Cited by third party

Publication number
Priority date
Publication date
Assignee
Title

WO1992002504A1
(en)

*

1990-07-31
1992-02-20
Eastman Kodak Company
N-substituted pyridiniumborates

Also Published As

Publication number
Publication date

US3567453A
(en)

1971-03-02

CH512085A
(en)

1971-08-31

DE1815868A1
(en)

1969-11-06

FR1602445A
(en)

1970-11-23

ES361827A1
(en)

1970-11-01

BR6805097D0
(en)

1973-01-11

BE726207A
(en)

1969-05-29

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