GB1457165A – Electron beam vaporizer
– Google Patents
GB1457165A – Electron beam vaporizer
– Google Patents
Electron beam vaporizer
Info
Publication number
GB1457165A
GB1457165A
GB3994374A
GB3994374A
GB1457165A
GB 1457165 A
GB1457165 A
GB 1457165A
GB 3994374 A
GB3994374 A
GB 3994374A
GB 3994374 A
GB3994374 A
GB 3994374A
GB 1457165 A
GB1457165 A
GB 1457165A
Authority
GB
United Kingdom
Prior art keywords
crucible
field
polepieces
sept
substrate
Prior art date
1973-09-17
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
GB3994374A
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Robert Bosch GmbH
Original Assignee
Robert Bosch GmbH
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
1973-09-17
Filing date
1974-09-13
Publication date
1976-12-01
1973-09-17
Priority claimed from DE19732346799
external-priority
patent/DE2346799C3/en
1974-09-13
Application filed by Robert Bosch GmbH
filed
Critical
Robert Bosch GmbH
1976-12-01
Publication of GB1457165A
publication
Critical
patent/GB1457165A/en
Status
Expired
legal-status
Critical
Current
Links
Espacenet
Global Dossier
Discuss
Classifications
C—CHEMISTRY; METALLURGY
C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
C23C14/24—Vacuum evaporation
C23C14/28—Vacuum evaporation by wave energy or particle radiation
C23C14/30—Vacuum evaporation by wave energy or particle radiation by electron bombardment
Abstract
1457165 Electron beam furnace ROBERT BOSCH GmbH 13 Sept 1974 [17 Sept 1973] 39943/74 Heading H1D [Also in Division C7] To coat evenly a substrate by evaporation from an elongated crucible heated by one or more electron beams, a D.C. electromagnet 29 with polepieces 18, 19 along the long sides of the crucible 17 provides a field 23 across the surface 25 of the melting charge, while beam(s) 12, 13 enter linearly at acute angles to the field, in horizontal projection, either at the crucible end or through oblique apertures 26 in the polepieces, and spiral down to the melting surface 25. Electrons 32 scattered once by vapour particles cannot escape from the field, and electrons reflected 35 without loss of energy from surface 25 restrike the surface. To reduce risk of positive ions bombarding the gun 10, 11 cathodes, the guns may be displaced vertically or horizontally from the straight trajectory, the electron beams being deflected externally by known means to rejoin the straight trajectory (Fig. 4, not shown). The vapour, partially trapped between the polepiece walls, deposits coating on the band of substrate 21 moving across the crucible 17. Al is quoted as an example of coating material.
GB3994374A
1973-09-17
1974-09-13
Electron beam vaporizer
Expired
GB1457165A
(en)
Applications Claiming Priority (1)
Application Number
Priority Date
Filing Date
Title
DE19732346799
DE2346799C3
(en)
1973-09-17
Electron beam evaporator
Publications (1)
Publication Number
Publication Date
GB1457165A
true
GB1457165A
(en)
1976-12-01
Family
ID=5892846
Family Applications (1)
Application Number
Title
Priority Date
Filing Date
GB3994374A
Expired
GB1457165A
(en)
1973-09-17
1974-09-13
Electron beam vaporizer
Country Status (6)
Country
Link
US
(1)
US3931490A
(en)
JP
(1)
JPS5711952B2
(en)
DD
(1)
DD113570A5
(en)
FR
(1)
FR2244014B1
(en)
GB
(1)
GB1457165A
(en)
NL
(1)
NL7412256A
(en)
Families Citing this family (25)
* Cited by examiner, † Cited by third party
Publication number
Priority date
Publication date
Assignee
Title
DD204947A1
(en)
*
1982-04-20
1983-12-14
Manfred Neumann
EQUIPMENT FOR ELECTRON RADIATION STEAMING BROADER
DD208995A1
(en)
*
1982-08-03
1984-04-18
Manfred Neumann
EQUIPMENT FOR ELECTRON BEAM STEAMING VERY WIDE
JPS5959754U
(en)
*
1982-10-13
1984-04-19
セイレイ工業株式会社
Branching machine engine stop switch
JPS61285934A
(en)
*
1985-06-12
1986-12-16
開成工業株式会社
Pruning machine
JP3568189B2
(en)
*
1999-04-21
2004-09-22
東北パイオニア株式会社
Method and apparatus for manufacturing organic EL display
TW490714B
(en)
*
1999-12-27
2002-06-11
Semiconductor Energy Lab
Film formation apparatus and method for forming a film
US20020011205A1
(en)
2000-05-02
2002-01-31
Shunpei Yamazaki
Film-forming apparatus, method of cleaning the same, and method of manufacturing a light-emitting device
US7517551B2
(en)
*
2000-05-12
2009-04-14
Semiconductor Energy Laboratory Co., Ltd.
Method of manufacturing a light-emitting device
SG113448A1
(en)
*
2002-02-25
2005-08-29
Semiconductor Energy Lab
Fabrication system and a fabrication method of a light emitting device
US7309269B2
(en)
2002-04-15
2007-12-18
Semiconductor Energy Laboratory Co., Ltd.
Method of fabricating light-emitting device and apparatus for manufacturing light-emitting device
US20040035360A1
(en)
*
2002-05-17
2004-02-26
Semiconductor Energy Laboratory Co., Ltd.
Manufacturing apparatus
TWI336905B
(en)
*
2002-05-17
2011-02-01
Semiconductor Energy Lab
Evaporation method, evaporation device and method of fabricating light emitting device
US20030221620A1
(en)
*
2002-06-03
2003-12-04
Semiconductor Energy Laboratory Co., Ltd.
Vapor deposition device
US20040040504A1
(en)
*
2002-08-01
2004-03-04
Semiconductor Energy Laboratory Co., Ltd.
Manufacturing apparatus
TWI277363B
(en)
*
2002-08-30
2007-03-21
Semiconductor Energy Lab
Fabrication system, light-emitting device and fabricating method of organic compound-containing layer
AU2003263609A1
(en)
2002-09-20
2004-04-08
Semiconductor Energy Laboratory Co., Ltd.
Fabrication system and manufacturing method of light emitting device
US7211461B2
(en)
*
2003-02-14
2007-05-01
Semiconductor Energy Laboratory Co., Ltd.
Manufacturing apparatus
JP4463492B2
(en)
*
2003-04-10
2010-05-19
株式会社半導体エネルギー研究所
Manufacturing equipment
JP4493926B2
(en)
2003-04-25
2010-06-30
株式会社半導体エネルギー研究所
Manufacturing equipment
US7211454B2
(en)
*
2003-07-25
2007-05-01
Semiconductor Energy Laboratory Co., Ltd.
Manufacturing method of a light emitting device including moving the source of the vapor deposition parallel to the substrate
US8123862B2
(en)
*
2003-08-15
2012-02-28
Semiconductor Energy Laboratory Co., Ltd.
Deposition apparatus and manufacturing apparatus
JP4545504B2
(en)
*
2004-07-15
2010-09-15
株式会社半導体エネルギー研究所
Film forming method and light emitting device manufacturing method
TW201034228A
(en)
*
2008-12-05
2010-09-16
Solopower Inc
Method and apparatus for forming contact layers for continuous workpieces
CN201864770U
(en)
*
2010-11-22
2011-06-15
江苏淘镜有限公司
Evaporation crucible for electron gun
DE102018117130A1
(en)
*
2018-07-16
2020-01-16
VON ARDENNE Asset GmbH & Co. KG
Coating arrangement and method
Family Cites Families (9)
* Cited by examiner, † Cited by third party
Publication number
Priority date
Publication date
Assignee
Title
US3364296A
(en)
*
1963-06-12
1968-01-16
Air Reduction
Electron beam furnace
US3244855A
(en)
*
1963-07-19
1966-04-05
United States Steel Corp
System for correcting the shift of an electron-gun beam from the desired region of impingement
US3389210A
(en)
*
1965-03-29
1968-06-18
Everette M. Whitson
Multiple crucible for a permanent magnet transverse electron beam evaporation source
US3394217A
(en)
*
1965-06-11
1968-07-23
Air Reduction
Method and apparatus for controlling plural electron beams
US3432335A
(en)
*
1966-03-15
1969-03-11
Lokomotivbau Elektrotech
Cyclically moving electron beam for uniform vapor deposited coating
US3394678A
(en)
*
1966-12-23
1968-07-30
Air Reduction
Apparatus for vacuum coating
US3612859A
(en)
*
1968-01-31
1971-10-12
Westinghouse Electric Corp
Method for measuring and controlling the density of a metallic vapor
US3714416A
(en)
*
1969-02-24
1973-01-30
Applied Radiation Corp
Method and apparatus for irradiation treatment of elongate materials
US3655902A
(en)
*
1970-10-19
1972-04-11
Air Reduction
Heating system for electron beam furnace
1973
1973-12-06
FR
FR7343614A
patent/FR2244014B1/fr
not_active
Expired
1974
1974-08-28
US
US05/501,142
patent/US3931490A/en
not_active
Expired – Lifetime
1974-09-12
DD
DD181060A
patent/DD113570A5/xx
unknown
1974-09-13
GB
GB3994374A
patent/GB1457165A/en
not_active
Expired
1974-09-16
NL
NL7412256A
patent/NL7412256A/en
active
Search and Examination
1974-09-17
JP
JP10702974A
patent/JPS5711952B2/ja
not_active
Expired
Also Published As
Publication number
Publication date
FR2244014A1
(en)
1975-04-11
JPS5056380A
(en)
1975-05-17
DD113570A5
(en)
1975-06-12
US3931490A
(en)
1976-01-06
DE2346799B2
(en)
1976-04-22
FR2244014B1
(en)
1976-10-08
JPS5711952B2
(en)
1982-03-08
NL7412256A
(en)
1975-03-19
DE2346799A1
(en)
1975-04-24
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Legal Events
Date
Code
Title
Description
1977-04-14
PS
Patent sealed [section 19, patents act 1949]
1982-12-01
746
Register noted ‘licences of right’ (sect. 46/1977)
1986-05-14
PCNP
Patent ceased through non-payment of renewal fee
