GB1392758A – Process for etching silicon nitride
– Google Patents
GB1392758A – Process for etching silicon nitride
– Google Patents
Process for etching silicon nitride
Info
Publication number
GB1392758A
GB1392758A
GB4037972A
GB4037972A
GB1392758A
GB 1392758 A
GB1392758 A
GB 1392758A
GB 4037972 A
GB4037972 A
GB 4037972A
GB 4037972 A
GB4037972 A
GB 4037972A
GB 1392758 A
GB1392758 A
GB 1392758A
Authority
GB
United Kingdom
Prior art keywords
silicon nitride
etching silicon
silicon
etching
sept
Prior art date
1971-09-03
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
GB4037972A
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
AT&T Corp
Original Assignee
Western Electric Co Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
1971-09-03
Filing date
1972-08-31
Publication date
1975-04-30
1972-08-31
Application filed by Western Electric Co Inc
filed
Critical
Western Electric Co Inc
1975-04-30
Publication of GB1392758A
publication
Critical
patent/GB1392758A/en
Status
Expired
legal-status
Critical
Current
Links
Espacenet
Global Dossier
Discuss
Classifications
C—CHEMISTRY; METALLURGY
C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
C09K—MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FOR ELSEWHERE
C09K13/00—Etching, surface-brightening or pickling compositions
C09K13/04—Etching, surface-brightening or pickling compositions containing an inorganic acid
H—ELECTRICITY
H01—ELECTRIC ELEMENTS
H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having at least one potential-jump barrier or surface barrier, e.g. PN junction, depletion layer or carrier concentration layer
H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having at least one potential-jump barrier or surface barrier, e.g. PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic System or AIIIBV compounds with or without impurities, e.g. doping materials
H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 – H01L21/26
H01L21/31—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 – H01L21/26 to form insulating layers thereon, e.g. for masking or by using photolithographic techniques; After treatment of these layers; Selection of materials for these layers
H01L21/3105—After-treatment
H01L21/311—Etching the insulating layers by chemical or physical means
H01L21/31105—Etching inorganic layers
H01L21/31111—Etching inorganic layers by chemical means
Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
Y10S148/00—Metal treatment
Y10S148/043—Dual dielectric
Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
Y10S148/00—Metal treatment
Y10S148/051—Etching
Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
Y10S148/00—Metal treatment
Y10S148/114—Nitrides of silicon
Abstract
1392758 Etching WESTERN ELECTRIC CO Inc 31 Aug 1972 [3 Sept 1971] 40379/72 Heading B6J Silicon nitride is etched with a solution comprising orthophosphoric acid, 10-40% sulphuric acid, and sufficient water to make the boiling point 160-180‹ C. In planar silicon processing, the silicon nitride has windows which expose base silicon, which is not attached by the above etchant.
GB4037972A
1971-09-03
1972-08-31
Process for etching silicon nitride
Expired
GB1392758A
(en)
Applications Claiming Priority (1)
Application Number
Priority Date
Filing Date
Title
US17784071A
1971-09-03
1971-09-03
Publications (1)
Publication Number
Publication Date
GB1392758A
true
GB1392758A
(en)
1975-04-30
Family
ID=22650170
Family Applications (1)
Application Number
Title
Priority Date
Filing Date
GB4037972A
Expired
GB1392758A
(en)
1971-09-03
1972-08-31
Process for etching silicon nitride
Country Status (12)
Country
Link
US
(1)
US3715249A
(en)
JP
(1)
JPS5141550B2
(en)
KR
(1)
KR780000506B1
(en)
BE
(1)
BE788159A
(en)
CA
(1)
CA958313A
(en)
DE
(1)
DE2241870C3
(en)
FR
(1)
FR2151104B1
(en)
GB
(1)
GB1392758A
(en)
HK
(1)
HK35876A
(en)
IT
(1)
IT962297B
(en)
NL
(1)
NL154059B
(en)
SE
(1)
SE375118B
(en)
Families Citing this family (10)
* Cited by examiner, † Cited by third party
Publication number
Priority date
Publication date
Assignee
Title
DE2425684A1
(en)
*
1974-05-28
1975-12-11
Ibm Deutschland
PROCESS FOR ETCHING MATERIALS CONTAINING SILICON
US4116714A
(en)
*
1977-08-15
1978-09-26
International Business Machines Corporation
Post-polishing semiconductor surface cleaning process
US5215930A
(en)
*
1991-10-23
1993-06-01
At&T Bell Laboratories
Integrated circuit etching of silicon nitride and polysilicon using phosphoric acid
KR970008354B1
(en)
*
1994-01-12
1997-05-23
엘지반도체 주식회사
Selective etching method
US5607543A
(en)
*
1995-04-28
1997-03-04
Lucent Technologies Inc.
Integrated circuit etching
US5885903A
(en)
*
1997-01-22
1999-03-23
Micron Technology, Inc.
Process for selectively etching silicon nitride in the presence of silicon oxide
WO2005067019A1
(en)
*
2003-12-30
2005-07-21
Akrion, Llc
System and method for selective etching of silicon nitride during substrate processing
JP3882932B2
(en)
2004-04-08
2007-02-21
信越化学工業株式会社
Zirconium-containing oxide
JP4799332B2
(en)
*
2006-09-12
2011-10-26
株式会社東芝
Etching solution, etching method, and electronic component manufacturing method
TWI629720B
(en)
2015-09-30
2018-07-11
東京威力科創股份有限公司
Method and apparatus for dynamic control of the temperature of a wet etch process
1971
1971-09-03
US
US00177840A
patent/US3715249A/en
not_active
Expired – Lifetime
1972
1972-03-23
CA
CA137,932A
patent/CA958313A/en
not_active
Expired
1972-08-21
SE
SE7210841A
patent/SE375118B/xx
unknown
1972-08-25
DE
DE2241870A
patent/DE2241870C3/en
not_active
Expired
1972-08-25
NL
NL727211625A
patent/NL154059B/en
not_active
IP Right Cessation
1972-08-25
JP
JP47084700A
patent/JPS5141550B2/ja
not_active
Expired
1972-08-29
KR
KR7201303A
patent/KR780000506B1/en
active
1972-08-30
IT
IT52451/72A
patent/IT962297B/en
active
1972-08-30
BE
BE788159A
patent/BE788159A/en
unknown
1972-08-31
GB
GB4037972A
patent/GB1392758A/en
not_active
Expired
1972-09-01
FR
FR7231175A
patent/FR2151104B1/fr
not_active
Expired
1976
1976-06-10
HK
HK358/76*UA
patent/HK35876A/en
unknown
Also Published As
Publication number
Publication date
FR2151104A1
(en)
1973-04-13
DE2241870B2
(en)
1976-03-11
BE788159A
(en)
1972-12-18
US3715249A
(en)
1973-02-06
IT962297B
(en)
1973-12-20
DE2241870C3
(en)
1978-04-20
JPS5141550B2
(en)
1976-11-10
KR780000506B1
(en)
1978-10-25
NL7211625A
(en)
1973-03-06
FR2151104B1
(en)
1974-08-19
SE375118B
(en)
1975-04-07
CA958313A
(en)
1974-11-26
JPS4834675A
(en)
1973-05-21
NL154059B
(en)
1977-07-15
DE2241870A1
(en)
1973-03-22
HK35876A
(en)
1976-06-18
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EFFECT OF HYDROGEN PEROXIDE ON CORROSION OF BRASS BY MINERAL ACIDS
Legal Events
Date
Code
Title
Description
1975-09-10
PS
Patent sealed [section 19, patents act 1949]
1984-05-02
PCNP
Patent ceased through non-payment of renewal fee
