GB1324653A

GB1324653A – Electroless plating processes
– Google Patents

GB1324653A – Electroless plating processes
– Google Patents
Electroless plating processes

Info

Publication number
GB1324653A

GB1324653A

GB1324653DA
GB1324653A
GB 1324653 A
GB1324653 A
GB 1324653A

GB 1324653D A
GB1324653D A
GB 1324653DA
GB 1324653 A
GB1324653 A
GB 1324653A
Authority
GB
United Kingdom
Prior art keywords
ions
electroless plating
substrate
electrons
dec
Prior art date
1970-12-11
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)

Expired

Application number

Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)

UK Atomic Energy Authority

Original Assignee
UK Atomic Energy Authority
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
1970-12-11
Filing date
1970-12-11
Publication date
1973-07-25

1970-12-11
Application filed by UK Atomic Energy Authority
filed
Critical
UK Atomic Energy Authority

1973-07-25
Publication of GB1324653A
publication
Critical
patent/GB1324653A/en

Status
Expired
legal-status
Critical
Current

Links

Espacenet

Global Dossier

Discuss

Classifications

H—ELECTRICITY

H01—ELECTRIC ELEMENTS

H01F—MAGNETS; INDUCTANCES; TRANSFORMERS; SELECTION OF MATERIALS FOR THEIR MAGNETIC PROPERTIES

H01F41/00—Apparatus or processes specially adapted for manufacturing or assembling magnets, inductances or transformers; Apparatus or processes specially adapted for manufacturing materials characterised by their magnetic properties

H01F41/14—Apparatus or processes specially adapted for manufacturing or assembling magnets, inductances or transformers; Apparatus or processes specially adapted for manufacturing materials characterised by their magnetic properties for applying magnetic films to substrates

H01F41/24—Apparatus or processes specially adapted for manufacturing or assembling magnets, inductances or transformers; Apparatus or processes specially adapted for manufacturing materials characterised by their magnetic properties for applying magnetic films to substrates from liquids

C—CHEMISTRY; METALLURGY

C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL

C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL

C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating

C23C18/16—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by reduction or substitution, e.g. electroless plating

C23C18/18—Pretreatment of the material to be coated

C23C18/1803—Pretreatment of the material to be coated of metallic material surfaces or of a non-specific material surfaces

C—CHEMISTRY; METALLURGY

C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL

C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL

C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating

C23C18/16—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by reduction or substitution, e.g. electroless plating

C23C18/18—Pretreatment of the material to be coated

C23C18/20—Pretreatment of the material to be coated of organic surfaces, e.g. resins

C23C18/2006—Pretreatment of the material to be coated of organic surfaces, e.g. resins by other methods than those of C23C18/22 – C23C18/30

H—ELECTRICITY

H01—ELECTRIC ELEMENTS

H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS

H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof

H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects

H01J37/317—Electron-beam or ion-beam tubes for localised treatment of objects for changing properties of the objects or for applying thin layers thereon, e.g. for ion implantation

H01J37/3178—Electron-beam or ion-beam tubes for localised treatment of objects for changing properties of the objects or for applying thin layers thereon, e.g. for ion implantation for applying thin layers on objects

Abstract

1324653 Activation and electroless plating UNITED KINGDOM ATOMIC ENERGY AUTHORITY 11 Dec 1970 [11 Dec 1969] 60626/ 69 Addition to 1247007 Heading C7F Prior to electroless plating , a substrate is bombarded with a dosage of ions sufficient to provide an activated, but not a coated surface, the ions being derived from a source forming a plasma of ions and electrons, and the surface being subjected to alternate periods of bombardment by said ions and electrons respectively in order to prevent build-up of charge on the surface. As shown, make-and-break contacts 1, one of C and the other of Pd, are driven by vibrator 2 and an arc is produced by D.C. source 3. A.C. is applied between 1 and extraction electrode 4 by winding 5, there being beyond the aperture in 4 two arcuate plates 6, one electrically connected to 4 and the other connected in phase to 5. Thus there are produced in +ve and -ve half cycles Pd ions and electrons respectively which are deflected to bombard substrate 7, any neutral particles being caught on plates 6. The ion energy may be 100-1000 eV, the substrate glass or plastics, and the subsequent electroless coating Ni or magnetic alloy, e.g. Ni-Co-P.

GB1324653D
1970-12-11
1970-12-11
Electroless plating processes

Expired

GB1324653A
(en)

Applications Claiming Priority (1)

Application Number
Priority Date
Filing Date
Title

GB6062669

1970-12-11

Publications (1)

Publication Number
Publication Date

GB1324653A
true

GB1324653A
(en)

1973-07-25

Family
ID=10485833
Family Applications (1)

Application Number
Title
Priority Date
Filing Date

GB1324653D
Expired

GB1324653A
(en)

1970-12-11
1970-12-11
Electroless plating processes

Country Status (1)

Country
Link

GB
(1)

GB1324653A
(en)

Cited By (4)

* Cited by examiner, † Cited by third party

Publication number
Priority date
Publication date
Assignee
Title

US4440801A
(en)

*

1982-07-09
1984-04-03
International Business Machines Corporation
Method for depositing a metal layer on polyesters

US4686114A
(en)

*

1986-01-17
1987-08-11
Halliwell Michael J
Selective electroless plating

US7622205B2
(en)

2004-04-16
2009-11-24
Fuji Electric Device Technology Co. Ltd.
Disk substrate for a perpendicular magnetic recording medium and a perpendicular magnetic recording medium using the substrate

US8039045B2
(en)

2004-07-27
2011-10-18
Fuji Electric Co., Ltd.
Method of manufacturing a disk substrate for a magnetic recording medium

1970

1970-12-11
GB
GB1324653D
patent/GB1324653A/en
not_active
Expired

Cited By (4)

* Cited by examiner, † Cited by third party

Publication number
Priority date
Publication date
Assignee
Title

US4440801A
(en)

*

1982-07-09
1984-04-03
International Business Machines Corporation
Method for depositing a metal layer on polyesters

US4686114A
(en)

*

1986-01-17
1987-08-11
Halliwell Michael J
Selective electroless plating

US7622205B2
(en)

2004-04-16
2009-11-24
Fuji Electric Device Technology Co. Ltd.
Disk substrate for a perpendicular magnetic recording medium and a perpendicular magnetic recording medium using the substrate

US8039045B2
(en)

2004-07-27
2011-10-18
Fuji Electric Co., Ltd.
Method of manufacturing a disk substrate for a magnetic recording medium

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Legal Events

Date
Code
Title
Description

1973-12-05
PS
Patent sealed

1980-11-05
PCNP
Patent ceased through non-payment of renewal fee

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