GB1262363A - Creación de Inventos y Patentes con Inteligencia Artificial

GB1262363A – Improvements relating to apparatus for controlling quantity of a liquid vapour in a gas
– Google Patents

GB1262363A – Improvements relating to apparatus for controlling quantity of a liquid vapour in a gas
– Google Patents
Improvements relating to apparatus for controlling quantity of a liquid vapour in a gas

Info

Publication number
GB1262363A

GB1262363A
GB43362/69A
GB4336269A
GB1262363A
GB 1262363 A
GB1262363 A
GB 1262363A
GB 43362/69 A
GB43362/69 A
GB 43362/69A
GB 4336269 A
GB4336269 A
GB 4336269A
GB 1262363 A
GB1262363 A
GB 1262363A
Authority
GB
United Kingdom
Prior art keywords
gas
liquid
stream
liquid vapour
tube
Prior art date
1968-09-26
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)

Expired

Application number
GB43362/69A
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)

International Business Machines Corp

Original Assignee
International Business Machines Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
1968-09-26
Filing date
1969-09-02
Publication date
1972-02-02

1969-09-02
Application filed by International Business Machines Corp
filed
Critical
International Business Machines Corp

1972-02-02
Publication of GB1262363A
publication
Critical
patent/GB1262363A/en

Status
Expired
legal-status
Critical
Current

Links

Espacenet

Global Dossier

Discuss

Classifications

C—CHEMISTRY; METALLURGY

C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL

C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL

C23C8/00—Solid state diffusion of only non-metal elements into metallic material surfaces; Chemical surface treatment of metallic material by reaction of the surface with a reactive gas, leaving reaction products of surface material in the coating, e.g. conversion coatings, passivation of metals

C23C8/06—Solid state diffusion of only non-metal elements into metallic material surfaces; Chemical surface treatment of metallic material by reaction of the surface with a reactive gas, leaving reaction products of surface material in the coating, e.g. conversion coatings, passivation of metals using gases

C23C8/08—Solid state diffusion of only non-metal elements into metallic material surfaces; Chemical surface treatment of metallic material by reaction of the surface with a reactive gas, leaving reaction products of surface material in the coating, e.g. conversion coatings, passivation of metals using gases only one element being applied

C23C8/10—Oxidising

C23C8/16—Oxidising using oxygen-containing compounds, e.g. water, carbon dioxide

H—ELECTRICITY

H01—ELECTRIC ELEMENTS

H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10

H01L23/00—Details of semiconductor or other solid state devices

H01L23/28—Encapsulations, e.g. encapsulating layers, coatings, e.g. for protection

H01L23/29—Encapsulations, e.g. encapsulating layers, coatings, e.g. for protection characterised by the material, e.g. carbon

H01L23/291—Oxides or nitrides or carbides, e.g. ceramics, glass

H—ELECTRICITY

H01—ELECTRIC ELEMENTS

H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10

H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00

H01L2924/0001—Technical content checked by a classifier

H01L2924/0002—Not covered by any one of groups H01L24/00, H01L24/00 and H01L2224/00

Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS

Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC

Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS

Y10S203/00—Distillation: processes, separatory

Y10S203/11—Batch distillation

Abstract

1,262,363. Controlling the amount of liquid vapour in a gas. INTERNATIONAL BUSINESS MACHINES CORP. 2 Sept., 1969 [26 Sept., 1968], No. 43362/69. Heading B1R. In apparatus for controlling the quantity of liquid vapour in a gas, a first stream of a dry gas is supplied by a pipe 12 with a capillary outlet 13 to bubble through liquid 11 in a reservoir 10, maintained at a desired temperature by circulating a liquid through a space 18 of a jacket 17 by a pump 20, to saturate the gas with liquid vapour, the saturated gas being passed to a nozzle 31 through a riser 26 and mixed in an outlet-tube 34 with a second stream of dry gas from a supply tube 35, the flow rates of the gas streams being controlled by valves 16 and 38. The saturated gas and the second gas stream are maintained at a desired temperature by a heating coil 29 and a heat exchanger 22 is provided in the liquid circulation line of the jacket 17. The gas streams are mixed in a constricted portion 33 of the tube 34 which lies in the plane of the end 32 of the nozzle 31. The gas may be oxygen and the liquid water. (For Figure see next column)

GB43362/69A
1968-09-26
1969-09-02
Improvements relating to apparatus for controlling quantity of a liquid vapour in a gas

Expired

GB1262363A
(en)

Applications Claiming Priority (1)

Application Number
Priority Date
Filing Date
Title

US76279568A

1968-09-26
1968-09-26

Publications (1)

Publication Number
Publication Date

GB1262363A
true

GB1262363A
(en)

1972-02-02

Family
ID=25066054
Family Applications (1)

Application Number
Title
Priority Date
Filing Date

GB43362/69A
Expired

GB1262363A
(en)

1968-09-26
1969-09-02
Improvements relating to apparatus for controlling quantity of a liquid vapour in a gas

Country Status (7)

Country
Link

US
(1)

US3583685A
(en)

JP
(1)

JPS4926038B1
(en)

CH
(1)

CH500755A
(en)

DE
(1)

DE1948434C3
(en)

FR
(1)

FR2018902A1
(en)

GB
(1)

GB1262363A
(en)

SE
(1)

SE346153B
(en)

Families Citing this family (18)

* Cited by examiner, † Cited by third party

Publication number
Priority date
Publication date
Assignee
Title

US4393013A
(en)

1970-05-20
1983-07-12
J. C. Schumacher Company
Vapor mass flow control system

US3735568A
(en)

1971-04-29
1973-05-29
Nortec Electronics Corp
Automatic liquid bubbler

US4276243A
(en)

1978-12-08
1981-06-30
Western Electric Company, Inc.
Vapor delivery control system and method

US4632789A
(en)

1985-01-31
1986-12-30
Reid Philip L
Gas humidification apparatus

US4759882A
(en)

1985-01-31
1988-07-26
Mocon Modern Controls, Inc.
Gas humidification process

NL8603111A
(en)

1986-12-08
1988-07-01
Philips Nv

METHOD FOR MANUFACTURING A SEMICONDUCTOR DEVICE APPLYING A SILICONE SURFACE ON ITS SURFACE WITH FIELD OXIDE AREAS.

US6161398A
(en)

1998-04-09
2000-12-19
Lucent Technologies, Inc.
Methods of and systems for vapor delivery control in optical preform manufacture

EP0962260B1
(en)

1998-05-28
2005-01-05
Ulvac, Inc.
Material evaporation system

EP1433524B1
(en)

1998-05-28
2006-09-27
Ulvac, Inc.
An organic material evaporation source

US6275649B1
(en)

1998-06-01
2001-08-14
Nihon Shinku Gijutsu Kabushiki Kaisha
Evaporation apparatus

US6202991B1
(en)

1999-02-03
2001-03-20
Nicholas Edward Coniglio
Bubble humidifier with valve inlet for supplying liquid therein

US6473564B1
(en)

2000-01-07
2002-10-29
Nihon Shinku Gijutsu Kabushiki Kaisha
Method of manufacturing thin organic film

US6443435B1
(en)

2000-10-23
2002-09-03
Applied Materials, Inc.
Vaporization of precursors at point of use

US7578208B2
(en)

2006-12-15
2009-08-25
Mocon, Inc.
System and method for generating a gas sample of known and adjustable relative humidity

TWM352764U
(en)

2008-06-19
2009-03-11
Scientech Corp
Constant temperature gas/liquid mixture generating system for using in wafer drying process

CN102698653B
(en)

2012-05-18
2014-04-09
张家港化工机械股份有限公司
Connection structure for steam outlet of steam jacket of oxidation reactor

CN104841323A
(en)

2015-05-06
2015-08-19
王英英
Pneumatic assisted chemical raw material mixing tank

FR3131224B1
(en)

2021-12-24
2023-11-17
H2Gremm

Process for regulating the humidity of a gas

Family Cites Families (6)

* Cited by examiner, † Cited by third party

Publication number
Priority date
Publication date
Assignee
Title

US1694179A
(en)

1928-12-04

jenks

US585365A
(en)

1897-06-29

System

US2732415A
(en)

1956-01-24

Klinge

BE398005A
(en)

1932-08-12

US2211448A
(en)

1937-08-31
1940-08-13
Union Carbide & Carbon Res Lab
Utilization of volatile fluxes in welding operations

US2727855A
(en)

1951-11-26
1955-12-20
Pure Oil Co
Differential pressure reactor and distilling apparatus

1968

1968-09-26
US
US762795A
patent/US3583685A/en
not_active
Expired – Lifetime

1969

1969-09-02
GB
GB43362/69A
patent/GB1262363A/en
not_active
Expired

1969-09-02
FR
FR6930675A
patent/FR2018902A1/fr
not_active
Withdrawn

1969-09-18
SE
SE12853/69A
patent/SE346153B/xx
unknown

1969-09-24
JP
JP44075354A
patent/JPS4926038B1/ja
active
Pending

1969-09-25
CH
CH1446069A
patent/CH500755A/en
not_active
IP Right Cessation

1969-09-25
DE
DE1948434A
patent/DE1948434C3/en
not_active
Expired

Also Published As

Publication number
Publication date

US3583685A
(en)

1971-06-08

DE1948434A1
(en)

1970-04-02

FR2018902A1
(en)

1970-06-26

DE1948434B2
(en)

1978-01-12

SE346153B
(en)

1972-06-26

JPS4926038B1
(en)

1974-07-05

DE1948434C3
(en)

1978-09-21

CH500755A
(en)

1970-12-31

Información de contacto