GB2015036B

GB2015036B – Forming a pattern of material on a substrate
– Google Patents

GB2015036B – Forming a pattern of material on a substrate
– Google Patents
Forming a pattern of material on a substrate

Info

Publication number
GB2015036B

GB2015036B
GB7903579A
GB7903579A
GB2015036B
GB 2015036 B
GB2015036 B
GB 2015036B
GB 7903579 A
GB7903579 A
GB 7903579A
GB 7903579 A
GB7903579 A
GB 7903579A
GB 2015036 B
GB2015036 B
GB 2015036B
Authority
GB
United Kingdom
Prior art keywords
pattern
substrate
forming
Prior art date
1978-02-01
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)

Expired

Application number
GB7903579A
Other versions

GB2015036A
(en

Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)

Hitachi Denshi KK

Hitachi Ltd

Original Assignee
Hitachi Denshi KK
Hitachi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
1978-02-01
Filing date
1979-02-01
Publication date
1982-06-09

1979-02-01
Application filed by Hitachi Denshi KK, Hitachi Ltd
filed
Critical
Hitachi Denshi KK

1979-09-05
Publication of GB2015036A
publication
Critical
patent/GB2015036A/en

1982-06-09
Application granted
granted
Critical

1982-06-09
Publication of GB2015036B
publication
Critical
patent/GB2015036B/en

Status
Expired
legal-status
Critical
Current

Links

Espacenet

Global Dossier

Discuss

Classifications

H—ELECTRICITY

H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR

H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS

H05K3/00—Apparatus or processes for manufacturing printed circuits

H05K3/10—Apparatus or processes for manufacturing printed circuits in which conductive material is applied to the insulating support in such a manner as to form the desired conductive pattern

H05K3/14—Apparatus or processes for manufacturing printed circuits in which conductive material is applied to the insulating support in such a manner as to form the desired conductive pattern using spraying techniques to apply the conductive material, e.g. vapour evaporation

H05K3/143—Masks therefor

C—CHEMISTRY; METALLURGY

C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL

C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL

C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material

C23C14/04—Coating on selected surface areas, e.g. using masks

C23C14/042—Coating on selected surface areas, e.g. using masks using masks

GB7903579A
1978-02-01
1979-02-01
Forming a pattern of material on a substrate

Expired

GB2015036B
(en)

Applications Claiming Priority (1)

Application Number
Priority Date
Filing Date
Title

JP926378A

JPS54103552A
(en)

1978-02-01
1978-02-01
Pattern formation method

Publications (2)

Publication Number
Publication Date

GB2015036A

GB2015036A
(en)

1979-09-05

GB2015036B
true

GB2015036B
(en)

1982-06-09

Family
ID=11715536
Family Applications (1)

Application Number
Title
Priority Date
Filing Date

GB7903579A
Expired

GB2015036B
(en)

1978-02-01
1979-02-01
Forming a pattern of material on a substrate

Country Status (7)

Country
Link

US
(1)

US4273812A
(en)

JP
(1)

JPS54103552A
(en)

CA
(1)

CA1111144A
(en)

DE
(1)

DE2903872C2
(en)

FR
(1)

FR2416500B1
(en)

GB
(1)

GB2015036B
(en)

NL
(1)

NL7900828A
(en)

Families Citing this family (18)

* Cited by examiner, † Cited by third party

Publication number
Priority date
Publication date
Assignee
Title

US4418473A
(en)

*

1982-03-26
1983-12-06
International Business Machines Corp.
Method of making edge protected ferrite core

US4451344A
(en)

*

1982-03-26
1984-05-29
International Business Machines Corp.
Method of making edge protected ferrite core

US4511599A
(en)

*

1983-03-01
1985-04-16
Sigmatron Associates
Mask for vacuum depositing back metal electrodes on EL panel

US4536419A
(en)

*

1983-03-10
1985-08-20
Hitachi, Ltd.
Method for forming tapered films

US4574093A
(en)

*

1983-12-30
1986-03-04
At&T Bell Laboratories
Deposition technique

US4776868A
(en)

*

1985-09-09
1988-10-11
Corning Glass Works
Lenses and lens arrays

US4615781A
(en)

*

1985-10-23
1986-10-07
Gte Products Corporation
Mask assembly having mask stress relieving feature

US4746548A
(en)

*

1985-10-23
1988-05-24
Gte Products Corporation
Method for registration of shadow masked thin-film patterns

US4915057A
(en)

*

1985-10-23
1990-04-10
Gte Products Corporation
Apparatus and method for registration of shadow masked thin-film patterns

US4715940A
(en)

*

1985-10-23
1987-12-29
Gte Products Corporation
Mask for patterning electrode structures in thin film EL devices

US5003870A
(en)

*

1989-08-21
1991-04-02
Hughes Aircraft Company
Antistretch screen printing arrangement

US5389397A
(en)

*

1989-08-29
1995-02-14
North American Philips Corporation
Method for controlling the thickness distribution of a deposited layer

US5643629A
(en)

*

1991-05-20
1997-07-01
Sauerland; Franz L.
Method for adjusting center frequency and bandwidth of monolithic filters by plating through a single-aperture mask on a single side of the filters electrode pattern to plate selected areas of the pattern

US6469439B2
(en)

*

1999-06-15
2002-10-22
Toray Industries, Inc.
Process for producing an organic electroluminescent device

US6712943B2
(en)

*

2001-11-06
2004-03-30
The Boc Group, Inc.
Methods for angle limiting deposition mask

DE602006008850D1
(en)

*

2005-03-30
2009-10-15
Brother Ind Ltd

deposition mask

US8815013B2
(en)

*

2006-07-19
2014-08-26
Intermolecular, Inc.
Method and system for isolated and discretized process sequence integration

US11035033B2
(en)

*

2017-10-24
2021-06-15
Emagin Corporation
Direct-deposition system including standoffs for controlling substrate-mask separation

Family Cites Families (13)

* Cited by examiner, † Cited by third party

Publication number
Priority date
Publication date
Assignee
Title

US2676114A
(en)

*

1951-06-08
1954-04-20
Libbey Owens Ford Glass Co
Method of producing graded coatings

DE1446197A1
(en)

*

1959-04-27
1969-05-29
Licentia Gmbh

Screen to limit areas to be vaporized under reduced pressure

NL276676A
(en)

*

1961-04-13

US3193408A
(en)

*

1961-08-22
1965-07-06
David P Triller
Method for producing integrated circuitry components

NL294779A
(en)

*

1962-07-20

DE1272680B
(en)

*

1963-09-16
1968-07-11
Halbleiterwerk Frankfurt Oder

Device for vacuum vapor deposition of layers on a large number of documents covered with masks

US3326718A
(en)

*

1963-12-30
1967-06-20
Hughes Aircraft Co
Method for making an electrical capacitor

DE1521536A1
(en)

*

1965-12-21
1969-09-11
Telefunken Patent

Process for the production of several superimposed layers

US3510349A
(en)

*

1966-11-15
1970-05-05
Us Air Force
Vacuum deposited interconnection matrix

CH489620A
(en)

*

1967-10-02
1970-04-30
Stanniolfabrik Burgdorf Ag

Device for achieving sharply delimited non-metallized strips by vapor deposition in a high vacuum on a carrier web running around a cooling roller in a continuously operating vapor deposition system

US3799792A
(en)

*

1971-12-14
1974-03-26
Texas Instruments Inc
Vapor deposition method

DE2412398A1
(en)

*

1973-03-22
1974-10-17
Roparco Ltd

ROTARY LISTON ENGINE OR ROTARY LISTON COMPRESSOR

US4049857A
(en)

*

1976-07-28
1977-09-20
International Business Machines Corporation
Deposition mask and methods of making same

1978

1978-02-01
JP
JP926378A
patent/JPS54103552A/en
active
Granted

1979

1979-01-25
FR
FR7901901A
patent/FR2416500B1/en
not_active
Expired

1979-01-31
CA
CA320,564A
patent/CA1111144A/en
not_active
Expired

1979-02-01
GB
GB7903579A
patent/GB2015036B/en
not_active
Expired

1979-02-01
NL
NL7900828A
patent/NL7900828A/en
not_active
Application Discontinuation

1979-02-01
DE
DE2903872A
patent/DE2903872C2/en
not_active
Expired

1979-02-01
US
US06/008,587
patent/US4273812A/en
not_active
Expired – Lifetime

Also Published As

Publication number
Publication date

FR2416500B1
(en)

1986-12-26

FR2416500A1
(en)

1979-08-31

GB2015036A
(en)

1979-09-05

DE2903872A1
(en)

1979-08-02

DE2903872C2
(en)

1983-09-29

JPS54103552A
(en)

1979-08-15

CA1111144A
(en)

1981-10-20

JPS5625790B2
(en)

1981-06-15

NL7900828A
(en)

1979-08-03

US4273812A
(en)

1981-06-16

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(en)

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Production of pattern

Legal Events

Date
Code
Title
Description

1996-09-18
PCNP
Patent ceased through non-payment of renewal fee

Effective date:
19960201

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