GB1259165A – – Google Patents
GB1259165A – – Google Patents
Info
Publication number
GB1259165A
GB1259165A
GB1259165DA
GB1259165A
GB 1259165 A
GB1259165 A
GB 1259165A
GB 1259165D A
GB1259165D A
GB 1259165DA
GB 1259165 A
GB1259165 A
GB 1259165A
Authority
GB
United Kingdom
Prior art keywords
passages
mask
hole structure
images
jan
Prior art date
1968-01-30
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
1968-01-30
Filing date
1969-01-29
Publication date
1972-01-05
1969-01-29
Application filed
filed
Critical
1972-01-05
Publication of GB1259165A
publication
Critical
patent/GB1259165A/en
Status
Expired
legal-status
Critical
Current
Links
Espacenet
Global Dossier
Discuss
Classifications
G—PHYSICS
G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
G03F1/20—Masks or mask blanks for imaging by charged particle beam [CPB] radiation, e.g. by electron beam; Preparation thereof
G—PHYSICS
G02—OPTICS
G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
G02B5/00—Optical elements other than lenses
G02B5/005—Diaphragms
H—ELECTRICITY
H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
H05K3/00—Apparatus or processes for manufacturing printed circuits
H05K3/0002—Apparatus or processes for manufacturing printed circuits for manufacturing artworks for printed circuits
H—ELECTRICITY
H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
H10N—ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
H10N97/00—Electric solid-state thin-film or thick-film devices, not otherwise provided for
H—ELECTRICITY
H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
H05K2203/00—Indexing scheme relating to apparatus or processes for manufacturing printed circuits covered by H05K3/00
H05K2203/05—Patterning and lithography; Masks; Details of resist
H05K2203/0548—Masks
H05K2203/056—Using an artwork, i.e. a photomask for exposing photosensitive layers
Abstract
1,259,165. Optical apparatus. BRUNSWICK CORP. Jan.29, 1969 [Jan.30, 1968], No.5016/69. Heading G2J. A method of producing high resolution images comprises forming a collimated hole structure 10 defined by a body having a plurality of substantially rectilinear, parallel through passages 12 extending between spaced surfaces of the body, the passages having a maximum transverse dimension of under 500 microns and having an aspect ratio of at least 5:1, providing on one of said surfaces a mask 16, Fig. 5, defining an opening 15 of pre-selected shape, said opening exposing a plurality of the passages, and passing radiation through the exposed passages to form a plurality of images corresponding accurately to the cross-sections of said passages. The mask 16 may be plated on to the body or may be formed by exposing and developing a photoresist material. The method may be used in micro-circuitry wherein the images are formed on a radiation-resist layer which is then developed and etched. Desirably the maximum transverse dimension of the passages is under 10 microns. Alternatively the mask may be another collimated hole structure. Also if desired the body 10 may have corresponding masks over body end surfaces. The hole structure comprises a composite formed of a metal matrix and a plurality of substantially rectilinear, parallel filaments formed of a different metal which is leached out to form the passages.
GB1259165D
1968-01-30
1969-01-29
Expired
GB1259165A
(en)
Applications Claiming Priority (1)
Application Number
Priority Date
Filing Date
Title
US70176068A
1968-01-30
1968-01-30
Publications (1)
Publication Number
Publication Date
GB1259165A
true
GB1259165A
(en)
1972-01-05
Family
ID=24818564
Family Applications (1)
Application Number
Title
Priority Date
Filing Date
GB1259165D
Expired
GB1259165A
(en)
1968-01-30
1969-01-29
Country Status (8)
Country
Link
US
(1)
US3556636A
(en)
BE
(1)
BE727671A
(en)
BR
(1)
BR6906012D0
(en)
CH
(1)
CH496259A
(en)
DE
(1)
DE1904172B2
(en)
FR
(1)
FR2000965A1
(en)
GB
(1)
GB1259165A
(en)
NL
(1)
NL6901353A
(en)
Cited By (1)
* Cited by examiner, † Cited by third party
Publication number
Priority date
Publication date
Assignee
Title
CN112255715A
(en)
*
2020-10-23
2021-01-22
江南大学
Method for realizing broadband light absorption enhancement based on ultrathin metal film and wave absorbing device
Families Citing this family (12)
* Cited by examiner, † Cited by third party
Publication number
Priority date
Publication date
Assignee
Title
US3678564A
(en)
*
1968-01-30
1972-07-25
Brunswick Corp
Method of producing high resolution images and structure for use therein
US3771592A
(en)
*
1971-08-16
1973-11-13
Owens Illinois Inc
Matrix and method of making same
US5879425A
(en)
*
1971-09-20
1999-03-09
Litton Systems, Inc.
Method for fabrication of microchannel multiplier plates
US4116655A
(en)
*
1975-07-09
1978-09-26
Elliott Brothers (London) Limited
Method for making optical-fibre cables
US4410394A
(en)
*
1980-12-23
1983-10-18
United Technologies Corporation
Methods of making cooled, thermally stable composite mirrors
FR2517835A1
(en)
*
1981-12-03
1983-06-10
Fort Francois
IMPROVEMENTS TO IMAGE CONDUCTORS
US4516832A
(en)
*
1982-06-23
1985-05-14
International Business Machines Corporation
Apparatus for transformation of a collimated beam into a source of _required shape and numerical aperture
US4590492A
(en)
*
1983-06-07
1986-05-20
The United States Of America As Represented By The Secretary Of The Air Force
High resolution optical fiber print head
US5028112A
(en)
*
1990-06-27
1991-07-02
The United States Of America As Represented By The Secretary Of The Navy
Precision multi-channel fiber optic interface and method
CA2167675C
(en)
1993-07-29
2002-10-01
Sheldon L. Epstein
Inspection system for optical components
DE29901791U1
(en)
*
1999-02-02
2000-07-06
Novartis Ag
Lens measuring device
US6765661B2
(en)
2001-03-09
2004-07-20
Novartis Ag
Lens inspection
1968
1968-01-30
US
US701760*A
patent/US3556636A/en
not_active
Expired – Lifetime
1969
1969-01-24
DE
DE19691904172
patent/DE1904172B2/en
active
Pending
1969-01-28
NL
NL6901353A
patent/NL6901353A/xx
unknown
1969-01-29
FR
FR6901781A
patent/FR2000965A1/fr
not_active
Withdrawn
1969-01-29
GB
GB1259165D
patent/GB1259165A/en
not_active
Expired
1969-01-29
CH
CH137869A
patent/CH496259A/en
not_active
IP Right Cessation
1969-01-30
BE
BE727671D
patent/BE727671A/xx
unknown
1969-01-30
BR
BR206012/69A
patent/BR6906012D0/en
unknown
Cited By (2)
* Cited by examiner, † Cited by third party
Publication number
Priority date
Publication date
Assignee
Title
CN112255715A
(en)
*
2020-10-23
2021-01-22
江南大学
Method for realizing broadband light absorption enhancement based on ultrathin metal film and wave absorbing device
CN112255715B
(en)
*
2020-10-23
2021-12-03
江南大学
Method for realizing broadband light absorption enhancement based on ultrathin metal film and wave absorbing device
Also Published As
Publication number
Publication date
BR6906012D0
(en)
1973-01-18
CH496259A
(en)
1970-09-15
FR2000965A1
(en)
1969-09-19
DE1904172A1
(en)
1969-09-11
NL6901353A
(en)
1969-08-01
US3556636A
(en)
1971-01-19
DE1904172B2
(en)
1972-04-20
BE727671A
(en)
1969-07-30
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Legal Events
Date
Code
Title
Description
1972-05-17
PS
Patent sealed [section 19, patents act 1949]
1973-08-22
PLNP
Patent lapsed through nonpayment of renewal fees
