GB2027929A - Creation of Inventions and Patents with Artificial Intelligence

GB2027929A – High bandwidth gradient index optical filament and method of fabrication
– Google Patents

GB2027929A – High bandwidth gradient index optical filament and method of fabrication
– Google Patents
High bandwidth gradient index optical filament and method of fabrication

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Publication number
GB2027929A

GB2027929A
GB7926122A
GB7926122A
GB2027929A
GB 2027929 A
GB2027929 A
GB 2027929A
GB 7926122 A
GB7926122 A
GB 7926122A
GB 7926122 A
GB7926122 A
GB 7926122A
GB 2027929 A
GB2027929 A
GB 2027929A
Authority
GB
United Kingdom
Prior art keywords
barrier layer
core
refraction
index
interface
Prior art date
1978-07-31
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)

Granted

Application number
GB7926122A
Other versions

GB2027929B
(en

Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)

Corning Glass Works

Original Assignee
Corning Glass Works
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
1978-07-31
Filing date
1979-07-26
Publication date
1980-02-27

1979-07-26
Application filed by Corning Glass Works
filed
Critical
Corning Glass Works

1980-02-27
Publication of GB2027929A
publication
Critical
patent/GB2027929A/en

1983-04-27
Application granted
granted
Critical

1983-04-27
Publication of GB2027929B
publication
Critical
patent/GB2027929B/en

Status
Expired
legal-status
Critical
Current

Links

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Global Dossier

Discuss

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Classifications

G—PHYSICS

G02—OPTICS

G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS

G02B6/00—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings

G02B6/02—Optical fibres with cladding with or without a coating

G02B6/036—Optical fibres with cladding with or without a coating core or cladding comprising multiple layers

G02B6/03616—Optical fibres characterised both by the number of different refractive index layers around the central core segment, i.e. around the innermost high index core layer, and their relative refractive index difference

G02B6/03622—Optical fibres characterised both by the number of different refractive index layers around the central core segment, i.e. around the innermost high index core layer, and their relative refractive index difference having 2 layers only

G02B6/03627—Optical fibres characterised both by the number of different refractive index layers around the central core segment, i.e. around the innermost high index core layer, and their relative refractive index difference having 2 layers only arranged – +

C—CHEMISTRY; METALLURGY

C03—GLASS; MINERAL OR SLAG WOOL

C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES

C03B37/00—Manufacture or treatment of flakes, fibres, or filaments from softened glass, minerals, or slags

C03B37/01—Manufacture of glass fibres or filaments

C03B37/012—Manufacture of preforms for drawing fibres or filaments

C03B37/014—Manufacture of preforms for drawing fibres or filaments made entirely or partially by chemical means, e.g. vapour phase deposition of bulk porous glass either by outside vapour deposition [OVD], or by outside vapour phase oxidation [OVPO] or by vapour axial deposition [VAD]

C03B37/018—Manufacture of preforms for drawing fibres or filaments made entirely or partially by chemical means, e.g. vapour phase deposition of bulk porous glass either by outside vapour deposition [OVD], or by outside vapour phase oxidation [OVPO] or by vapour axial deposition [VAD] by glass deposition on a glass substrate, e.g. by inside-, modified-, plasma-, or plasma modified- chemical vapour deposition [ICVD, MCVD, PCVD, PMCVD], i.e. by thin layer coating on the inside or outside of a glass tube or on a glass rod

C—CHEMISTRY; METALLURGY

C03—GLASS; MINERAL OR SLAG WOOL

C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES

C03B37/00—Manufacture or treatment of flakes, fibres, or filaments from softened glass, minerals, or slags

C03B37/01—Manufacture of glass fibres or filaments

C03B37/012—Manufacture of preforms for drawing fibres or filaments

C03B37/01861—Means for changing or stabilising the diameter or form of tubes or rods

C—CHEMISTRY; METALLURGY

C03—GLASS; MINERAL OR SLAG WOOL

C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS

C03C13/00—Fibre or filament compositions

C03C13/04—Fibre optics, e.g. core and clad fibre compositions

C03C13/045—Silica-containing oxide glass compositions

G—PHYSICS

G02—OPTICS

G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS

G02B6/00—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings

G02B6/02—Optical fibres with cladding with or without a coating

G02B6/028—Optical fibres with cladding with or without a coating with core or cladding having graded refractive index

G02B6/0288—Multimode fibre, e.g. graded index core for compensating modal dispersion

C—CHEMISTRY; METALLURGY

C03—GLASS; MINERAL OR SLAG WOOL

C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES

C03B2201/00—Type of glass produced

C03B2201/06—Doped silica-based glasses

C03B2201/08—Doped silica-based glasses doped with boron or fluorine or other refractive index decreasing dopant

C03B2201/10—Doped silica-based glasses doped with boron or fluorine or other refractive index decreasing dopant doped with boron

C—CHEMISTRY; METALLURGY

C03—GLASS; MINERAL OR SLAG WOOL

C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES

C03B2201/00—Type of glass produced

C03B2201/06—Doped silica-based glasses

C03B2201/20—Doped silica-based glasses doped with non-metals other than boron or fluorine

C03B2201/28—Doped silica-based glasses doped with non-metals other than boron or fluorine doped with phosphorus

C—CHEMISTRY; METALLURGY

C03—GLASS; MINERAL OR SLAG WOOL

C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES

C03B2201/00—Type of glass produced

C03B2201/06—Doped silica-based glasses

C03B2201/30—Doped silica-based glasses doped with metals, e.g. Ga, Sn, Sb, Pb or Bi

C03B2201/31—Doped silica-based glasses doped with metals, e.g. Ga, Sn, Sb, Pb or Bi doped with germanium

C—CHEMISTRY; METALLURGY

C03—GLASS; MINERAL OR SLAG WOOL

C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES

C03B2203/00—Fibre product details, e.g. structure, shape

C03B2203/10—Internal structure or shape details

C03B2203/22—Radial profile of refractive index, composition or softening point

C03B2203/26—Parabolic or graded index [GRIN] core profile

Description

1
GB 2 027 929 A
1
specification
High bandwidth gradient index optical filament and method of fabrication
5 This invention relates, as does our concurrently filed application Serial No. 7926121 to high bandwidth gradient index optical filaments useful as transmission media and to the method of fabrication thereof. The present invention seeks to solve essentially the same problem as our concurrently filed application is concerned with but in a different way, the solution herein provided being more fully hereinafter described.
Optical filaments used in optical communication systems are herein referred to as optical waveguides, and 10 are normally constructed from a transparent dielectric material, such as glass or plastic.
BACKGROUND ART
Gradient index optical waveguides have a radially varying composition and consequently a radially varying refractive index. U.S. Patents 3,823,995 and 3,711,262 disclose gradient index optical waveguides 15 and methods for their formation by inside vapor phase oxidation processes. When referring herein to inside vapor phase oxidation processes we intend to include chemical vapor deposition, flame hydrolysis and any other processes by which vaporous material is directed into a heated tube, reacted with oxygen under the influence of heat and deposited on the inside wall surface of said tube. The material may be deposited within the tube in successive layers after which the tube is removed from the heat to leave a fused blank. As will be 20 understood, the central hole may be collapsed at the end of the deposition process, or the blank after removal from the heat may subsequently be reheated and the hole collapsed, in either case forming a solid preform, or the hole may be collapsed during the drawing process. When a solid preform is formed, it is subsequently heated and drawn into an elongated, fine strand. Inasmuch as the structure of the drawn strand or filament reflects the structure of the preform, it is important that the physical characteristics of the 25 preform be carefully controlled.
As is familiar to those skilled in the art, gradient index optical waveguides commonly exhibit a jiigher index of refraction in the core at the center thereof and lower indices of refraction at points radially outward from the core center. The gradient index of refraction may be varied continuously or discontinuously, and may exhibit a linear, parabolic, or any other desired characteristic. As regards the construction and use of 30 optical waveguides reference should be made to “Fiber Optics Principles and Applications” by N.S. Kapany, Academic Press, 1967; “Geometrical Optics of Parabolic Index Gradient Cylindrical Lenses” by F.P. Kapron, Journal of the Optical Society of America, Vol. 60, No. 11, pages 1433-1436, November, 1970; and “Cylindrical Dielectric Waveguide Mode” by E. Snitzer, Journal of the Optical Society of America, Vol. 51, No. 5, pages 491 -498, May 1961.
35 In order to effect such change of the index of refraction of a preform or blank formed by an inside vapor phase oxidation process, the chemical composition of the source materials, which on reaction, comprise the ultimate material deposited on the inside surface of the tube, may be varied. The vapor mixture is hydrolized or oxidized and deposited on the inside surface of the tube and subsequently fused to form a high quality and purity glass. At the same time, one or more additional vapors can be supplied to the tube, each vapor 40 being constituted of a chemical termed a “dopant” whose presence affects the index of refraction or other characteristics of the glass being formed.
It is known in forming optical waveguide blanks or preforms by the inside vapor phase oxidation process to include a barrier layer on the inside of the support or substrate tube priorto the deposition of the core glass, the substrate tube constituting the cladding of the preform. The principal function of the barrier layer 45 is to minimize interface scattering and absorption losses by removing the core-cladding interface which would exist, in the absence of the barrier layer, between deposited layers of high purity, low attenuation glasses and the substrate tube inner surface. The barrier layer is conventionally a boro-silicate glass composition since doping silica, which is generally the base glass, with boron reduces the deposition temperature and thereby minimizes shrinkage of the substrate tube. Other advantages of doping silica with 50 boron is that it reduces the refractive index of the glass and it acts as a barrier to the diffusion of hydroxyl ions, commonly referred to as hydrogen or water, from the substrate tube to the deposited core glass at the elevated processing and drawing temperatures.
It is well known that the information bandwidth of an optical waveguide filament can be substantially increased by grading the index of refraction profile. The bandwidth of a graded index of refraction optical 55 waveguide can be from about 10 to 103 times greater than the bandwidth of a filament with an ungraded index profile. The increase in bandwidth is very dependent on the shape of the index of refraction profile.
The problem is that in the prior art formation of inside vapor phase oxidation gradient index optical waveguide preforms or blanks, and the glass filaments formed therefrom, the filaments exhibit a . combination step-graded index of refraction profile which causes pulse spreading of higher order modes 60 resulting in lower bandwidth. Such a profile is illustrated in Figure 1 where the gradient portion is indicated by curve 10 while the stepped portion is indicated by the substantially straight vertical portion 12 showing a step increase in the index of refraction.
A combination step-graded index of refraction profile which is also believed to cause pulse spreading of higher order modes is illustrated in Figure 2 where the gradient portion is indicated by curve 14 while the 65 stepped portion is indicated by step 16. The undesired combination step-graded index of refraction profile
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GB 2 027 929 A
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illustrated in Figure 2 is disclosed herein for illustrative purposes only since it is not known to exist in the prior art but is believed useful for providing a better understanding of our invention.
There are at least two causes of the combination step-graded profile illustrated in Figures 1 and 2. A high boron level is desired in the barrier layer for reasons discussed above. A low boron level is desired in the 5 core to increase the numerical aperture of the resulting optical waveguide, to minimize Rayleigh scattering 5 * and to eliminate the infrared absorption of the B-0 vibrational bands in the spectral range between 1.2 and 1.5 micrometers (H. Osani et al.. Electronic Letters 12,549,1976). The second reason for such a step-graded profile is that at the barrier layer-core interface a dopant such as Ge02 and/or P205, or the like, must be introduced at a finite lever set by the capability of the source material vapor delivery system. It should be 10 noted that in the illustrations of both Figures 1 and 2, the index of refraction of the core at the barrier 10
layer-core interface is higher, by a value of An, than the index of refraction of the substrate tube material or cladding. Such step increases in the core index of refraction of the barrier layer-core interface is believed to produce the pulse spreading of higher order modes resulting in lower bandwidth. In each example, silica is shown as the substrate tube material having an index of refraction of 1.4570, with the index of refraction at 15 the central axis 18 and 20 of the filaments of Figures 1 and 2 respectively being 1.4766. As will be understood, 15 the indices of refraction are at a wavelength of about 630 nm. for a filament having a numerical aperture of about 0.24.
Curve 48 of Figure 13 illustrates the pulse broadening which has been observed in a typical combination step-graded profile made by the prior art. The tall narrow portion of the pulse is produced by the graded part 20 of the index of refraction profile, while the wide base extending to the right is caused by the step part of the 20 profile. The bandwidth of the filament illustrated by curve 48 of Figure 13 has been measured to be 260 mHz for a one kilometer length.
A commonly used method of fabricating, for example, Ge02-Si02-B203 or Si02-Ge02-B203-P203 core gradient index optical waveguides is illustrated in Figures 3 and 4 wherein the simultaneous reduction of the 25 B203 level and the introduction of finite levels of Ge02 and/or P205 causes a step increase in the refractive 25 index at the edge of the core and leads to the step-gradient profile of Figure 1 as hereinabove described. On the other hand, the method illustrated by Figure 5, showing the second type of undesirable step-gradient profile illustrated in Figure 2, results when finite levels of Ge02 and/or P205 are used in the barrier layer together with B2O3, and the amount of B203 in the barrier layer is insufficient to compensate for the increase 30 in the refractive index due to the amount of Ge02 and/or P205 present. In such* a situation, a step increase in 30 the index of refraction is caused at the cladding-barrier layer interface which leads to the step-gradient index profile of Figure 2.
Although Figures 3,4 and 5 illustrate the starting source materials as the chlorides or the like of boron,
silicon, germania, and phosphorous, it should be understood these source materials, underthe influence of 35 oxygen and heat, react to product the respective oxides. Also, as used herein, inside vapor phase oxidation 35 includes “chemical vapor deposition” and other vapor phase oxidation methods. The phrase “chemical vapor deposition” means the formation of deposits by chemical reactions which take place on, at, or near the deposition surface. This definition is set forth on page 3 of the test “Vapor Deposition” edited by D.F. Powell et al., New York, John Wiley & Sons, Inc., 1966. Any procedural variations well known in the art may be 40 employed to effect the deposition of the suitable coating of-glass by the chemical vapor deposition process, 40 such as, for example that described on page 263 of the aforementioned Powell etal. text which states:
“Another means of obtaining uniform coverage which also can given high deposition efficiency, and which is especially applicable to the coating of the inside surfaces of small bore tubing, is to heat only a small portion of the tubing to the deposition temperature…. The section heated to the deposition temperature is 45 slowly moved over the total length of the tube or the total area to be coated.” In this connection, reference is 45 also made to U.S. Patent 3,031,338.
Another effective means of applying coatings by vapor phase oxidation is to sinter a soot layer of the desired material applied by flame hydrolysis process similar to that described in U.S. Patent 2,272,342 or U.S. Patent 2,326,059.
50 50
DISCLOSURE OF INVENTION
With the foregoing in mind our invention generally seeks to avoid formation of the step part of the profile and to produce instead pure graded index of refraction profiles such as those illustrated in Figures 6 or 7. As shown by curve 52 6f Figure 13, the filament of the present invention has much less broadening and a 55 measured bandwidth of 910 mHz for a one kilometer length. The reduced pulse broadening and high 55
bandwidth is achieved by elimination of the step portion of the step-graded profile.
More specifically, and in accordance with the invention, we provide a high bandwidth gradient index *
optical filament comprising an outer cladding layer, a barrier layer on the inside wall surface of said cladding layer and comprising a base glass and B203, the quantity of said base glass and said B203 throughout the 60 thickness of said barrier layer being substantially uniform, and a core of high purity glass, having a gradient 60 index of refraction, disposed within said barrier layer and adhered thereto to form an interface therebetween, said core consisting essentially of a base glass, B203 and at least one additional dopant, characterized in that (a) the barrier layer includes said at least one additional dopant in a substantially uniform quantity throughout the thickness of the barrier layer and in an amount related to that of said B203 65 to provide the barrier layer with an index of refraction at most equal to that of the cladding layer and that (b) 65
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GB 2 027 929 A
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the core has a stepless index of refraction at said interface substantially equal to the index of refraction of the barrier layer at the interface, the quantity of B2C>3 decreasing within said core from said interface towards the central axis of said optical filament while the quantity of said at least one additional dopant gradually varies at said interface towards said central axis in a predetermined manner from its uniform quantity throughout 5 the thickness of said barrier layer so as to result in a desired stepless and substantially continuously varying gradient index of refraction across the cross section of said core.
BRIEF DESCRIPTION OF THEDRA WINGS
Objects, features and advantages of the present invention will become apparent to those skilled in the art 10 from the following detailed description and the attached drawings, on which, by way of example, only the preferred embodiments of this invention are illustrated.
Figure 1 is a graphical illustration of a prior art step-gradient index of refraction profile waveguide.
Figure 2 is a graphical illustration of another step-gradient index of refraction profile, low bandwidth waveguide.
15 Figures 3 and 4 are graphical illustrations of the methods of prior art introduction of source vapor materials in the formation of step-gradient index of refraction profile optical waveguides.
Figure 5 is a graphical illustration of a method of introducing source vapor materials in the formation of the step-gradient index of refraction profile waveguide of Figure 2.
Figures 6 and 7 are graphical illustrations of high bandwidth gradient index optical filaments formed in 20 accordance with the present invention.
Figure 8 is an oblique view of an optical waveguide in accordance with this invention.
Figures 9 and 10 are graphical illustrations of the methods for introducing source vapor mateials in the formation of high bandwidth optical filaments in accordance with the present invention.
Figure 11 is a graphical illustration of another method of introducing source vapor materials in the 25 formation of high bandwidth optical filaments in accordance with the present invention.
Figure 12 is a graphical illustration of the principal mode number vs delay time of an optical waveguide formed by the present invention as compared to a waveguide of the prior art.
Figure 13 is a graphical illustration of bandwidth represented by time vs power of an optical waveguide formed by the present invention as compared to a waveguide of the prior art.
30
BRIEF DESCRIPTION OF THE INVENTION
It is to be noted that the drawings are illustrative and symbolic of the present invention and there is no intention to indicate scale or relative proportions of the elements shown therein. For purposes of simplicity, the present invention will be described in connection with the formation of high bandwidth gradient index 35 optical waveguide preforms and the waveguides themselves wherein the base glass is silica although this invention is not intended to be limited thereto.
Two examples of high bandwidth gradient index optical filaments made from preforms or blanks formed in accordance with the present invention are illustrated by Figures 6 and 7. Figure 8 illustrated a typical optical waveguide 22 formed in accordance with the present invention. Referring to Figures 6 and 8, gradient 40 index of refraction core 24 is indicated in Figure 6 by curve 26 while the barrier layer 28 is indicated by flat portion 30. The starting member or substrate tube 32, which ultimately forms the waveguide cladding, is illustrated by flat portion 34 in Figure 6. As will be understood, the barier layer comprises the first deposited material on the inside surface of the substrate tube and is sometimes referred to as the deposited cladding. The base glass and substrate tube material used in the description of the present invention is silica, 45 wherefore, the index of refraction of the cladding portion illustrated in Figure 6 is 1.4570. This is true for each of the illustrations set out in Figures 1,2,6 and 7 for purposes of simplicity of description and easy comparison. To further these aims, the index of refraction in each of these examples at the central axes 18, 20,36 and 38 of the optical waveguides of Figures 1,2,6 and 7 respectively is approximately 1.4766, while the barrier layer thickness “b” of each is approximately 1 micrometer and the core radius “a” is 50 approximately 31.25 micrometers.
The method of forming a preform or blank of the present invention as well as the optical filament itself may be any of various methods, such as for example, those described in the heretofore noted U.S. Patents 3,823,995 and 3,711,262. Any other methods of forming gradient index optical waveguides are also suitable forthe purposes of the present invention.
55 Referring to Figures 9 and 10, there are illustrated two methods of forming the high bandwidth gradient index optical waveguide of Figure 6. As will be noted. Figures 9 and 10 illustrate the starting source materials, namely the chlorides or the like, or boron, silicon, phosphorous, and germania, which under the influence of oxygen and heat, react to produce the respective oxides. The base glass illustrated in Figures 9 , and 10 is silica to which is added B203, and Ge02 and/or P2Os. The starting member or substrate in each 60 example is silica.
The barrier layer is formed by applying a plurality of layers of materials to the inside surface of the substrate tube, the composition of the barrier layer being substantially uniform throughout having a substantially constant proportion of silica, B203, and Ge02 and/or P205. As illustrated in Figure 9, the levels of B203 and Ge02 in the barrier layer are maintained at levels whereby the barrier layer index refraction is less 65 than that of silica as shown by flat portion 30 of Figure 6. Specifically, the index of refraction of the barrier
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layer in the example illustrated in Figure 6 is from approximately 0.002 to 0.010 lower than the index of refraction of the cladding. To obtain the gradient index core as illustrated by curve 26 of Figure 6, the amount of B203 in the core material composition deposited over the barrier layer is gradually decreased as each successive layer of core material is deposited, while the amount of Ge02 in the core composition is gradually 5 increased in each successive layer. As will be understood, the core may be formed by the application of a plurality of layers of core material until the desired thickness of the core layer is achieved.
Since according to our invention the barrier layer and the core each contain B203 and Ge02 and there is no abrupt change in the amounts of these dopants (as will be seen to be the case in Figures 3 and 4 for B203 and the absence in these figures of Ge02 from the barrier layer) northe abrupt introduction of a new dopant 10 (Ge02 in Figures 3 and 4) as the core is formed over the barrier layer, the resultant waveguide profile as 10 illustrated in Figure 6 does not have the combination step-gradient index profile of prior art waveguides. It will be understood that the change in the quantity of B203and Ge02 within the core thickness is programmed in a predetermined manner so as to obtain a predetermined desired cross-sectional profile of the ultimate optical waveguide.
15 A second example of a method of forming the waveguide illustrated in Figure 6 is shown in Figure 10. In 15 this example, the base glass is silica and the barrier layer contains B203, Ge02, and P205 in constant amounts throughout the thickness of the barrier layer. These same three dopants are contained in the core with the Ge02 and P2O5 constituents increasing from the barrier layer-core interface towards the center of the core,
while the amount of B203 decreases from said interface towards the center of the core. The proportion of the 20 silica base glass is substantially constant throughout the barrier layer and core thicknesses. As described in connection with the example of Figure 9, the respective dopant levels are programmed to provide a predetermined change in index of refraction within the core so as to produce a predetermined index of refraction profile as illustrated in Figure 6. As is evident from the profile indicated in Figure 6, the process illustrated by Figure 10 produces a high bandwidth gradient index optical filament without a step-gradient 25 index profile. 25
Referring to Figure 11, there is illustrated a method of forming the high bandwidth gradient index optical waveguide of Figure 7. Referring additionally to Figure 8, gradient index of refraction core 24 is indicated in Figure 7 by curve 40, while the barrier layer 28 is indicated by flat portion 42. The starting member or substrate tube 32, which ultimately forms the waveguide cladding, is illustrated by flat portion 44 in Figure 7. 30 As illustrated in Figure 11, the levels of B203 and Ge02 in the barrier layer are maintained at levels whereby 30 the barrier layer index of refraction is substantially equal to that of silica as shown by flat portion 42 of Figure 7. To obtain the gradient index core as illustrated by curve 40 of Figure 7, the amount of B203 in the core material composition deposited over the barrier layer is gradually decreased as each successive layer of core material is deposited, while the amount of Ge02 in the core composition is gradually increased in each 35 successive layer. As will be understood, the core may be formed by the application of a plurality of layers of core material until the desired thickness of the core layer is achieved. Since the amount of B203 in the barrier material composition deposited is selectively greater than the amount of Ge02 in the barrier material composition and since the amount of B203 in the core material composition deposited does not change abruptly from the uniform amount of B203 in the barrier layer, the resultant waveguide profile as illustrated 40 in Figure 7 does not have the combination step-gradient index profile of, for example, Figure 2. It will be 40 understood that the change in the quantity of B203 and Ge02 within the core thickness is programmed in a predetermined manner so as to obtain a predetermind desired cross-sectional profile of the ultimate optical waveguide. It will also be understood that although the method illustrated by Figures 9,10 and 11 to produce the optical waveguides of Figures 6 and 7 have been described in connection with B203, P205 and Ge02 as 45 dopants, other dopants or combinations thereof may be used. When other dopants or combinations thereof 45 are used, the amounts of each must be properly programmed, as will be understood, so as to obtain a predetermined desired cross-sectional profile.
For a better understanding of the advantages produced by the present invention, reference is made to Figures 12 and 13. Curve 46 in Figure 12 and curve 48 in Figure 13 were obtained using a prior art optical 50 waveguide of the type exemplified by Figure 1, while curves 50 of Figures 12 and 52 of Figure 13 were obtained using an optical waveguide in accordance with the present invention, such as exemplified by Figure 6. Curves 46 and 50 represent measured data utilizing optical waveguides and are the plots of the delay time in manoseconds per kilomer as a function of the principal mode number (m). Reference is also made with respect to Figure 12, to an article entitled “Differential Mode Attenuation in Graded-lndex Optical 55 Waveguides” by Robert Olshanksy, published at page 423 of the Technical Digest of the 1977 International 55 Conference on Integrated Optics and Optical Fiber Communications, Tokyo, Japan. The principal mode ,
number “M” is related to the launch position “r” of a laser spot at the input end of a fiber by the equation m = M(r/a)2
‘ is the core radius and “M” is the maximum value of the principal mode number, given by 60
M = 1/2 n,KaV2A
50
where “n-,” is the on-axis index of refraction, “k” is equal to 2xfk, “K is the free space wavelength (799 nm for 65 the data shown in Figure 12), A equals (ni – n2)/(n-i) and “n2” is the index of refraction of the cladding. 65
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Because of the step in the inex of refraction profile at the core-barrier layer interface of the waveguide represented by Figure 1, a large delay time shift results for high order modes transmitted through such a waveguide and consequently a large rms pulse width of 0.69ns is produced as seen from curve 46 of Figure 12. When the index of refraction profile shape is corrected according to the present invention as represented 5 by Figure 6, the delay shift as shown by curve 46 of Figure 12 is eliminated as demonstrated by curve 50. It is 5 seen that the pulse broadening as represented by the curve 50 of Figure 12 is reduced to 0.21ns.
Referring additionally to Figure 13 where curve 48 represents data of the prior art optical waveguide illustrated by Figure 1, the pulse width “a” of 0.69ns is mathematically translated to a bandwidth of 0.28GHz. The measured bandwidth was 260mHz. On the other hand, the optical waveguide of the present invention of 10 Figure 6 represented by curve 50 of Figure 12 and curve 52 of Figure 13 having a pulse width “a” of 0.21ns is 10 mathematically translated to a bandwidth of 0.94GHz. The measured bandwidth was 910mHz.
For comparison and informational purposes, the chemical vapor deposition process data represented by Figures 3 and 4 which produced optical waveguides of the prior art represented by Figure 1, and the calculated process data represented by Figure 5 which is believed to produce an optical waveguide 15 represented by Figure 2, is set out in Table I, following. The data of the example of Figures 1 and 4 is 15
illustrated by curve 46 of Figure 12 and curve 48 of Figure 13.
TABLE /
CORE 20
REACTANT FLOW
0.6 gms/min
0.05 to 0.465 gms/min 25
5 scc/min
30
0.6 gms/min 0.05 to 0.465 gms/min
0.049 gms/min 35
5 scc/min
40
0.6 gms/min 0.2 to 0.465 gms/min
20 to 5 scc/min 45
For each of the examples of Table I the excess oxygen is 1000 scc/min, temperatur is 1750°C. and the transverse rate of layer application is 15 cm/minfor both the barrier layer and the core; the barrier layer is 50 formed by 3 passes or layers while the core is formed by 60 passes or layers. The resulting optical waveguide 50 has an outside diameter of about 125 micrometers, a core diameter of about 62.5 micrometers, ana barrier layer thickness of about 1 micrometer, although the barrier layer may range from about 1 to 10 micrometers if desired.
The following is a typical example of producing an optical waveguide having a profile’as illustrated in 55 Figure 6 and produced by the method represented in Figure 10 of the present invention. A silica substrate 55 tube having an outside diameter of 25 millimeters and a wall thickness of 1.275 millimeters is mounted in a deposition lathe. The constituent reactants SiCI4, GeCI4/ POCI3, and BCI3 were delivered to the substrate tube by known chemical vapor deposition systems. The parameters of the process of this example are set out in f Table II following.
20 x” BARRIER LAYER
m REACTANT REACTANT FLOW
co SiCI4 0.6 gms/min
08
25 c/d GeCI4
LU
tr g BCI3 20 scc/min
30
■u c
(0
40
SiCI4 0.6 gms/min
GeCI4
V)
35 cc POCI
z>
52
LL
BCI3 20 scc/min
73 SiCI4 0.6 gms/min
(0
GeCI4 0.2 gms/min

LU
cc Z> U
REACTANTS SiCI4 GeCI4 POCI3 BCI3
TABLE II BARRIER LAYER REACTANT FLOW
0.6 gms/min
0.05 gms/min
0.0049 gms/min
20 scc/min
CORE REACTANT FLOW
0.6 gms/min
0.05 to 0.465 gms/min
0.0049 to 0.049 gms/min
20 to 5 scc/min
For the example of Table II the excess oxygen provided was about 1000 scc/min, the forming temperature was about 1750°C., and the transverse rate of layer application was about 15 cm/min for both the barrier 15 layer and core; the barrier layer was formed by 3 passes or layers while the core was formed by 60 passes or layers.
The blank or preform so formed was then heated to a temperature of about 2200°C., rotated at a speed of 60-90 rpm, and the central hole was collapsed to form a solid preform. The solid preform was then mounted in a drawing apparatus as well known in the art, the end thereof heated to a temperature of about 2000°C. 20 and drawn into an optical waveguide filament having the cross-sectional profile as illustrated in Figure 6 and properties illustrated by curve 50 of Figure 12 and curve 52 of Figure 13. The resulting optical waveguide had an outside diameter of about 125 micrometers, a core diameter of about 62.5 micrometers, and a barrier layer thickness of about 1 micrometer.
The following is another typical example of producing an optical waveguide of the present invention 25 having a profile as illustrated in Figure 6 and produced by the method represented by Figure 9. A silica substrate tube having an outside diameter of 25 millimeters and a wall thickness of 1.275 millimeters is mounted in a deposition lathe. The constituents SiCI4, GeCI4, and BCI3 are delivered to the substrate tube by a chemical vapor deposition system well known to one familiar with the art as described in the previous example. The mathematically calculated and estimated parameters of the process of this example are set out 30 in Table III following.
10
15
20
25
30
35
40
X
LU
CD
06
CD CO LU CC D
a
LL
REACTANTS SiCI4 GeCI4 BCI3
TABLE III
BARRIER LAYER REACTANT FLOW
0.6 gms/min
0.05 gms/min
20 scc/min
CORE REACTANT FLOW
0.6 gms/min
0.05 to 0.465 gms/min
20 to 5 scc/min
35
40
For the example of Table III the excess oxygen provided is about 1000 sc/min, the forming temperature is 45 about 1750°C., and thetranverse rate of layer application is about 15 cm/min for both the barrier layer and 45 the core; the barrier layer being formed by 3 passes or layers while the core is formed by 60 passes or layers.
The blank or preform so formed is then heated to a temperature of about 2200°C., rotated at a speed of 60-90 rpm, and the central hole is collapsed to form a solid preform. The solid preform is then mounted in a drawing apparatus as well known in the art, the end thereof heated to a temperature of about 2000°C. and 50 drawn into an optical waveguide filament having the cross-sectional profile similartothat illustrated in 50
Figure 6.
The resulting optical waveguide of this example should have an outside diameter of about 125 micrometers, a core diameter of about 32.5 micrometers, and a barrier layer thickness of about 1 micrometer.
55 The following is still another example of producing an optical waveguide of the present invention having a 55 profile as illustrated in Figure 7 and produced by the process illustrated by Figure 11. A silica tube having a . 25 millimeter outside diameter and a 1.275 millimeter wall thickness is provided and mounted in a chemical vapor deposition lathe. The constituent react ants SiCI4, GeCI4 and BCI3 are delivered to the substrate tube by a well known chemical vapor deposition system of the type previously described. The mathematically 60 calculated and estimated parameters of the process of the examples are set out in Table IV following. 60*
7
GB 2 027 929 A 7
TABLE IV
BARRIER LAYER CORE
REACTANTS REACTANT FLOW REACTANT FLOW
*— T—
r-« CO LU
SiCI4
0.6 gms/min
0.6 gms/min
GeCI4
0.12 gms/min
0.12 to 0.465 gms/min cc bci3
20 scc/min
20 to 5 scc/min
(J
LL
For the example of Table IV the excess oxygen provided is about 1000 scc/min, the forming temperature is 15 about 1750048C., and the transverse rate of layer application is about 15 cm/min for both the barrier layer and core; the barrier layer being formed by 3 passes or layers while the core is formed by 60 passes or layers.
After the preform or blank is fabricated as heretofore described, it is heated to a temperature of about 2200°C., rotated at a speed of 60-90 rpm, and the central hole is collapsed to form a solid preform. The article 20 so formed is subsequently placed in a drawing apparatus known to one familiar with the art, the end thereof heated and a fiber having an outside diameter of about 125 micrometers, a core diameter of about 62.5 micrometers, and a barrier layer thickness of about 1 micrometer is drawn in a manner well known in the art. The waveguide so formed should have an index of refraction profile as illustrated by Figure 7.
As will be understood, the central hole of any of the waveguide preforms or blanks of the preceding 25 examples may be collapsed at the end of the deposition process as described, or the blank may be subsequently reheated and the hole collapsed, or the hole may be collapsed during the drawing process as desired.
Although the present invention has been described with respect to specific details of certain embodiments thereof, it is not intended that such details be limitations upon the scope of the invention except insofar as 30 set forth in the following claims.

Claims (1)

1. A high bandwidth gradient index optical filament comprising an outer cladding layer, a barrier layer on 35 the inside wall surface of said cladding layer and comprising a base glass and B203, the quantity of said base glass and said B203 throughout the thickness of said barrier layer being sybstantially uniform, and a core of high purity glass, having a gradient index of refraction, disposed within said barrier layer and adhered thereto to form an interface therebetween, said core consisting essentially of a base glass, B203 and at least one additional dopant, characterized in that (a) the barrier layer includes said at least one additional dopant 40 in a substantially uniform quantity throughout the thickness of the barrier layer and in an amount related to that of said B203 to provide the barrier layer with an index of refraction at most equal to that of the cladding layer and that (b) the core has a stepless index of refraction at said interface substantially equal to the index of refraction of the barrier layer at the interface, the quantity of B203 decreasing within said core from said interface towards the central axis of said optical filament while the quantity of said at least one additional 45 dopant gradually varies at said interface towards said central axis in a predetermined manner from its uniform quantity throughout the thickness of said barrier layer so as to result in a desired stepless and substantially continuously varying gradient index of refraction across the cross section of said core.
2. The filament according to claim 1, wherein said cladding layer is composed substantially of silica.
3. The filament according to claim 1 or 2, wherein said additional dopant comprises Ge02 and/or P205. 50 4. The filament according to any one of the preceding claims, wherein the constituent amount of each additional dopant in said core at said interface is approximately equal to the quantity of said dopants in said barrier layer.
5. A method of forming a preform for a high band-width optical filament, comprising providing a cylindrical tubular member, forming a barrier layer comprising a base glass and B203 on the inside wall 55 surface of said tubular starting member, maintaining the quantity of said base glass and said B203 substantially uniform throughout the thickness of said barrier layer, and forming a core layer consisting essentially of a high purity base glass, B203 and at least one additional dopant over said barrier layer thereby forming an interface, said core having a gradient index of refraction from said interface to the central axis of the preform, characterized in that said barrier layer is formed from a material composition which in addition 60 to said base glass and B203 includes said at least one additional dopant, the quantity of which in the barrier layer is also maintained substantially uniform throughout the thickness thereof, the amount of said at last one additional dopant being related to said B203 so that the index of refraction of said barrier layer is at most equal to the index of refraction of said tubular starting member, and to the end of providing said core layer with a stepless gradient index of refraction at said interface which is essentially equal to that of said barrier 65 layer at said interface, the quantity of B203 is gradually decreased within said core layer starting at said
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interface, from its uniform quantity throughout the thickness of said barrier layer, towards the central axis of said preform, while simultaneously also gradually varying the quantity of said at least one dopant starting at said interface, from its uniform quantity throughout the thickness of said barrier layer, towards said central axis in a predetermined manner so as to result in a stepless predetermined gradient index of refraction
5 across the cross section of said core layer.
6. The method of claim 5, wherein a silica cylindrical tubular starting member is provided.
7. The method of claim 5 or 6, wherein said additional dopant provided comprises Ge02 and/or P205.
8. The method of any one of claims 5 to 7, wherein the central hole of the preform is collapsed to form a solid article.
10 9. The method of claim 8, wherein the central hole is collapsed by heating the preform to form a solid article, heating the structure so formed to the drawing temperature of the materials thereof, and drawing the heated structure to reduce the cross sectional area thereof to form an optical filament having predetermined desired characteristics.
10. A high bandwidth gradient index optical filament substantially as hereinbefore described.
15 11. A method of forming a preform for a high bandwidth optical filament substantially as hereinbefore described in the Examples.
Printed for Her Majesty’s Stationery Office, by Croydon Printing Company Limited, Croydon Surrey, 1980. Published by the Patent Office, 25 Southampton Buildings, London, WC2A 1AY, from which copies may be obtained.

GB7926122A
1978-07-31
1979-07-26
High bandwidth gradient index optical filament and method of fabrication

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Method of producing optical waveguide fibers

USRE28028E
(en)

1972-01-03
1974-06-04

Method op forming an economic optical waveguide fiber

US3823995A
(en)

1972-03-30
1974-07-16
Corning Glass Works
Method of forming light focusing fiber waveguide

US3785718A
(en)

1972-09-11
1974-01-15
Bell Telephone Labor Inc
Low dispersion optical fiber

US3884550A
(en)

1973-01-04
1975-05-20
Corning Glass Works
Germania containing optical waveguide

DE2302556A1
(en)

1973-01-19
1974-07-25
Licentia Gmbh
Optical glass fibre prodn. – from quartz glass tube in bore of which are deposited intermediate and core glass layers

CA1050833A
(en)

1974-02-22
1979-03-20
John B. Macchesney
Optical fiber fabrication involving homogeneous reaction within a moving hot zone

JPS51138449A
(en)

1975-05-26
1976-11-30
Sumitomo Electric Ind Ltd
Light transmission fiber and method for fabricating the same

CA1063202A
(en)

1975-06-02
1979-09-25
Preformed Line Products Company
Cable suspension assembly

US4025156A
(en)

1975-09-12
1977-05-24
Bell Telephone Laboratories, Incorporated
Graded-index fiber for multimode optical communication

GB1554754A
(en)

1975-09-12
1979-10-31
Western Electric Co
Optical fibres

DE2647419C2
(en)

1975-10-20
1981-09-17
Hitachi, Ltd., Tokyo

Optical fiber

JPS5288349A
(en)

1976-01-20
1977-07-23
Nippon Selfoc Co Ltd
Optical fiber for communication

GB1568521A
(en)

1976-04-06
1980-05-29
Standard Telephones Cables Ltd
Optical fibre manufacture

DE2741854B2
(en)

1976-09-20
1981-03-19
Hitachi, Ltd., Tokyo

Process for making optical fibers

US4106850A
(en)

1977-04-04
1978-08-15
Bell Telephone Laboratories, Incorporated
Optical fiber with graded index core and pure silica cladding

1978

1978-07-31
US
US05/929,416
patent/US4230396A/en
not_active
Expired – Lifetime

1979

1979-05-18
CA
CA000327923A
patent/CA1116450A/en
not_active
Expired

1979-07-26
IT
IT24686/79A
patent/IT1122360B/en
active

1979-07-26
IN
IN772/CAL/79A
patent/IN164661B/en
unknown

1979-07-26
IL
IL57900A
patent/IL57900A/en
unknown

1979-07-26
FI
FI792351A
patent/FI792351A/en
not_active
Application Discontinuation

1979-07-26
NL
NL7905803A
patent/NL7905803A/en
not_active
Application Discontinuation

1979-07-26
ES
ES482850A
patent/ES482850A1/en
not_active
Expired

1979-07-26
NO
NO792483A
patent/NO792483L/en
unknown

1979-07-26
BR
BR7904786A
patent/BR7904786A/en
unknown

1979-07-26
DK
DK316679A
patent/DK316679A/en
not_active
Application Discontinuation

1979-07-26
DE
DE19792930399
patent/DE2930399A1/en
not_active
Withdrawn

1979-07-26
FR
FR7919330A
patent/FR2432488A1/en
active
Granted

1979-07-26
AU
AU49283/79A
patent/AU512858B2/en
not_active
Ceased

1979-07-26
SE
SE7906402A
patent/SE7906402L/en
not_active
Application Discontinuation

1979-07-26
BE
BE0/196460A
patent/BE877901A/en
not_active
IP Right Cessation

1979-07-26
JP
JP9555279A
patent/JPS5521093A/en
active
Pending

1979-07-26
GB
GB7926122A
patent/GB2027929B/en
not_active
Expired

1979-07-27
YU
YU01846/79A
patent/YU184679A/en
unknown

1980

1980-04-10
ES
ES490415A
patent/ES8103390A1/en
not_active
Expired

Cited By (1)

* Cited by examiner, † Cited by third party

Publication number
Priority date
Publication date
Assignee
Title

EP0055822A1
(en)

1980-12-29
1982-07-14
Northern Telecom Limited
Optical transmission line and its method of manufacture

Also Published As

Publication number
Publication date

FI792351A
(en)

1980-02-01

NO792483L
(en)

1980-02-01

FR2432488B1
(en)

1985-03-01

IN164661B
(en)

1989-05-06

AU4928379A
(en)

1980-02-07

GB2027929B
(en)

1983-04-27

DK316679A
(en)

1980-02-01

SE7906402L
(en)

1980-02-01

ES482850A1
(en)

1980-09-01

BE877901A
(en)

1980-01-28

DE2930399A1
(en)

1980-02-28

BR7904786A
(en)

1980-05-13

ES490415A0
(en)

1981-02-16

IT1122360B
(en)

1986-04-23

CA1116450A
(en)

1982-01-19

ES8103390A1
(en)

1981-02-16

JPS5521093A
(en)

1980-02-14

US4230396A
(en)

1980-10-28

IL57900A
(en)

1981-10-30

FR2432488A1
(en)

1980-02-29

AU512858B2
(en)

1980-10-30

IT7924686D0
(en)

1979-07-26

NL7905803A
(en)

1980-02-04

YU184679A
(en)

1983-06-30

IL57900A0
(en)

1979-11-30

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