GB1246298A – Light-sensitive compositions
– Google Patents
GB1246298A – Light-sensitive compositions
– Google Patents
Light-sensitive compositions
Info
Publication number
GB1246298A
GB1246298A
GB60663/68A
GB6066368A
GB1246298A
GB 1246298 A
GB1246298 A
GB 1246298A
GB 60663/68 A
GB60663/68 A
GB 60663/68A
GB 6066368 A
GB6066368 A
GB 6066368A
GB 1246298 A
GB1246298 A
GB 1246298A
Authority
GB
United Kingdom
Prior art keywords
light
sensitive compositions
dec
salt
polyvinyl chloroacetate
Prior art date
1967-12-26
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
GB60663/68A
Inventor
Douglas Graham Borden
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Eastman Kodak Co
Original Assignee
Eastman Kodak Co
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
1967-12-26
Filing date
1968-12-20
Publication date
1971-09-15
1968-12-20
Application filed by Eastman Kodak Co
filed
Critical
Eastman Kodak Co
1971-09-15
Publication of GB1246298A
publication
Critical
patent/GB1246298A/en
Status
Expired
legal-status
Critical
Current
Links
Espacenet
Global Dossier
Discuss
Classifications
G—PHYSICS
G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
G03F7/004—Photosensitive materials
G03F7/0042—Photosensitive materials with inorganic or organometallic light-sensitive compounds not otherwise provided for, e.g. inorganic resists
B—PERFORMING OPERATIONS; TRANSPORTING
B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
B41M—PRINTING, DUPLICATING, MARKING, OR COPYING PROCESSES; COLOUR PRINTING
B41M5/00—Duplicating or marking methods; Sheet materials for use therein
B41M5/26—Thermography ; Marking by high energetic means, e.g. laser otherwise than by burning, and characterised by the material used
B41M5/30—Thermography ; Marking by high energetic means, e.g. laser otherwise than by burning, and characterised by the material used using chemical colour formers
C—CHEMISTRY; METALLURGY
C07—ORGANIC CHEMISTRY
C07F—ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
C07F5/00—Compounds containing elements of Groups 3 or 13 of the Periodic System
C07F5/02—Boron compounds
C07F5/027—Organoboranes and organoborohydrides
C—CHEMISTRY; METALLURGY
C07—ORGANIC CHEMISTRY
C07F—ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
C07F9/00—Compounds containing elements of Groups 5 or 15 of the Periodic System
C07F9/02—Phosphorus compounds
C07F9/28—Phosphorus compounds with one or more P—C bonds
C07F9/54—Quaternary phosphonium compounds
C—CHEMISTRY; METALLURGY
C07—ORGANIC CHEMISTRY
C07F—ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
C07F9/00—Compounds containing elements of Groups 5 or 15 of the Periodic System
C07F9/66—Arsenic compounds
C07F9/70—Organo-arsenic compounds
C07F9/74—Aromatic compounds
C—CHEMISTRY; METALLURGY
C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
C09B—ORGANIC DYES OR CLOSELY-RELATED COMPOUNDS FOR PRODUCING DYES, e.g. PIGMENTS; MORDANTS; LAKES
C09B44/00—Azo dyes containing onium groups
C09B44/10—Azo dyes containing onium groups containing cyclammonium groups attached to an azo group by a carbon atom of the ring system
C09B44/12—Azo dyes containing onium groups containing cyclammonium groups attached to an azo group by a carbon atom of the ring system having one nitrogen atom as the only ring hetero atom
C09B44/126—Azo dyes containing onium groups containing cyclammonium groups attached to an azo group by a carbon atom of the ring system having one nitrogen atom as the only ring hetero atom in a six-membered ring, e.g. pyrridinium, quinolinium
G—PHYSICS
G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
G03C—PHOTOSENSITIVE MATERIALS FOR PHOTOGRAPHIC PURPOSES; PHOTOGRAPHIC PROCESSES, e.g. CINE, X-RAY, COLOUR, STEREO-PHOTOGRAPHIC PROCESSES; AUXILIARY PROCESSES IN PHOTOGRAPHY
G03C1/00—Photosensitive materials
G03C1/52—Compositions containing diazo compounds as photosensitive substances
G03C1/54—Diazonium salts or diazo anhydrides
G—PHYSICS
G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
G03C—PHOTOSENSITIVE MATERIALS FOR PHOTOGRAPHIC PURPOSES; PHOTOGRAPHIC PROCESSES, e.g. CINE, X-RAY, COLOUR, STEREO-PHOTOGRAPHIC PROCESSES; AUXILIARY PROCESSES IN PHOTOGRAPHY
G03C1/00—Photosensitive materials
G03C1/72—Photosensitive compositions not covered by the groups G03C1/005 – G03C1/705
G03C1/73—Photosensitive compositions not covered by the groups G03C1/005 – G03C1/705 containing organic compounds
Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface – process, composition, or product: radiation sensitive composition or product or process of making binder containing
Y10S430/1055—Radiation sensitive composition or product or process of making
Y10S430/127—Spectral sensitizer containing
Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
Y10S522/00—Synthetic resins or natural rubbers — part of the class 520 series
Y10S522/904—Monomer or polymer contains initiating group
Abstract
1,246,298. Modified polyvinyl chloroacetate. EASTMAN KODAK CO. 20 Dec., 1968 [26 Dec., 1967], No. 60663/68. Heading C3P. [Also in Divisions C2, C4 and G2] Polyvinyl chloroacetate is heated with 4
GB60663/68A
1967-12-26
1968-12-20
Light-sensitive compositions
Expired
GB1246298A
(en)
Applications Claiming Priority (1)
Application Number
Priority Date
Filing Date
Title
US69316867A
1967-12-26
1967-12-26
Publications (1)
Publication Number
Publication Date
GB1246298A
true
GB1246298A
(en)
1971-09-15
Family
ID=24783601
Family Applications (1)
Application Number
Title
Priority Date
Filing Date
GB60663/68A
Expired
GB1246298A
(en)
1967-12-26
1968-12-20
Light-sensitive compositions
Country Status (8)
Country
Link
US
(1)
US3567453A
(en)
BE
(1)
BE726207A
(en)
BR
(1)
BR6805097D0
(en)
CH
(1)
CH512085A
(en)
DE
(1)
DE1815868A1
(en)
ES
(1)
ES361827A1
(en)
FR
(1)
FR1602445A
(en)
GB
(1)
GB1246298A
(en)
Cited By (1)
* Cited by examiner, † Cited by third party
Publication number
Priority date
Publication date
Assignee
Title
WO1992002504A1
(en)
*
1990-07-31
1992-02-20
Eastman Kodak Company
N-substituted pyridiniumborates
Families Citing this family (149)
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Assignee
Title
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1972-03-30
1975-06-03
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Radiation sensitive co(III)complex photoreduction element with image recording layer
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CO(III) Complex containing radiation sensitive element with diazo recording layer
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1974-05-02
1977-11-15
General Electric Company
Photocurable compositions containing group via aromatic onium salts
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1974-05-02
1981-04-28
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1974-05-02
1978-07-19
Gen Electric
Polymerizable compositions
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General Electric Company
Method of exposing and curing an epoxy composition containing an aromatic onium salt
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1975-09-02
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1975-09-02
1981-03-17
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1975-12-09
1981-12-22
General Electric Company
Method of using polymerizable compositions containing onium salts
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1976-04-21
1977-12-13
Eastman Kodak Company
Sensitizers for photocrosslinkable polymers
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1976-05-21
1979-04-03
Eastman Kodak Company
Light-sensitive compositions with 3-substituted coumarin compounds as spectral sensitizers
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1976-06-10
1984-12-04
American Hoechst Corporation
Dialo printing plate made from laser
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1976-09-07
1982-02-02
Eastman Kodak Company
Transition metal photoreduction systems and processes
JPS5934293B2
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1977-04-20
1984-08-21
王子製紙株式会社
photosensitive composition
FR2400221A1
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*
1977-08-09
1979-03-09
Kodak Pathe
PHOTOSENSITIVE DIAZONIUM COMPOUND USEFUL, IN PARTICULAR, FOR PREPARING LITHOGRAPHIC PRINTING BOARDS, PROCESS FOR PREPARING THIS COMPOUND AND PLATE PRESENSITIZED WITH THIS COMPOUND
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1977-11-25
1981-01-06
Eastman Kodak Company
Image forming composition and elements with Co(III) complex, conjugated π bonding compounds and photoreductant
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1977-12-07
1979-06-13
Basf Ag
METHINE DYES
JPS5536838A
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1978-09-08
1980-03-14
Tokyo Ohka Kogyo Co Ltd
Novel light absorber and photoresist composition containing this
JPS5560944A
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1978-10-31
1980-05-08
Fuji Photo Film Co Ltd
Image forming method
DE2847878A1
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1978-11-04
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Hoechst Ag
LIGHT SENSITIVE MIXTURE
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1978-12-07
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東京応化工業株式会社
Novel photoresist composition
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American Hoechst Corporation
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1979-06-28
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Fuji Photo Film Co Ltd
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Molodnyakov, Sergey, Petrovich
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Nippon Telegraph And Telephone Public Corp.
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Minnesota Mining And Manufacturing Company
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International Business Machines Corporation
Process for forming resist masks utilizing O-quinone diazide and pyrene
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Deep ultra-violet lithographic resists with diazohomotetramic acid compounds
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The Mead Corporation
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Photohardenable compositions containing a dye borate complex and photosensitive materials employing the same
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1967
1967-12-26
US
US693168A
patent/US3567453A/en
not_active
Expired – Lifetime
1968
1968-12-19
DE
DE19681815868
patent/DE1815868A1/en
active
Pending
1968-12-20
GB
GB60663/68A
patent/GB1246298A/en
not_active
Expired
1968-12-23
BR
BR205097/68A
patent/BR6805097D0/en
unknown
1968-12-23
CH
CH1916668A
patent/CH512085A/en
not_active
IP Right Cessation
1968-12-24
ES
ES361827A
patent/ES361827A1/en
not_active
Expired
1968-12-24
FR
FR1602445D
patent/FR1602445A/fr
not_active
Expired
1968-12-27
BE
BE726207D
patent/BE726207A/xx
unknown
Cited By (1)
* Cited by examiner, † Cited by third party
Publication number
Priority date
Publication date
Assignee
Title
WO1992002504A1
(en)
*
1990-07-31
1992-02-20
Eastman Kodak Company
N-substituted pyridiniumborates
Also Published As
Publication number
Publication date
US3567453A
(en)
1971-03-02
CH512085A
(en)
1971-08-31
DE1815868A1
(en)
1969-11-06
FR1602445A
(en)
1970-11-23
ES361827A1
(en)
1970-11-01
BR6805097D0
(en)
1973-01-11
BE726207A
(en)
1969-05-29
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