GB1528015A – Electroless plating
– Google Patents
GB1528015A – Electroless plating
– Google Patents
Electroless plating
Info
Publication number
GB1528015A
GB1528015A
GB39713/75A
GB3971375A
GB1528015A
GB 1528015 A
GB1528015 A
GB 1528015A
GB 39713/75 A
GB39713/75 A
GB 39713/75A
GB 3971375 A
GB3971375 A
GB 3971375A
GB 1528015 A
GB1528015 A
GB 1528015A
Authority
GB
United Kingdom
Prior art keywords
electroless plating
colloid
metal
alkyl
reducing agent
Prior art date
1974-10-04
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
GB39713/75A
Inventor
Nathan Feldstein
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Surface Technology Inc
Original Assignee
Surface Technology Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
1974-10-04
Filing date
1975-09-29
Publication date
1978-10-11
1975-09-29
Application filed by Surface Technology Inc
filed
Critical
Surface Technology Inc
1978-10-11
Publication of GB1528015A
publication
Critical
patent/GB1528015A/en
Status
Expired
legal-status
Critical
Current
Links
Espacenet
Global Dossier
Discuss
Classifications
C—CHEMISTRY; METALLURGY
C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
C23C18/16—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by reduction or substitution, e.g. electroless plating
C23C18/18—Pretreatment of the material to be coated
C23C18/20—Pretreatment of the material to be coated of organic surfaces, e.g. resins
C23C18/28—Sensitising or activating
H—ELECTRICITY
H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
H05K3/00—Apparatus or processes for manufacturing printed circuits
H05K3/10—Apparatus or processes for manufacturing printed circuits in which conductive material is applied to the insulating support in such a manner as to form the desired conductive pattern
H05K3/18—Apparatus or processes for manufacturing printed circuits in which conductive material is applied to the insulating support in such a manner as to form the desired conductive pattern using precipitation techniques to apply the conductive material
H05K3/181—Apparatus or processes for manufacturing printed circuits in which conductive material is applied to the insulating support in such a manner as to form the desired conductive pattern using precipitation techniques to apply the conductive material by electroless plating
H—ELECTRICITY
H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
H05K1/00—Printed circuits
H05K1/02—Details
H05K1/03—Use of materials for the substrate
H05K1/0306—Inorganic insulating substrates, e.g. ceramic, glass
Abstract
1528015 Preparing dielectric substrate and electroless plating SURFACE TECHNOLOGY Inc 29 Sept 1975 [4 Oct 1974 26 Aug 1975] 39713/75 Heading C7F A dielectric substrate is prepared for electroless plating by (1) coating with a hydrous oxide colloid of a non-precious metal and (2) reducing the valency of said metal with a reducing agent. The substrate may be ABS, resin, or glass, preferably pre-etched in CrO 3 /H 2 SO 4 . The non-precious metal is preferably Co, Ni and/or Cu but may be Fe or Cr; the term “hydrous oxide” includes oxides and/or hydroxides or metallic nuclei with an oxidized outer surface; the colloid may contain a stabilizer which is a secondary colloid (a list is given) a polyalcohol or a sugar, or a surfactant, e.g. of the fluorinated type. The reducing agent may be dimethylamine borane, diethylhydroxylamine, an N-alkyl borazone, an N-alkyl borazole, borazene and/or borazine, or an alkali- or alkaline earth-metal borohydride; this may be contained in the subsequent electroless solution or in a separate solution; electroless plating with Cu, Ni or Co is described.
GB39713/75A
1974-10-04
1975-09-29
Electroless plating
Expired
GB1528015A
(en)
Applications Claiming Priority (2)
Application Number
Priority Date
Filing Date
Title
US51222474A
1974-10-04
1974-10-04
US05/607,506
US3993799A
(en)
1974-10-04
1975-08-26
Electroless plating process employing non-noble metal hydrous oxide catalyst
Publications (1)
Publication Number
Publication Date
GB1528015A
true
GB1528015A
(en)
1978-10-11
Family
ID=27057493
Family Applications (1)
Application Number
Title
Priority Date
Filing Date
GB39713/75A
Expired
GB1528015A
(en)
1974-10-04
1975-09-29
Electroless plating
Country Status (10)
Country
Link
US
(1)
US3993799A
(en)
JP
(1)
JPS5163464A
(en)
AU
(1)
AU8543775A
(en)
BR
(1)
BR7506436A
(en)
CA
(1)
CA1081405A
(en)
DE
(1)
DE2544381A1
(en)
FR
(1)
FR2287094A1
(en)
GB
(1)
GB1528015A
(en)
IT
(1)
IT1043091B
(en)
NL
(1)
NL7511350A
(en)
Cited By (1)
* Cited by examiner, † Cited by third party
Publication number
Priority date
Publication date
Assignee
Title
GB2143853A
(en)
*
1983-07-21
1985-02-20
Suisse Horlogerie Rech Lab
Deposition
Families Citing this family (42)
* Cited by examiner, † Cited by third party
Publication number
Priority date
Publication date
Assignee
Title
US4321285A
(en)
*
1974-10-04
1982-03-23
Surface Technology, Inc.
Electroless plating
US5009965A
(en)
*
1974-10-04
1991-04-23
Nathan Feldstein
Colloidal compositions for electroless deposition
US4136216A
(en)
*
1975-08-26
1979-01-23
Surface Technology, Inc.
Non-precious metal colloidal dispersions for electroless metal deposition
US4338355A
(en)
*
1975-10-23
1982-07-06
Nathan Feldstein
Process using activated electroless plating catalysts
US4087586A
(en)
*
1975-12-29
1978-05-02
Nathan Feldstein
Electroless metal deposition and article
US4151311A
(en)
*
1976-01-22
1979-04-24
Nathan Feldstein
Post colloid addition of catalytic promoters to non noble metal principal catalytic compounds in electroless plating catalysts
US4151313A
(en)
*
1977-03-11
1979-04-24
Hitachi, Ltd.
Method for production of printed circuits by electroless metal plating employing a solid solution of metal oxides of titanium, nickel, and antimony as a masking material
US4233344A
(en)
*
1978-07-20
1980-11-11
Learonal, Inc.
Method of improving the adhesion of electroless metal deposits employing colloidal copper activator
US4258087A
(en)
*
1978-08-17
1981-03-24
Nathan Feldstein
Dispersions for activating non-conductors for electroless plating
US4318940A
(en)
*
1978-08-17
1982-03-09
Surface Technology, Inc.
Dispersions for activating non-conductors for electroless plating
US4339476A
(en)
*
1978-08-17
1982-07-13
Nathan Feldstein
Dispersions for activating non-conductors for electroless plating
US4278712A
(en)
*
1978-08-31
1981-07-14
Surface Technology, Inc.
Method for activating non-noble metal colloidal dispersion by controlled oxidation for electroless plating
US4261747A
(en)
*
1978-12-06
1981-04-14
Nathan Feldstein
Dispersions for activating non-conductors for electroless plating
DE3121015C2
(en)
*
1981-05-27
1986-12-04
Friedr. Blasberg GmbH und Co KG, 5650 Solingen
Process for activating pickled surfaces and solution for carrying out the same
US4681630A
(en)
*
1982-09-27
1987-07-21
Learonal, Inc.
Method of making copper colloid for activating insulating surfaces
US4762560A
(en)
*
1982-09-27
1988-08-09
Learonal, Inc.
Copper colloid and method of activating insulating surfaces for subsequent electroplating
JPS60120589A
(en)
*
1983-12-02
1985-06-28
塩尻工業株式会社
Method of producing printed circuit board
US4759952A
(en)
*
1984-01-26
1988-07-26
Learonal, Inc.
Process for printed circuit board manufacture
US4761304A
(en)
*
1984-01-26
1988-08-02
Learonal, Inc.
Process for printed circuit board manufacture
US4847114A
(en)
*
1984-01-26
1989-07-11
Learonal, Inc.
Preparation of printed circuit boards by selective metallization
US5007990A
(en)
*
1987-07-10
1991-04-16
Shipley Company Inc.
Electroplating process
US4952286A
(en)
*
1987-07-10
1990-08-28
Shipley Company Inc.
Electroplating process
US4895739A
(en)
*
1988-02-08
1990-01-23
Shipley Company Inc.
Pretreatment for electroplating process
US5294370A
(en)
*
1988-11-15
1994-03-15
Hbt Holland Biotechnology B.V.
Selenium or tellurium elemental hydrosols and their preparation
NL8900305A
(en)
*
1989-02-08
1990-09-03
Philips Nv
METHOD FOR MANUFACTURING A SEMICONDUCTOR DEVICE
JPH0379100A
(en)
*
1989-08-22
1991-04-04
Matsushita Electric Ind Co Ltd
Light transmission paste and precipitating method for metal copper using the same
US4919768A
(en)
*
1989-09-22
1990-04-24
Shipley Company Inc.
Electroplating process
US5147692A
(en)
*
1990-05-08
1992-09-15
Macdermid, Incorporated
Electroless plating of nickel onto surfaces such as copper or fused tungston
JP2768390B2
(en)
*
1990-12-11
1998-06-25
インターナショナル・ビジネス・マシーンズ・コーポレイション
Method of conditioning a substrate for electroless metal deposition
US5164286A
(en)
*
1991-02-01
1992-11-17
Ocg Microelectronic Materials, Inc.
Photoresist developer containing fluorinated amphoteric surfactant
DE4113263A1
(en)
*
1991-04-23
1992-10-29
Siemens Ag
Copper@-coating of ceramic parts by electroless plating – used for metallisation of dielectric or coaxial resonators
DE4113262A1
(en)
*
1991-04-23
1992-10-29
Siemens Ag
Electroless application of copper@ base coat to aluminium oxide ceramic substrate – by copper@ plating, selective varnishing, stripping and galvanic deposition of nickel@ and/or gold@, for prodn. of conducting strips
US5474798A
(en)
*
1994-08-26
1995-12-12
Macdermid, Incorporated
Method for the manufacture of printed circuit boards
US6264851B1
(en)
1998-03-17
2001-07-24
International Business Machines Corporation
Selective seed and plate using permanent resist
GB0118870D0
(en)
*
2001-08-02
2001-09-26
Shipley Co Llc
A combined adhesion promotion and direct metallization process
US7410893B2
(en)
*
2005-04-08
2008-08-12
Hewlett-Packard Development Company, L.P.
System and method for depositing a seed layer
KR101313151B1
(en)
*
2009-12-17
2013-09-30
비와이디 컴퍼니 리미티드
Surface metallizing method, method for preparing plastic article and plastic article made therefrom
EP2610365B1
(en)
2011-12-31
2020-02-26
Rohm and Haas Electronic Materials LLC
Electroless plating method
EP2610366A3
(en)
2011-12-31
2014-07-30
Rohm and Haas Electronic Materials LLC
Plating catalyst and method
CN105164311A
(en)
*
2012-02-02
2015-12-16
新纳米有限公司
Thin coatings on materials
EP3149222A4
(en)
*
2014-05-27
2018-06-06
Auckland Uniservices Limited
Plating or coating method for producing metal-ceramic coating on a substrate
JP6343787B1
(en)
*
2017-06-01
2018-06-20
石原ケミカル株式会社
Copper colloid catalyst solution for electroless copper plating and electroless copper plating method
Family Cites Families (3)
* Cited by examiner, † Cited by third party
Publication number
Priority date
Publication date
Assignee
Title
US3657003A
(en)
*
1970-02-02
1972-04-18
Western Electric Co
Method of rendering a non-wettable surface wettable
US3925578A
(en)
*
1971-07-29
1975-12-09
Kollmorgen Photocircuits
Sensitized substrates for chemical metallization
US3950570A
(en)
*
1974-05-02
1976-04-13
Western Electric Company, Inc.
Method of depositing a metal on a surface
1975
1975-08-26
US
US05/607,506
patent/US3993799A/en
not_active
Expired – Lifetime
1975-09-26
NL
NL7511350A
patent/NL7511350A/en
unknown
1975-09-29
GB
GB39713/75A
patent/GB1528015A/en
not_active
Expired
1975-10-01
CA
CA236,844A
patent/CA1081405A/en
not_active
Expired
1975-10-02
FR
FR7530140A
patent/FR2287094A1/en
not_active
Withdrawn
1975-10-03
DE
DE19752544381
patent/DE2544381A1/en
active
Pending
1975-10-03
AU
AU85437/75A
patent/AU8543775A/en
not_active
Expired
1975-10-03
JP
JP50119662A
patent/JPS5163464A/en
active
Pending
1975-10-03
BR
BR7506436*A
patent/BR7506436A/en
unknown
1975-10-03
IT
IT27918/75A
patent/IT1043091B/en
active
Cited By (1)
* Cited by examiner, † Cited by third party
Publication number
Priority date
Publication date
Assignee
Title
GB2143853A
(en)
*
1983-07-21
1985-02-20
Suisse Horlogerie Rech Lab
Deposition
Also Published As
Publication number
Publication date
BR7506436A
(en)
1976-08-10
DE2544381A1
(en)
1976-04-15
JPS5163464A
(en)
1976-06-01
IT1043091B
(en)
1980-02-20
US3993799A
(en)
1976-11-23
CA1081405A
(en)
1980-07-15
FR2287094A1
(en)
1976-04-30
AU8543775A
(en)
1977-04-07
NL7511350A
(en)
1976-04-06
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Legal Events
Date
Code
Title
Description
1979-01-31
PS
Patent sealed [section 19, patents act 1949]
1991-05-29
PCNP
Patent ceased through non-payment of renewal fee
