GB1442797A

GB1442797A – Radiation-sensitive copolymer
– Google Patents

GB1442797A – Radiation-sensitive copolymer
– Google Patents
Radiation-sensitive copolymer

Info

Publication number
GB1442797A

GB1442797A
GB5941673A
GB5941673A
GB1442797A
GB 1442797 A
GB1442797 A
GB 1442797A
GB 5941673 A
GB5941673 A
GB 5941673A
GB 5941673 A
GB5941673 A
GB 5941673A
GB 1442797 A
GB1442797 A
GB 1442797A
Authority
GB
United Kingdom
Prior art keywords
units
group
formula
methyl
chloride
Prior art date
1972-12-22
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)

Expired

Application number
GB5941673A
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)

Eastman Kodak Co

Original Assignee
Eastman Kodak Co
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
1972-12-22
Filing date
1973-12-21
Publication date
1976-07-14

1973-12-21
Application filed by Eastman Kodak Co
filed
Critical
Eastman Kodak Co

1976-07-14
Publication of GB1442797A
publication
Critical
patent/GB1442797A/en

Status
Expired
legal-status
Critical
Current

Links

Espacenet

Global Dossier

Discuss

Classifications

G—PHYSICS

G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY

G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR

G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor

G03F7/004—Photosensitive materials

G03F7/022—Quinonediazides

G03F7/023—Macromolecular quinonediazides; Macromolecular additives, e.g. binders

C—CHEMISTRY; METALLURGY

C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON

C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS

C08F8/00—Chemical modification by after-treatment

Abstract

1442797 Radiation – sensitive copolymers EASTMAN KODAK CO 21 Dec 1973 [22 Dec 1972] 59416/73 Heading C3P [Also in Division G2] Radiation-sensitive copolymers contain, on a molar basis, (A) 75-87% of units of formula wherein R1 is hydrogen or methyl and R2 is a C 1-6 alkyl or cycloalkyl group; (B) 10-22% of units of formula wherein R1 is hydrogen or methyl, R3 is a C 2-6 alkylene group, X is a carbonyl or sulphonyl group, and D is a quinone diazide group; (C) 1-7 % of units of formula wherein R1 is hydrogen or methyl, R3 is a C 2-6 alkylene group, and R4 is a hydrocarbon or halohydrocarbon group having up to 20 carbon atoms; and optionally (D) 0-4% of units of formula wherein R1 and R3 are as above. The copolymers may be prepared by introducing units (B) and (C) into a copolymer of (A) and (B) by esterification of hydroxyl groups in (B). Exemplified copolymers are prepared by copolymerizing methyl methacrylate with 2-hydroxyethyl acrylate or methacrylate and then reacting the hydroxyl groups partially or completely with a mixture of 1,2-naphthoquinone-2-diazide-5-sulphonyl chloride and one of benzoyl chloride, p-bromo-benzoyl chloride, acetyl chloride and myristyl chloride.

GB5941673A
1972-12-22
1973-12-21
Radiation-sensitive copolymer

Expired

GB1442797A
(en)

Applications Claiming Priority (1)

Application Number
Priority Date
Filing Date
Title

US31758572A

1972-12-22
1972-12-22

Publications (1)

Publication Number
Publication Date

GB1442797A
true

GB1442797A
(en)

1976-07-14

Family
ID=23234356
Family Applications (1)

Application Number
Title
Priority Date
Filing Date

GB5941673A
Expired

GB1442797A
(en)

1972-12-22
1973-12-21
Radiation-sensitive copolymer

Country Status (6)

Country
Link

JP
(1)

JPS5630849B2
(en)

BE
(1)

BE809031A
(en)

CA
(1)

CA1005673A
(en)

FR
(1)

FR2211677B1
(en)

GB
(1)

GB1442797A
(en)

IT
(1)

IT1000552B
(en)

Families Citing this family (8)

* Cited by examiner, † Cited by third party

Publication number
Priority date
Publication date
Assignee
Title

US4491628A
(en)

*

1982-08-23
1985-01-01
International Business Machines Corporation
Positive- and negative-working resist compositions with acid generating photoinitiator and polymer with acid labile groups pendant from polymer backbone

JPS61206293A
(en)

*

1985-03-08
1986-09-12
日本ペイント株式会社
Manufacture of circuit board

US4732836A
(en)

*

1986-05-02
1988-03-22
Hoechst Celanese Corporation
Novel mixed ester O-quinone photosensitizers

US5035976A
(en)

*

1986-05-02
1991-07-30
Hoechst Celanese Corporation
Photosensitive article having phenolic photosensitizers containing quinone diazide and acid halide substituents

US4732837A
(en)

*

1986-05-02
1988-03-22
Hoechst Celanese Corporation
Novel mixed ester O-quinone photosensitizers

DE3852559T2
(en)

*

1987-03-12
1995-05-24
Konishiroku Photo Ind

Photosensitive positive planographic printing plate.

DE3731439A1
(en)

*

1987-09-18
1989-03-30
Hoechst Ag

RADIATION SENSITIVE MIXTURE AND COPIER MATERIAL PRODUCED THEREOF

JPH07119374B2
(en)

*

1987-11-06
1995-12-20
関西ペイント株式会社

Positive type photosensitive cationic electrodeposition coating composition

1973

1973-11-16
CA
CA185,999A
patent/CA1005673A/en
not_active
Expired

1973-12-20
IT
IT7076573A
patent/IT1000552B/en
active

1973-12-21
GB
GB5941673A
patent/GB1442797A/en
not_active
Expired

1973-12-21
FR
FR7345904A
patent/FR2211677B1/fr
not_active
Expired

1973-12-21
BE
BE139217A
patent/BE809031A/en
not_active
IP Right Cessation

1973-12-22
JP
JP443774A
patent/JPS5630849B2/ja
not_active
Expired

Also Published As

Publication number
Publication date

JPS5630849B2
(en)

1981-07-17

BE809031A
(en)

1974-06-21

FR2211677B1
(en)

1977-08-12

FR2211677A1
(en)

1974-07-19

CA1005673A
(en)

1977-02-22

JPS49126403A
(en)

1974-12-04

DE2364178A1
(en)

1974-07-11

IT1000552B
(en)

1976-04-10

DE2364178B2
(en)

1976-01-15

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FOERBAETTRINGAR I MACROLIDANTIBIOTICS.

Legal Events

Date
Code
Title
Description

1976-11-24
PS
Patent sealed

1993-08-18
PCNP
Patent ceased through non-payment of renewal fee

Effective date:
19921221

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